INOUE; Tomoshi
Patent Applications and Registrations
Patent applications and USPTO patent grants for INOUE; Tomoshi.The latest application filed is for "method and apparatus for polishing a substrate".
- INOUE; Tomoshi - Tokyo JP
- Inoue; Tomoshi - Ohta-ku JP
| Patent | Date |
|---|---|
| Method And Apparatus For Polishing A Substrate App 20190240801 - FUKUSHIMA; Makoto ; et al. | 2019-08-08 |
| Method and apparatus for polishing a substrate Grant 10,307,882 - Fukushima , et al. | 2019-06-04 |
| Method And Apparatus For Polishing A Substrate App 20160176011 - FUKUSHIMA; Makoto ; et al. | 2016-06-23 |
| Method and apparatus for polishing a substrate Grant 9,308,621 - Fukushima , et al. April 12, 2 | 2016-04-12 |
| Substrate holding apparatus, polishing apparatus, and polishing method Grant 8,485,866 - Yasuda , et al. July 16, 2 | 2013-07-16 |
| Polishing apparatus Grant 8,357,029 - Fukushima , et al. January 22, 2 | 2013-01-22 |
| Substrate Holding Apparatus, Polishing Apparatus, And Polishing Method App 20120309277 - YASUDA; Hozumi ; et al. | 2012-12-06 |
| Substrate holding apparatus, polishing apparatus, and polishing method Grant 8,267,746 - Yasuda , et al. September 18, 2 | 2012-09-18 |
| Substrate holding apparatus, polishing apparatus, and polishing method Grant 8,100,739 - Yasuda , et al. January 24, 2 | 2012-01-24 |
| Method And Apparatus For Polishing A Substrate App 20110159783 - Fukushima; Makoto ; et al. | 2011-06-30 |
| Substrate holding apparatus, polishing apparatus, and polishing method Grant 7,967,665 - Yasuda , et al. June 28, 2 | 2011-06-28 |
| Elastic membrane for semiconductor wafer polishing apparatus Grant D634,719 - Yasuda , et al. March 22, 2 | 2011-03-22 |
| Polishing Apparatus App 20100273405 - Fukushima; Makoto ; et al. | 2010-10-28 |
| Substrate holding apparatus, polishing apparatus, and polishing method App 20080318492 - Yasuda; Hozumi ; et al. | 2008-12-25 |
| Substrate holding apparatus, polishing apparatus, and polishing method App 20080318499 - Yasuda; Hozumi ; et al. | 2008-12-25 |
| Substrate holding apparatus, polishing apparatus, and polishing method App 20070232193 - Yasuda; Hozumi ; et al. | 2007-10-04 |
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