Trademark applications and grants for Ims Nanofabrication Ag. Ims Nanofabrication Ag has 1 trademark applications. The latest application filed is for "MESA"
Patent Application | Date |
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Method for Compensating Pattern Placement Errors Caused by Variation of Pattern Exposure Density in a Multi-Beam Writer 20170357153 - 15/620599 Platzgummer; Elmar | 2017-12-14 |
Multi-Beam Writing Using Inclined Exposure Stripes 20160336147 - 15/151937 Platzgummer; Elmar | 2016-11-17 |
Multi-Beam Writing of Pattern Areas of Relaxed Critical Dimension 20160276132 - 15/073200 Platzgummer; Elmar ;   et al. | 2016-09-22 |
Bi-Directional Double-Pass Multi-Beam Writing 20160276131 - 15/073935 Platzgummer; Elmar | 2016-09-22 |
Correction of Short-Range Dislocations in a Multi-Beam Writer 20160071684 - 14/845197 Platzgummer; Elmar ;   et al. | 2016-03-10 |
Bi-directional double-pass multi-beam writing 9,799,487 - 15/073,935 Platzgummer October 24, 2 | 2017-10-24 |
Bi-directional double-pass multi-beam writing 9,799,487 - 15/073,935 Platzgummer October 24, 2 | 2017-10-24 |
Multi-beam writing of pattern areas of relaxed critical dimension 9,653,263 - 15/073,200 Platzgummer , et al. May 16, 2 | 2017-05-16 |
Multi-beam writing of pattern areas of relaxed critical dimension 9,653,263 - 15/073,200 Platzgummer , et al. May 16, 2 | 2017-05-16 |
Correction of short-range dislocations in a multi-beam writer 9,568,907 - 14/845,197 Platzgummer , et al. February 14, 2 | 2017-02-14 |
Mark Image Registration | Serial | Trademark Application Date |
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![]() "MESA" 4356070 79124045 |
MESA 2012-10-25 |
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