Iga; Masao
Patent Applications and Registrations
Patent applications and USPTO patent grants for Iga; Masao.The latest application filed is for "substrate cleaning apparatus".
- Iga; Masao - Okayama JP
- Iga, Masao - Okayama-shi JP
- Iga; Masao - Kawasaki JP
| Patent | Date |
|---|---|
| Substrate treatment process and apparatus Grant 6,983,756 - Matsuno , et al. January 10, 2 | 2006-01-10 |
| Substrate cleaning apparatus App 20050183749 - Matsuno, Kousaku ; et al. | 2005-08-25 |
| Substrate cleaning apparatus App 20050183750 - Matsuno, Kousaku ; et al. | 2005-08-25 |
| Substrate cleaning apparatus App 20050150530 - Matsuno, Kousaku ; et al. | 2005-07-14 |
| Substrate cleaning apparatus Grant 6,874,516 - Matsuno , et al. April 5, 2 | 2005-04-05 |
| Substrate treatment process and apparatus App 20040194812 - Matsuno, Kousaku ; et al. | 2004-10-07 |
| Substrate treatment process and apparatus Grant 6,743,301 - Matsuno , et al. June 1, 2 | 2004-06-01 |
| Substrate Cleaning apparatus App 20030005948 - Matsuno, Kousaku ; et al. | 2003-01-09 |
| Substrate treatment process and apparatus App 20010009155 - Matsuno, Kousaku ; et al. | 2001-07-26 |
| Apparatus for fabricating semiconductor device and method for fabricating semiconductor device Grant 6,024,045 - Kikuchi , et al. February 15, 2 | 2000-02-15 |
| Apparatus for fabricating semiconductor device and method for fabricating semiconductor device Grant 5,919,336 - Kikuchi , et al. July 6, 1 | 1999-07-06 |
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