| Patent | Date |
|---|
IC product comprising a novel insulating gate separation structure for transistor devices
Grant 11,349,013 - Huang , et al. May 31, 2 | 2022-05-31 |
Semiconductor device with reduced gate height budget
Grant 11,114,542 - Zang , et al. September 7, 2 | 2021-09-07 |
Gap Fill Void And Connection Structures
App 20210134658 - HUANG; Haigou ; et al. | 2021-05-06 |
Multi-step insulator formation in trenches to avoid seams in insulators
Grant 10,964,599 - Sirman , et al. March 30, 2 | 2021-03-30 |
Cap structure
Grant 10,930,549 - Gao , et al. February 23, 2 | 2021-02-23 |
Gap fill void and connection structures
Grant 10,923,388 - Huang , et al. February 16, 2 | 2021-02-16 |
Interconnects with non-mandrel cuts formed by early block patterning
Grant 10,777,413 - Ren , et al. Sept | 2020-09-15 |
Chamferless interconnect vias of semiconductor devices
Grant 10,770,344 - Ren , et al. Sep | 2020-09-08 |
Gap Fill Void And Connection Structures
App 20200235002 - HUANG; Haigou ; et al. | 2020-07-23 |
Method of forming semiconductor material in trenches having different widths, and related structures
Grant 10,714,376 - Chang , et al. | 2020-07-14 |
Chamferless Interconnect Vias Of Semiconductor Devices
App 20200219763 - REN; YUPING ; et al. | 2020-07-09 |
Methods, apparatus, and system for reducing gate cut gouging and/or gate height loss in semiconductor devices
Grant 10,644,156 - Gao , et al. | 2020-05-05 |
Method of manufacturing finfet devices using narrow and wide gate cut openings in conjunction with a replacement metal gate process
Grant 10,586,860 - Shu , et al. | 2020-03-10 |
Capping structure
Grant 10,559,470 - Huang , et al. Feb | 2020-02-11 |
Interconnects With Non-mandrel Cuts Formed By Early Block Patterning
App 20200020531 - Ren; Yuping ; et al. | 2020-01-16 |
Cap Structure
App 20200013672 - GAO; Jinsheng ; et al. | 2020-01-09 |
Methods, apparatus, and system for forming epitaxial formations with reduced risk of merging
Grant 10,529,831 - Gao , et al. J | 2020-01-07 |
Methods, apparatus and system for stringer defect reduction in a trench cut region of a finFET device
Grant 10,522,639 - Zang , et al. Dec | 2019-12-31 |
Method Of Forming Semiconductor Material In Trenches Having Different Widths, And Related Structures
App 20190393077 - Chang; Chih-Chiang ; et al. | 2019-12-26 |
Contact structures
Grant 10,510,613 - Shu , et al. Dec | 2019-12-17 |
Ic Product Comprising A Novel Insulating Gate Separation Structure For Transistor Devices
App 20190378914 - Huang; Haigou ; et al. | 2019-12-12 |
Semiconductor Device With Reduced Gate Height Budget
App 20190371905 - ZANG; Hui ; et al. | 2019-12-05 |
Multi-step Insulator Formation In Trenches To Avoid Seams In Insulators
App 20190355624 - Sirman; Asli ; et al. | 2019-11-21 |
Methods, Apparatus, And System For A Semiconductor Device Comprising Gates With Short Heights
App 20190355615 - Shu; Jiehui ; et al. | 2019-11-21 |
Methods of forming replacement gate structures on transistor devices
Grant 10,483,369 - Huang , et al. Nov | 2019-11-19 |
A Method Of Manufacturing Finfet Devices Using Narrow And Wide Gate Cut Openings In Conjuction With A Replacement Metal Gate Pro
App 20190341475 - Shu; Jiehui ; et al. | 2019-11-07 |
Cap structure
Grant 10,460,986 - Gao , et al. Oc | 2019-10-29 |
Methods, Apparatus And System For Stringer Defect Reduction In A Trench Cut Region Of A Finfet Device
App 20190326408 - Zang; Hui ; et al. | 2019-10-24 |
Material Combinations For Polish Stops And Gate Caps
App 20190326416 - Huang; Haigou ; et al. | 2019-10-24 |
Diffused contact extension dopants in a transistor device
Grant 10,453,754 - Peng , et al. Oc | 2019-10-22 |
Tone inversion method and structure for selective contact via patterning
Grant 10,453,751 - Qiu , et al. Oc | 2019-10-22 |
Multi-step Insulator Formation In Trenches To Avoid Seams In Insulators
App 20190304843 - Sirman; Asli ; et al. | 2019-10-03 |
Multi-step insulator formation in trenches to avoid seams in insulators
Grant 10,431,500 - Sirman , et al. O | 2019-10-01 |
Methods, apparatus and system for stringer defect reduction in a trench cut region of a finFET device
Grant 10,418,455 - Zang , et al. Sept | 2019-09-17 |
Methods, apparatus, and system for a semiconductor device comprising gates with short heights
Grant 10,418,272 - Shu , et al. Sept | 2019-09-17 |
Methods, Apparatus, And System For Reducing Gate Cut Gouging And/or Gate Height Loss In Semiconductor Devices
App 20190280114 - Gao; Jinsheng ; et al. | 2019-09-12 |
Semiconductor device with reduced gate height budget
Grant 10,403,734 - Zang , et al. Sep | 2019-09-03 |
Composite contact etch stop layer
Grant 10,388,562 - Huang , et al. A | 2019-08-20 |
Cap Structure
App 20190237363 - GAO; Jinsheng ; et al. | 2019-08-01 |
Capping Structure
App 20190228976 - HUANG; Haigou ; et al. | 2019-07-25 |
Contact Structures
App 20190229019 - Shu; Jiehui ; et al. | 2019-07-25 |
Device for improving performance through gate cut last process
Grant 10,347,729 - Wu , et al. July 9, 2 | 2019-07-09 |
Methods, apparatus and system for providing a pre-RMG replacement metal contact for a finFET device
Grant 10,325,819 - Gao , et al. | 2019-06-18 |
Methods Of Forming Replacement Gate Structures On Transistor Devices
App 20190131428 - Huang; Haigou ; et al. | 2019-05-02 |
Methods, apparatus and system for replacement contact for a finFET device
Grant 10,269,654 - Gao , et al. | 2019-04-23 |
Method of forming cobalt contact module and cobalt contact module formed thereby
Grant 10,262,942 - Fang , et al. | 2019-04-16 |
Replacement contact cuts with an encapsulated low-K dielectric
Grant 10,256,089 - Cao , et al. | 2019-04-09 |
Methods, Apparatus And System For Stringer Defect Reduction In A Trench Cut Region Of A Finfet Device
App 20190097015 - Zang; Hui ; et al. | 2019-03-28 |
Nanosheet Transistor With Improved Inner Spacer
App 20190081155 - XIE; Ruilong ; et al. | 2019-03-14 |
Methods of forming upper source/drain regions on a vertical transistor device
Grant 10,229,999 - Wu , et al. | 2019-03-12 |
Vertical field effect transistor formation with critical dimension control
Grant 10,217,846 - Xie , et al. Feb | 2019-02-26 |
Composite Contact Etch Stop Layer
App 20190057899 - HUANG; Haigou ; et al. | 2019-02-21 |
Vertical field-effect transistor having a dielectric spacer between a gate electrode edge and a self-aligned source/drain contact
Grant 10,211,315 - Zang , et al. Feb | 2019-02-19 |
Advanced structure for self-aligned contact and method for producing the same
Grant 10,211,103 - Huang , et al. Feb | 2019-02-19 |
Methods, apparatus, and system for reducing step height difference in semiconductor devices
Grant 10,204,797 - Gao , et al. Feb | 2019-02-12 |
Methods of forming features on integrated circuit products
Grant 10,204,784 - Gao , et al. Feb | 2019-02-12 |
Method Of Forming Cobalt Contact Module And Cobalt Contact Module Formed Thereby
App 20190035739 - Fang; Qiang ; et al. | 2019-01-31 |
Vertical Field-Effect Transistor having a Dielectric Spacer between a Gate Electrode Edge and a Self-Aligned Source/Drain Contact
App 20190027586 - Zang; Hui ; et al. | 2019-01-24 |
Semiconductor Device With Reduced Gate Height Budget
App 20190027575 - ZANG; Hui ; et al. | 2019-01-24 |
Methods, apparatus and system for gate cut process using a stress material in a finFET device
Grant 10,176,995 - Wu , et al. J | 2019-01-08 |
Replacement Contact Cuts With An Encapsulated Low-k Dielectric
App 20180366324 - Cao; Huy ; et al. | 2018-12-20 |
Nanosheet field-effect transistor with full dielectric isolation
Grant 10,103,238 - Zang , et al. October 16, 2 | 2018-10-16 |
Methods Of Forming Integrated Circuit Structures Including Opening Filled With Insulator In Metal Gate
App 20180286965 - Zang; Hui ; et al. | 2018-10-04 |
Methods of forming integrated circuit structures including opening filled with insulator in metal gate
Grant 10,090,169 - Zang , et al. October 2, 2 | 2018-10-02 |
Tone Inversion Method And Structure For Selective Contact Via Patterning
App 20180261510 - QIU; Xiaofeng ; et al. | 2018-09-13 |
Methods Of Forming Upper Source/drain Regions On A Vertical Transistor Device
App 20180248046 - Wu; Xusheng ; et al. | 2018-08-30 |
Preventing bridge formation between replacement gate and source/drain region through STI structure
Grant 10,062,772 - Huang , et al. August 28, 2 | 2018-08-28 |
Siloxane and organic-based MOL contact patterning
Grant 10,056,458 - Maeng , et al. August 21, 2 | 2018-08-21 |
Method of forming field effect transistors with replacement metal gates and contacts and resulting structure
Grant 10,014,298 - Zang , et al. July 3, 2 | 2018-07-03 |
Contact etch stop layer with sacrificial polysilicon layer
Grant 9,991,363 - Huang , et al. June 5, 2 | 2018-06-05 |
Methods for performing a gate cut last scheme for FinFET semiconductor devices
Grant 9,991,361 - Dai , et al. June 5, 2 | 2018-06-05 |
Methods for nitride planarization using dielectric
Grant 9,966,272 - Sheng , et al. May 8, 2 | 2018-05-08 |
Methods for forming different shapes in different regions of the same layer
Grant 9,935,012 - Gao , et al. April 3, 2 | 2018-04-03 |
Embedded silicon carbide block patterning
Grant 9,922,972 - Qiu , et al. March 20, 2 | 2018-03-20 |
Dielectric preservation in a replacement gate process
Grant 9,916,982 - Wu , et al. March 13, 2 | 2018-03-13 |
Method of forming field effect transistors with replacement metal gates and contacts and resulting structure
Grant 9,911,736 - Zang , et al. March 6, 2 | 2018-03-06 |
Preventing Bridge Formation Between Replacement Gate And Source/drain Region Through Sti Structure
App 20180033870 - Huang; Haigou ; et al. | 2018-02-01 |
Structure and method for inhibiting cobalt diffusion
Grant 9,865,543 - Fang , et al. January 9, 2 | 2018-01-09 |
Device For Improving Performance Through Gate Cut Last Process
App 20170365676 - WU; Xusheng ; et al. | 2017-12-21 |
Vertical field effect transistor
Grant 9,837,553 - Wu , et al. December 5, 2 | 2017-12-05 |
Methods For Performing A Gate Cut Last Scheme For Finfet Semiconductor Devices
App 20170345913 - Dai; Xintuo ; et al. | 2017-11-30 |
Controlling Within-die Uniformity Using Doped Polishing Material
App 20170338226 - Huang; Haigou ; et al. | 2017-11-23 |
Methods of cutting gate structures on transistor devices
Grant 9,812,365 - Zhang , et al. November 7, 2 | 2017-11-07 |
Self-aligned deep contact for vertical FET
Grant 9,761,491 - Huang , et al. September 12, 2 | 2017-09-12 |
Controlling within-die uniformity using doped polishing material
Grant 9,754,837 - Huang , et al. September 5, 2 | 2017-09-05 |
Self-aligned lithographic patterning with variable spacings
Grant 9,711,447 - Shu , et al. July 18, 2 | 2017-07-18 |
Siloxane And Organic-based Mol Contact Patterning
App 20170200792 - MAENG; Chang Ho ; et al. | 2017-07-13 |
Introducing self-aligned dopants in semiconductor fins
Grant 9,698,018 - Dai , et al. July 4, 2 | 2017-07-04 |
Devices and methods of improving device performance through gate cut last process
Grant 9,679,985 - Wu , et al. June 13, 2 | 2017-06-13 |
Reducing liner corrosion during metallization of semiconductor devices
Grant 9,595,493 - Sun , et al. March 14, 2 | 2017-03-14 |
Method for eliminating interlayer dielectric dishing and controlling gate height uniformity
Grant 9,589,807 - Huang , et al. March 7, 2 | 2017-03-07 |
Reducing Liner Corrosion During Metallization Of Semiconductor Devices
App 20170047282 - SUN; Zhiguo ; et al. | 2017-02-16 |
Liner and cap layer for placeholder source/drain contact structure planarization and replacement
Grant 9,466,723 - Huang , et al. October 11, 2 | 2016-10-11 |
Method for reducing gate height variation due to overlapping masks
Grant 9,401,416 - Yu , et al. July 26, 2 | 2016-07-26 |
Shallow trench isolation integration methods and devices formed thereby
Grant 9,385,192 - Shen , et al. July 5, 2 | 2016-07-05 |
Defect-free relaxed covering layer on semiconductor substrate with lattice mismatch
Grant 9,368,342 - Huang , et al. June 14, 2 | 2016-06-14 |
Method For Reducing Gate Height Variation Due To Overlapping Masks
App 20160163830 - Yu; Hong ; et al. | 2016-06-09 |
Uniform gate height for mixed-type non-planar semiconductor devices
Grant 9,230,822 - Yu , et al. January 5, 2 | 2016-01-05 |
Uniform Gate Height For Mixed-type Non-planar Semiconductor Devices
App 20150364336 - YU; Hong ; et al. | 2015-12-17 |
Shallow Trench Isolation Integration Methods And Devices Formed Thereby
App 20150333121 - Shen; Hongliang ; et al. | 2015-11-19 |
Defect-free Relaxed Covering Layer On Semiconductor Substrate With Lattice Mismatch
App 20150295047 - HUANG; Haigou ; et al. | 2015-10-15 |
Fabrication Of Semiconductor Structures Using Oxidized Polycrystalline Silicon As Conformal Stop Layers
App 20150270159 - HUANG; Haigou ; et al. | 2015-09-24 |
T-shaped single diffusion barrier with single mask approach process flow
Grant 9,123,773 - Shen , et al. September 1, 2 | 2015-09-01 |
Shallow trench isolation integration methods and devices formed thereby
Grant 9,123,771 - Shen , et al. September 1, 2 | 2015-09-01 |
Method For Manufacturing A Semiconductor Device By Stopping Planarization Of Insulating Material On Fins
App 20150093877 - HUANG; Haigou ; et al. | 2015-04-02 |
Shallow Trench Isolation Integration Methods And Devices Formed Thereby
App 20140227858 - Shen; Hongliang ; et al. | 2014-08-14 |
Ultrasonic Filtration For Cmp Slurry
App 20100206818 - Leong; Lup San ; et al. | 2010-08-19 |
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