HSU; Peng-Fu

Patent Applications and Registrations

Patent applications and USPTO patent grants for HSU; Peng-Fu.The latest application filed is for "interconnect structures and manufacturing method thereof".

Company Profile

8.36.40

HSU; Peng-Fu - Hsinchu TW
Hsu; Peng-Fu - Scottsdale AZ
Hsu; Peng-Fu - Hsin-Chu N/A TW
Hsu; Peng-Fu - Hsinchu City TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Interconnect Structures And Manufacturing Method Thereof App 20220293503 - HUANG; Chun-Hsien ; et al.	2022-09-15
Method of forming an electrode on a substrate and a semiconductor device structure including an electrode Grant 11,398,382 - Mousa , et al. July 26, 2	2022-07-26
Method For Forming A Doped Metal Carbide Film On A Substrate And Related Semiconductor Device Structures App 20210328036 - Li; Dong ; et al.	2021-10-21
Method of forming a doped metal carbide film on a substrate and related semiconductor device structures Grant 11,056,567 - Li , et al. July 6, 2	2021-07-06
Method Of Forming An Electrode On A Substrate And A Semiconductor Device Structure Including An Electrode App 20210028021 - MOUSA; MOATAZ BELLAH ; et al.	2021-01-28
Methods For Forming A Metal Silicate Film On A Substrate In A Reaction Chamber And Related Semiconductor Device Structures App 20210005723 - Tang; Fu ; et al.	2021-01-07
Methods for forming low temperature semiconductor layers and related semiconductor device structures Grant 10,886,123 - Raisanen , et al. January 5, 2	2021-01-05
Method of forming an electrode on a substrate and a semiconductor device structure including an electrode Grant 10,847,371 - Mousa , et al. November 24, 2	2020-11-24
Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures Grant 10,818,758 - Tang , et al. October 27, 2	2020-10-27
Methods For Forming A Metal Silicate Film On A Substrate In A Reaction Chamber And Related Semiconductor Device Structures App 20200161438 - Tang; Fu ; et al.	2020-05-21
Methods For Depositing An Oxide Film On A Substrate By A Cyclical Deposition Process And Related Device Structures App 20190348273 - Tang; Fu ; et al.	2019-11-14
Method Of Forming A Doped Metal Carbide Film On A Substrate And Related Semiconductor Device Structures App 20190348515 - Li; Dong ; et al.	2019-11-14
Method Of Forming An Electrode On A Substrate And A Semiconductor Device Structure Including An Electrode App 20190304790 - Mousa; Moataz Bellah ; et al.	2019-10-03
Methods For Forming Low Temperature Semiconductor Layers And Related Semiconductor Device Structures App 20180350588 - Raisanen; Petri ; et al.	2018-12-06
Method of fabricating dual high-k metal gates for MOS devices Grant 9,263,445 - Hsu , et al. February 16, 2	2016-02-16
Method Of Fabricating Dual High-k Metal Gates For Mos Devices App 20150021705 - Hsu; Peng-Fu ; et al.	2015-01-22
Method of fabricating dual high-k metal gate for MOS devices Grant 8,853,068 - Hsu , et al. October 7, 2	2014-10-07
CMOS dual metal gate semiconductor device Grant 8,836,038 - Hou , et al. September 16, 2	2014-09-16
Hybrid process for forming metal gates of MOS devices Grant 8,536,660 - Hsu , et al. September 17, 2	2013-09-17
Semiconductor devices and methods with bilayer dielectrics Grant 8,384,159 - Yen , et al. February 26, 2	2013-02-26
Method to improve dielectric quality in high-k metal gate technology Grant 8,324,090 - Masuoka , et al. December 4, 2	2012-12-04
Method Of Fabricating Dual High-k Metal Gate For Mos Devices App 20120086085 - Hsu; Peng-Fu ; et al.	2012-04-12
Method of fabricating dual high-k metal gates for MOS devices Grant 8,105,931 - Hsu , et al. January 31, 2	2012-01-31
Semiconductor device gate structure including a gettering layer Grant 7,989,321 - Chen , et al. August 2, 2	2011-08-02
Semiconductor devices with dual-metal gate structures and fabrication methods thereof Grant 7,947,591 - Hsu , et al. May 24, 2	2011-05-24
Base oxide engineering for high-K gate stacks Grant 7,939,396 - Hsu , et al. May 10, 2	2011-05-10
Contact hole structures and contact structures and fabrication methods thereof Grant 7,875,547 - Hsu , et al. January 25, 2	2011-01-25
Hybrid Process for Forming Metal Gates App 20110001194 - Hou; Yong-Tian ; et al.	2011-01-06
Hybrid process for forming metal gates Grant 7,812,414 - Hou , et al. October 12, 2	2010-10-12
MOS devices with continuous contact etch stop layer Grant 7,732,878 - Yao , et al. June 8, 2	2010-06-08
Method Of Fabricating Dual High-k Metal Gates For Mos Devices App 20100052067 - Hsu; Peng-Fu ; et al.	2010-03-04
Method To Improve Dielectric Quality In High-k Metal Gate Technology App 20100052063 - Masuoka; Yuri ; et al.	2010-03-04
High-k Metal Gate Structure Including Buffer Layer App 20100052077 - Hsu; Peng-Fu ; et al.	2010-03-04
Semiconductor Device Gate Structure Including A Gettering Layer App 20100048010 - Chen; Chien-Hao ; et al.	2010-02-25
FIN-FET device structure formed employing bulk semiconductor substrate Grant 7,663,185 - Chen , et al. February 16, 2	2010-02-16
Semiconductor Devices And Methods With Bilayer Dielectrics App 20090315125 - YEN; Fong-Yu ; et al.	2009-12-24
Method for photoresist stripping and treatment of low-k dielectric material Grant 7,598,176 - Tsai , et al. October 6, 2	2009-10-06
Hybrid Process for Forming Metal Gates of MOS Devices App 20090230479 - Hsu; Peng-Fu ; et al.	2009-09-17
Semiconductor devices and methods with bilayer dielectrics Grant 7,531,399 - Yen , et al. May 12, 2	2009-05-12
Semiconductor Devices With Dual-metal Gate Structures And Fabrication Methods Thereof App 20080188044 - Hsu; Peng-Fu ; et al.	2008-08-07
Hybrid process for forming metal gates App 20080173947 - Hou; Yong-Tian ; et al.	2008-07-24
Measuring low dielectric constant film properties during processing Grant 7,400,401 - Tsai , et al. July 15, 2	2008-07-15
Semiconductor devices with dual-metal gate structures and fabrication methods thereof Grant 7,378,713 - Hsu , et al. May 27, 2	2008-05-27
Wet cleaning cavitation system and method to remove particulate wafer contamination Grant 7,373,941 - Chou , et al. May 20, 2	2008-05-20
Semiconductor Devices With Dual-metal Gate Structures And Fabrication Methods Thereof App 20080099851 - Hsu; Peng-Fu ; et al.	2008-05-01
MOS devices with continuous contact etch stop layer App 20080093675 - Yao; Liang-Gi ; et al.	2008-04-24
Semiconductor Devices And Methods With Bilayer Dielectrics App 20080070395 - Yen; Fong-Yu ; et al.	2008-03-20
Methods Of Forming Metal-containing Gate Structures App 20080050879 - Hung; Cheng-Lung ; et al.	2008-02-28
Semiconductor device having nitrided high-k gate dielectric and metal gate electrode and methods of forming same App 20080001237 - Chang; Vincent S. ; et al.	2008-01-03
Base oxide engineering for high-K gate stacks App 20070287199 - Hsu; Peng-Fu ; et al.	2007-12-13
FIN-FET device structure formed employing bulk semiconductor substrate App 20070272954 - Chen; Kuang-Hsin ; et al.	2007-11-29
CMOS device having PMOS and NMOS transistors with different gate structures App 20070228480 - Yen; Fong-Yu ; et al.	2007-10-04
Methods and structures for critical dimension and profile measurement Grant 7,208,331 - Shieh , et al. April 24, 2	2007-04-24
Process for removing organic materials during formation of a metal interconnect Grant 7,122,484 - Perng , et al. October 17, 2	2006-10-17
Measuring low dielectric constant film properties during processing App 20060220653 - Tsai; Jang-Shiang ; et al.	2006-10-05
Contact hole structures and contact structures and fabrication methods thereof App 20060154478 - Hsu; Ju-Wang ; et al.	2006-07-13
Process for improving dielectric properties in low-k organosilicate dielectric material Grant 7,074,727 - Hsu , et al. July 11, 2	2006-07-11
Methods and structures for critical dimension and profile measurement App 20060073620 - Shieh; Jyu-Horng ; et al.	2006-04-06
Method for photoresist stripping and treatment of low-k dielectric material App 20060063386 - Tsai; Jang-Shiang ; et al.	2006-03-23
Wet etchant composition and method for etching HfO2 and ZrO2 App 20060054597 - Perng; Baw-Ching ; et al.	2006-03-16
Zirconium oxide and hafnium oxide etching using halogen containing chemicals Grant 7,012,027 - Perng , et al. March 14, 2	2006-03-14
Wet etchant composition and method for etching HfO2 and ZrO2 Grant 6,969,688 - Perng , et al. November 29, 2	2005-11-29
Process for removing organic materials during formation of a metal interconnect App 20050245082 - Perng, Baw-Ching ; et al.	2005-11-03
Zirconium oxide and hafnium oxide etching using halogen containing chemicals App 20050164479 - Perng, Baw-Ching ; et al.	2005-07-28
Aqueous cleaning composition containing copper-specific corrosion inhibitor Grant 6,864,193 - Chou , et al. March 8, 2	2005-03-08
Process for improving dielectric properties in low-k organosilicate dielectric material App 20050010000 - Hsu, Peng-Fu ; et al.	2005-01-13
Methods for improving sheet resistance of silicide layer after removal of etch stop layer Grant 6,838,381 - Hsu , et al. January 4, 2	2005-01-04
Wet cleaning cavitation system and method to remove particulate wafer contamination App 20040187891 - Chou, Chun-Li ; et al.	2004-09-30
Aqueous Cleaning Composition Containing Copper-specific Corrosion Inhibitor App 20040175964 - Chou, Chun-Li ; et al.	2004-09-09
Methods for improving sheet resistance of silicide layer after removal of etch stop layer App 20040127026 - Hsu, Peng-Fu ; et al.	2004-07-01
Wet etchant composition and method for etching HfO2 and ZrO2 App 20040067657 - Perng, Baw-Ching ; et al.	2004-04-08
Metal silicide etch resistant plasma etch method Grant 6,706,640 - Tsai , et al. March 16, 2	2004-03-16

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