Hsiao; Ru-Shang
Patent Applications and Registrations
Patent applications and USPTO patent grants for Hsiao; Ru-Shang.The latest application filed is for "finfet mos capacitor".
Company Profile
17.50.60
- Hsiao; Ru-Shang - Jhubei TW
- Hsiao; Ru-Shang - Hsinchu TW
- Hsiao; Ru-Shang - Jhubei City TW
- Hsiao; Ru-Shang - Hsinchu County TW
- Hsiao; Ru-Shang - Hsinchu City TW
Patent Activity
| Patent | Date |
|---|---|
| Gate structure of semiconductor device and method of forming same Grant 11,450,758 - Hsiao , et al. September 20, 2 | 2022-09-20 |
| Fabrication of long gate devices Grant 11,444,175 - Yang , et al. September 13, 2 | 2022-09-13 |
| Semiconductor device and method of manufacturing the same Grant 11,437,495 - Chen , et al. September 6, 2 | 2022-09-06 |
| Semiconductor Device and Method App 20220238521 - Yang; Sung-Hsin ; et al. | 2022-07-28 |
| Finfet Mos Capacitor App 20220238729 - Yang; Sung-Hsin ; et al. | 2022-07-28 |
| Semiconductor Device And Method App 20220223590 - WU; Hsi-Jung ; et al. | 2022-07-14 |
| Novel Structure for Metal Gate Electrode and Method of Fabrication App 20220216317 - Hsiao; Ru-Shang ; et al. | 2022-07-07 |
| Method and Structure for Semiconductor Interconnect App 20220148977 - Hsiao; Ru-Shang ; et al. | 2022-05-12 |
| Structure for metal gate electrode and method of fabrication Grant 11,282,934 - Hsiao , et al. March 22, 2 | 2022-03-22 |
| Semiconductor structure Grant 11,271,102 - Hsiao , et al. March 8, 2 | 2022-03-08 |
| High Voltage Device App 20220068721 - Yang; Sung-Hsin ; et al. | 2022-03-03 |
| Fabrication of Long Gate Devices App 20220068719 - Yang; Sung-Hsin ; et al. | 2022-03-03 |
| Method and structure for semiconductor interconnect Grant 11,232,943 - Hsiao , et al. January 25, 2 | 2022-01-25 |
| Gate Structure Of Semiconductor Device And Method Of Forming Same App 20210391441 - Hsiao; Ru-Shang ; et al. | 2021-12-16 |
| Source/drain Epitaxial Structures For High Voltage Transistors App 20210343596 - YANG; Sung-Hsin ; et al. | 2021-11-04 |
| Input/output Devices App 20210335784 - Yang; Sung-Hsin ; et al. | 2021-10-28 |
| Circuit Structure with Gate Configuration App 20210305386 - Hsiao; Ru-Shang ; et al. | 2021-09-30 |
| Metal Gate Structures And Methods Of Fabricating The Same In Field-Effect Transistors App 20210257481 - Hsiao; Ru-Shang ; et al. | 2021-08-19 |
| Semiconductor Device And Method Of Manufacturing The Same App 20210210616 - CHEN; I-Chih ; et al. | 2021-07-08 |
| High Voltage Devices App 20210202321 - Yang; Sung-Hsin ; et al. | 2021-07-01 |
| P-Type FinFET as an Radio-Frequency Device and Method Forming Same App 20210159326 - Hsiao; Ru-Shang ; et al. | 2021-05-27 |
| Methods For Forming Semiconductor Structure App 20210104619 - TSAI; CHUN HSIUNG ; et al. | 2021-04-08 |
| Novel Structure for Metal Gate Electrode and Method of Fabrication App 20210028290 - Hsiao; Ru-Shang ; et al. | 2021-01-28 |
| Semiconductor device and method of manufacturing the same Grant 10,903,336 - Chen , et al. January 26, 2 | 2021-01-26 |
| Methods for forming semiconductor structure Grant 10,847,636 - Tsai , et al. November 24, 2 | 2020-11-24 |
| Method and Structure for Semiconductor Interconnect App 20200343088 - Hsiao; Ru-Shang ; et al. | 2020-10-29 |
| Method Of Forming Semiconductor Device With Gate App 20200295188 - JENG; Jung-Chi ; et al. | 2020-09-17 |
| Method of forming semiconductor device with gate Grant 10,680,103 - Jeng , et al. | 2020-06-09 |
| Semiconductor structure and manufacturing method thereof Grant 10,651,041 - Hsiao , et al. | 2020-05-12 |
| Semiconductor Structure App 20200127131 - HSIAO; Ru-Shang ; et al. | 2020-04-23 |
| Methods For Forming Semiconductor Structure App 20200075748 - TSAI; CHUN HSIUNG ; et al. | 2020-03-05 |
| Semiconductor structure Grant 10,510,877 - Hsiao , et al. Dec | 2019-12-17 |
| Semiconductor Structure And Manufacturing Method Thereof App 20190287806 - HSIAO; RU-SHANG ; et al. | 2019-09-19 |
| Semiconductor structure and manufacturing method thereof Grant 10,312,092 - Hsiao , et al. | 2019-06-04 |
| Semiconductor Device And Method Of Manufacturing The Same App 20190165126 - CHEN; I-Chih ; et al. | 2019-05-30 |
| Method for forming semiconductor device with P/N stacked layers Grant 10,297,691 - Chen , et al. | 2019-05-21 |
| Fin-type field effect transistor structure and manufacturing method thereof Grant 10,153,278 - Hsieh , et al. Dec | 2018-12-11 |
| Semiconductor Structure App 20180277672 - HSIAO; RU-SHANG ; et al. | 2018-09-27 |
| Air-gap scheme for BEOL process Grant 10,062,603 - Hsiao , et al. August 28, 2 | 2018-08-28 |
| Semiconductor device and method of fabricating the same Grant 10,056,455 - Kuan , et al. August 21, 2 | 2018-08-21 |
| Sandwich EPI channel for device enhancement Grant 10,008,501 - Hsiao , et al. June 26, 2 | 2018-06-26 |
| Semiconductor devices, FinFET devices and methods of forming the same Grant 9,997,633 - Hsiao , et al. June 12, 2 | 2018-06-12 |
| Semiconductor structures Grant 9,985,122 - Hsiao , et al. May 29, 2 | 2018-05-29 |
| Semiconductor Structure And Manufacturing Method Thereof App 20180144943 - HSIAO; RU-SHANG ; et al. | 2018-05-24 |
| Fin field effect transistor and method for fabricating the same Grant 9,929,268 - Wu , et al. March 27, 2 | 2018-03-27 |
| Method For Fabricating Finfet With P/n Stacked Fins App 20180076314 - CHEN; Hung-Pin ; et al. | 2018-03-15 |
| Structure and method for semiconductor device Grant 9,893,150 - Chiang , et al. February 13, 2 | 2018-02-13 |
| Semiconductor structure and manufacturing method thereof Grant 9,892,924 - Hsiao , et al. February 13, 2 | 2018-02-13 |
| FinFET with P/N stacked fins and method for fabricating the same Grant 9,842,932 - Chen , et al. December 12, 2 | 2017-12-12 |
| Finfet With P/n Stacked Fins And Method For Fabricating The Same App 20170345923 - CHEN; Hung-Pin ; et al. | 2017-11-30 |
| Method Of Forming Semiconductor Device With Gate App 20170338342 - JENG; Jung-Chi ; et al. | 2017-11-23 |
| Fin Field Effect Transistor And Method For Fabricating The Same App 20170301793 - Wu; Chii-Ming ; et al. | 2017-10-19 |
| Fin Field Effect Transistor And Method For Fabricating The Same App 20170250268 - Hsiao; Ru-Shang ; et al. | 2017-08-31 |
| Mechanism for forming semiconductor device with gate Grant 9,728,637 - Jeng , et al. August 8, 2 | 2017-08-08 |
| Device boost by quasi-FinFET Grant 9,634,122 - Hsiao , et al. April 25, 2 | 2017-04-25 |
| Semiconductor Devices, Finfet Devices And Methods Of Forming The Same App 20170098711 - Hsiao; Ru-Shang ; et al. | 2017-04-06 |
| Modified channel position to suppress hot carrier injection in FinFETs Grant 9,570,561 - Hsiao , et al. February 14, 2 | 2017-02-14 |
| Dual vertical channel Grant 9,564,487 - Hsiao , et al. February 7, 2 | 2017-02-07 |
| Formation method of semiconductor device that includes performing hydrogen-containing plasma treatment on metal gate stack Grant 9,558,955 - Hsiao , et al. January 31, 2 | 2017-01-31 |
| Device having sloped gate profile and method of manufacture Grant 9,543,399 - Hsiao , et al. January 10, 2 | 2017-01-10 |
| Sandwich Epi Channel For Device Enhancement App 20170005095 - Hsiao; Ru-Shang ; et al. | 2017-01-05 |
| Semiconductor Structures App 20160343822 - Hsiao; Ru-Shang ; et al. | 2016-11-24 |
| Air-gap Scheme For Beol Process App 20160336216 - Hsiao; Ru-Shang ; et al. | 2016-11-17 |
| Fin sidewall removal to enlarge epitaxial source/drain volume Grant 9,490,254 - Hsiao , et al. November 8, 2 | 2016-11-08 |
| Sandwich epi channel for device enhancement Grant 9,466,670 - Hsiao , et al. October 11, 2 | 2016-10-11 |
| Semiconductor Structure And Manufacturing Method Thereof App 20160276158 - HSIAO; RU-SHANG ; et al. | 2016-09-22 |
| Air-gap scheme for BEOL process Grant 9,449,811 - Hsiao , et al. September 20, 2 | 2016-09-20 |
| Structure And Formation Method Of Semiconductor Device With Metal Gate Stack App 20160225630 - HSIAO; Ru-Shang ; et al. | 2016-08-04 |
| Structure and Method for Semiconductor Device App 20160155806 - Chiang; Chen-Chieh ; et al. | 2016-06-02 |
| Shallow trench isolation structure Grant 9,318,371 - Hsiao , et al. April 19, 2 | 2016-04-19 |
| Methods of stress engineering to reduce dark current of CMOS image sensors Grant 9,299,734 - Hsiao , et al. March 29, 2 | 2016-03-29 |
| Re-crystallization for boosting stress in MOS device Grant 9,287,139 - Hsiao , et al. March 15, 2 | 2016-03-15 |
| Mechanism for forming gate Grant 9,281,215 - Jeng , et al. March 8, 2 | 2016-03-08 |
| Fin Sidewall Removal To Enlarge Epitaxial Source/drain Volume App 20160035726 - Hsiao; Ru-Shang ; et al. | 2016-02-04 |
| Air-gap offset spacer in FinFET structure Grant 9,252,233 - Hsiao , et al. February 2, 2 | 2016-02-02 |
| Structure and method for semiconductor device Grant 9,246,002 - Hsiao , et al. January 26, 2 | 2016-01-26 |
| Three-direction alignment mark Grant 9,217,917 - Hsiao , et al. December 22, 2 | 2015-12-22 |
| N/P MOS FinFET performance enhancement by specific orientation surface Grant 9,209,304 - Hsiao , et al. December 8, 2 | 2015-12-08 |
| Fin sidewall removal to enlarge epitaxial source/drain volume Grant 9,159,812 - Hsiao , et al. October 13, 2 | 2015-10-13 |
| Device Having Sloped Gate Profile and Method of Manufacture App 20150287798 - Hsiao; Ru-Shang ; et al. | 2015-10-08 |
| Fin Sidewall Removal To Enlarge Epitaxial Source/drain Volume App 20150279975 - Hsiao; Ru-Shang ; et al. | 2015-10-01 |
| Structure and Method for Semiconductor Device App 20150263168 - Hsiao; Ru-Shang ; et al. | 2015-09-17 |
| Sandwich Epi Channel For Device Enhancement App 20150263092 - Hsiao; Ru-Shang ; et al. | 2015-09-17 |
| Device Boost By Quasi-finfet App 20150263136 - Hsiao; Ru-Shang ; et al. | 2015-09-17 |
| Air-gap Scheme For Beol Process App 20150262929 - Hsiao; Ru-Shang ; et al. | 2015-09-17 |
| Air-gap Offset Spacer In Finfet Structure App 20150263122 - Hsiao; Ru-Shang ; et al. | 2015-09-17 |
| Re-crystallization For Boosting Stress In Mos Device App 20150243526 - Hsiao; Ru-Shang ; et al. | 2015-08-27 |
| Shallow Trench Isolation Structure App 20150243653 - Hsiao; Ru-Shang ; et al. | 2015-08-27 |
| Three-Direction Alignment Mark App 20150241768 - Hsiao; Ru-Shang ; et al. | 2015-08-27 |
| Dual Vertical Channel App 20150236094 - Hsiao; Ru-Shang ; et al. | 2015-08-20 |
| Modified Channel Position To Suppress Hot Carrier Injection In Finfets App 20150228731 - Hsiao; Ru-Shang ; et al. | 2015-08-13 |
| N/p Mos Finfet Performance Enhancement By Specific Orientation Surface App 20150228794 - Hsiao; Ru-Shang ; et al. | 2015-08-13 |
| Mechanism For Forming Semiconductor Device With Gate App 20150129987 - JENG; Jung-Chi ; et al. | 2015-05-14 |
| Mechanism For Forming Gate App 20150129940 - JENG; Jung-Chi ; et al. | 2015-05-14 |
| Local oxidation of silicon processes with reduced lateral oxidation Grant 8,778,717 - Hsiao , et al. July 15, 2 | 2014-07-15 |
| Stress Engineering To Reduce Dark Current Of Cmos Image Sensors App 20140001523 - HSIAO; Ru-Shang ; et al. | 2014-01-02 |
| Stress engineering to reduce dark current of CMOS image sensors Grant 8,546,860 - Hsiao , et al. October 1, 2 | 2013-10-01 |
| Sensor element isolation in a backside illuminated image sensor Grant 8,389,377 - Hsiao , et al. March 5, 2 | 2013-03-05 |
| Stress Engineering To Reduce Dark Current Of Cmos Image Sensors App 20120248515 - HSIAO; Ru-Shang ; et al. | 2012-10-04 |
| Stress engineering to reduce dark current of CMOS image sensors Grant 8,216,905 - Hsiao , et al. July 10, 2 | 2012-07-10 |
| Semiconductor device with localized stressor Grant 8,158,474 - Hsiao , et al. April 17, 2 | 2012-04-17 |
| Stress Engineering To Reduce Dark Current Of Cmos Image Sensors App 20110260223 - HSIAO; Ru-Shang ; et al. | 2011-10-27 |
| Sensor Element Isolation In A Backside Illuminated Image Sensor App 20110241152 - Hsiao; Ru-Shang ; et al. | 2011-10-06 |
| Local Oxidation of Silicon Processes with Reduced Lateral Oxidation App 20110230002 - Hsiao; Ru-Shang ; et al. | 2011-09-22 |
| Semiconductor Device With Localized Stressor App 20100330755 - Hsiao; Ru-Shang ; et al. | 2010-12-30 |
| Semiconductor device with localized stressor Grant 7,825,477 - Hsiao , et al. November 2, 2 | 2010-11-02 |
| Semiconductor Device with Localized Stressor App 20080258233 - Hsiao; Ru-Shang ; et al. | 2008-10-23 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 