HOWARD; Bradley J.

Patent Applications and Registrations

Patent applications and USPTO patent grants for HOWARD; Bradley J..The latest application filed is for "chamber body design architecture for next generation advanced plasma technology".

Company Profile

0.33.31

HOWARD; Bradley J. - Pleasanton CA
Howard; Bradley J. - Boise ID
Howard; Bradley J. - Livermore CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Chamber Body Design Architecture For Next Generation Advanced Plasma Technology App 20220213959 - HOWARD; Bradley J. ; et al.	2022-07-07
Chamber body design architecture for next generation advanced plasma technology Grant 11,333,246 - Nguyen , et al. May 17, 2	2022-05-17
Methods for etching a metal layer to form an interconnection structure for semiconductor applications Grant 9,960,052 - Agarwal , et al. May 1, 2	2018-05-01
Chamber Body Design Architecture For Next Generation Advanced Plasma Technology App 20160215883 - NGUYEN; ANDREW ; et al.	2016-07-28
Methods for cyclically etching a metal layer for an interconnection structure for semiconductor applications Grant 9,359,679 - Agarwal , et al. June 7, 2	2016-06-07
Methods For Cyclically Etching A Metal Layer For An Interconnection Structure For Semiconductor Applications App 20160097131 - AGARWAL; Sumit ; et al.	2016-04-07
Methods For Etching A Barrier Layer For An Interconnection Structure For Semiconductor Applications App 20160099173 - AGARWAL; Sumit ; et al.	2016-04-07
Methods For Etching A Metal Layer To Form An Interconnection Structure For Semiconductor Appilcations App 20150287634 - AGARWAL; Sumit ; et al.	2015-10-08
Recessing Ultra-low K Dielectric Using Remote Plasma Source App 20150200042 - Ling; Mang Mang ; et al.	2015-07-16
Method of controlling striations and CD loss in contact oxide etch Grant 8,093,155 - Li , et al. January 10, 2	2012-01-10
Optical system and methods for monitoring erosion of electrostatic chuck edge bead materials Grant 7,952,694 - Howard , et al. May 31, 2	2011-05-31
Electrical and optical system and methods for monitoring erosion of electrostatic chuck edge bead materials Grant 7,884,925 - Howard , et al. February 8, 2	2011-02-08
Optical System And Methods For Monitoring Erosion Of Electrostatic Chuck Edge Bead Materials App 20110007303 - Howard; Bradley J. ; et al.	2011-01-13
Multifrequency plasma reactor Grant 7,625,460 - Howard December 1, 2	2009-12-01
Electrical And Optical System And Methods For Monitoring Erosion Of Electrostatic Chuck Edge Bead Materials App 20090290145 - Howard; Bradley J. ; et al.	2009-11-26
Plasma etching methods and contact opening forming methods Grant 7,615,164 - Howard , et al. November 10, 2	2009-11-10
Etch aided by electrically shorting upper and lower sidewall portions during the formation of a semiconductor device Grant 7,573,116 - Howard , et al. August 11, 2	2009-08-11
Barrier layer, IC via, and IC line forming methods Grant 7,538,028 - Sandu , et al. May 26, 2	2009-05-26
Method Of Controlling Striations And Cd Loss In Contact Oxide Etch App 20090081877 - Li; Li ; et al.	2009-03-26
Method of plasma etching a substrate Grant 7,470,625 - Li , et al. December 30, 2	2008-12-30
Process for using photo-definable layers in the manufacture of semiconductor devices and resulting structures of same Grant 7,323,292 - Howard January 29, 2	2008-01-29
Barrier layer, IC via, and IC line forming methods Grant 7,271,089 - Sandu , et al. September 18, 2	2007-09-18
Method of forming contact openings Grant 7,255,803 - Howard , et al. August 14, 2	2007-08-14
Etch aided by electrically shorting upper and lower sidewall portions during the formation of a semiconductor device App 20060281319 - Howard; Bradley J. ; et al.	2006-12-14
Barrier layer, IC via, and IC line forming methods App 20060264037 - Sandhu; Gurtej S. ; et al.	2006-11-23
Method of forming contact openings App 20060255011 - Howard; Bradley J. ; et al.	2006-11-16
Method of plasma etching a substrate App 20060252198 - Li; Li ; et al.	2006-11-09
Method of plasma etching a substrate Grant 7,122,480 - Li , et al. October 17, 2	2006-10-17
Method of in-situ chamber cleaning App 20060201624 - Howard; Bradley J.	2006-09-14
Etch aided by electrically shorting upper and lower sidewall portions during the formation of a semiconductor device Grant 7,094,699 - Howard , et al. August 22, 2	2006-08-22
Multifrequency plasma reactor and method of etching App 20060054596 - Howard; Bradley J.	2006-03-16
Barrier layer, IC via, and IC line forming methods App 20060046472 - Sandhu; Gurtej S. ; et al.	2006-03-02
Plasma etching methods and contact opening forming methods App 20050284843 - Howard, Bradley J. ; et al.	2005-12-29
Plasma etching methods Grant 6,958,297 - Becker , et al. October 25, 2	2005-10-25
Method of plasma etching a substrate App 20050056875 - Li, Li ; et al.	2005-03-17
Multi-frequency plasma reactor and method of etching App 20050022933 - Howard, Bradley J.	2005-02-03
Plasma etching methods Grant 6,812,154 - Becker , et al. November 2, 2	2004-11-02
Etch aided by electrically shorting upper and lower sidewall portions during the formation of a semiconductor device App 20040203240 - Howard, Bradley J. ; et al.	2004-10-14
Method of controlling striations and CD loss in contact oxide etch Grant 6,753,264 - Li , et al. June 22, 2	2004-06-22
Process for using photo-definable layers in the manufacture of semiconductor devices and resulting structures of same App 20040101784 - Howard, Bradley J.	2004-05-27
Etch aided by electrically shorting upper and lower sidewall portions during the formation of a semiconductor device Grant 6,730,609 - Howard , et al. May 4, 2	2004-05-04
Method of controlling striations and CD loss in contact oxide etch Grant 6,716,763 - Li , et al. April 6, 2	2004-04-06
Method of in-situ chamber cleaning App 20040025903 - Howard, Bradley J.	2004-02-12
Plasma etching methods App 20030207581 - Becker, David S. ; et al.	2003-11-06
Method of controlling striations and CD loss in contact oxide etch App 20030096506 - Li, Li ; et al.	2003-05-22
Etch aided by electrically shorting upper and lower sidewall portions during the formation of a semiconductor device App 20030068896 - Howard, Bradley J. ; et al.	2003-04-10
Plasma etching methods App 20030036283 - Becker, David S. ; et al.	2003-02-20
Method For Manufacturing Tapered Openings Using An Anisotropic Etch During The Formation Of A Semiconductor Device App 20030017638 - Figura, Thomas A. ; et al.	2003-01-23
Process for using photo-definable layers in the manufacture of semiconductor devices and resulting structures of same App 20030008513 - Howard, Bradley J.	2003-01-09
Plasma etching methods Grant 6,492,279 - Becker , et al. December 10, 2	2002-12-10
Formation of a self-aligned structure Grant 6,420,259 - Howard July 16, 2	2002-07-16
Process For Using Photo-definable Layers In The Manufacture Of Semiconductor Devices And Resulting Structures Of Same App 20020039809 - HOWARD, BRADLEY J.	2002-04-04
Method of controlling striations and CD loss in contact oxide etch App 20020019140 - Li, Li ; et al.	2002-02-14
Method of controlling striations and CD loss in contact oxide etch App 20010050413 - Li, Li ; et al.	2001-12-13
Self-limiting method of reducing contamination in a contact opening, method of making contacts and semiconductor devices therewith, and resulting structures Grant 6,232,219 - Blalock , et al. May 15, 2	2001-05-15
Semiconductor processing methods, and methods of forming capacitors Grant 6,127,239 - Jost , et al. October 3, 2	2000-10-03
Method of forming an integrated circuit structure Grant 6,117,767 - Howard September 12, 2	2000-09-12
Apparatus for improving the performance of a temperature-sensitive etch process Grant 6,056,850 - Blalock , et al. May 2, 2	2000-05-02
Method for forming a contact during the formation of a semiconductor device Grant 6,046,505 - Howard April 4, 2	2000-04-04
Capacitor and method for forming a capacitor Grant 6,028,763 - Howard February 22, 2	2000-02-22
Method of forming recessed container cells Grant 5,888,877 - Dennison , et al. March 30, 1	1999-03-30
Mask having a tapered profile used during the formation of a semiconductor device Grant 5,750,441 - Figura , et al. May 12, 1	1998-05-12
Method for forming a contact during the formation of a semiconductor device Grant 5,686,357 - Howard November 11, 1	1997-11-11
Method of forming a capacitor using a photoresist contact sidewall having standing wave ripples Grant 5,438,011 - Blalock , et al. August 1, 1	1995-08-01

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