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Patent applications and USPTO patent grants for Hinckley; Kimberly.The latest application filed is for "chemical control features in wafer process equipment".
Patent | Date |
---|---|
Chemical control features in wafer process equipment Grant 11,264,213 - Liang , et al. March 1, 2 | 2022-03-01 |
Chemical Control Features In Wafer Process Equipment App 20190385823 - Liang; Qiwei ;   et al. | 2019-12-19 |
Chemical control features in wafer process equipment Grant 10,354,843 - Liang , et al. July 16, 2 | 2019-07-16 |
Chemical control features in wafer process equipment Grant 9,978,564 - Liang , et al. May 22, 2 | 2018-05-22 |
Chemical Control Features In Wafer Process Equipment App 20170236691 - Liang; Qiwei ;   et al. | 2017-08-17 |
Chemical Control Features In Wafer Process Equipment App 20160005572 - Liang; Qiwei ;   et al. | 2016-01-07 |
Chemical control features in wafer process equipment Grant 9,132,436 - Liang , et al. September 15, 2 | 2015-09-15 |
Chemical Control Features In Wafer Process Equipment App 20140097270 - Liang; Qiwei ;   et al. | 2014-04-10 |
Methods For Fabricating Faceplate Of Semiconductor Apparatus App 20100071210 - TAN; TIEN FAK ;   et al. | 2010-03-25 |
Chamber Components For Cvd Applications App 20100006032 - Hinckley; Kimberly ;   et al. | 2010-01-14 |
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