HENRI; Jon

Patent Applications and Registrations

Patent applications and USPTO patent grants for HENRI; Jon.The latest application filed is for "carbon based depositions used for critical dimension control during high aspect ratio feature etches and for forming protective layers".

Company Profile

8.63.42

HENRI; Jon - West Linn OR
Henri; Jon - Linn OR
Henri; Jon - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Carbon Based Depositions Used For Critical Dimension Control During High Aspect Ratio Feature Etches And For Forming Protective Layers App 20220199417 - HENRI; Jon ; et al.	2022-06-23
Selective Deposition Of Etch-stop Layer For Enhanced Patterning App 20210358753 - Shankar; Nagraj ; et al.	2021-11-18
Selective growth of metal-containing hardmask thin films Grant 11,107,683 - Smith , et al. August 31, 2	2021-08-31
Selective deposition of etch-stop layer for enhanced patterning Grant 11,094,542 - Shankar , et al. August 17, 2	2021-08-17
Suppressing interfacial reactions by varying the wafer temperature throughout deposition Grant 11,075,127 - Varadarajan , et al. July 27, 2	2021-07-27
Selective inhibition in atomic layer deposition of silicon-containing films Grant 10,804,099 - Henri , et al. October 13, 2	2020-10-13
Methods for depositing films on sensitive substrates Grant 10,741,458 - Kang , et al. A	2020-08-11
Selective Growth Of Metal-containing Hardmask Thin Films App 20200227260 - Smith; David Charles ; et al.	2020-07-16
Selective Deposition Of Etch-stop Layer For Enhanced Patterning App 20200168466 - Shankar; Nagraj ; et al.	2020-05-28
Selective growth of metal-containing hardmask thin films Grant 10,643,846 - Smith , et al.	2020-05-05
Suppressing Interfacial Reactions By Varying The Wafer Temperature Throughout Deposition App 20200066607 - Varadarajan; Seshasayee ; et al.	2020-02-27
Selective deposition of etch-stop layer for enhanced patterning Grant 10,566,194 - Shankar , et al. Feb	2020-02-18
Selective Growth Of Metal-containing Hardmask Thin Films App 20200006073 - Smith; David Charles ; et al.	2020-01-02
Selective Deposition Of Etch-stop Layer For Enhanced Patterning App 20190341256 - Shankar; Nagraj ; et al.	2019-11-07
Suppressing interfacial reactions by varying the wafer temperature throughout deposition Grant 10,347,547 - Varadarajan , et al. July 9, 2	2019-07-09
Methods For Depositing Films On Sensitive Substrates App 20180247875 - Kang; Hu ; et al.	2018-08-30
Plasma activated conformal dielectric film deposition Grant 10,043,655 - Swaminathan , et al. August 7, 2	2018-08-07
Method for depositing ALD films using halide-based precursors Grant 10,020,188 - Sims , et al. July 10, 2	2018-07-10
Methods for depositing films on sensitive substrates Grant 10,008,428 - Kang , et al. June 26, 2	2018-06-26
Selective Inhibition In Atomic Layer Deposition Of Silicon-containing Films App 20180138028 - Henri; Jon ; et al.	2018-05-17
Method For Depositing Ald Films Using Halide-based Precursors App 20180102245 - Sims; James S. ; et al.	2018-04-12
Suppressing Interfacial Reactions By Varying The Wafer Temperature Throughout Deposition App 20180047645 - Varadarajan; Seshasayee ; et al.	2018-02-15
Selective inhibition in atomic layer deposition of silicon-containing films Grant 9,875,891 - Henri , et al. January 23, 2	2018-01-23
Method for depositing metals free ald silicon nitride films using halide-based precursors Grant 9,824,884 - Sims , et al. November 21, 2	2017-11-21
Methods For Depositing Films On Sensitive Substrates App 20170316988 - Kang; Hu ; et al.	2017-11-02
Methods for depositing films on sensitive substrates Grant 9,786,570 - Kang , et al. October 10, 2	2017-10-10
Method for depositing a chlorine-free conformal SiN film Grant 9,670,579 - Hausmann , et al. June 6, 2	2017-06-06
Plasma Activated Conformal Dielectric Film Deposition App 20170148628 - Swaminathan; Shankar ; et al.	2017-05-25
Selective Inhibition In Atomic Layer Deposition Of Silicon-containing Films App 20170117134 - Henri; Jon ; et al.	2017-04-27
Method For Encapsulating A Chalcogenide Material App 20170092856 - Henri; Jon ; et al.	2017-03-30
Method for encapsulating a chalcogenide material Grant 9,601,693 - Henri , et al. March 21, 2	2017-03-21
Method of depositing ammonia free and chlorine free conformal silicon nitride film Grant 9,589,790 - Henri , et al. March 7, 2	2017-03-07
Plasma activated conformal dielectric film deposition Grant 9,570,274 - Swaminathan , et al. February 14, 2	2017-02-14
Selective inhibition in atomic layer deposition of silicon-containing films Grant 9,564,312 - Henri , et al. February 7, 2	2017-02-07
Deposition of conformal films by atomic layer deposition and atomic layer etch Grant 9,502,238 - Danek , et al. November 22, 2	2016-11-22
Deposition Of Conformal Films By Atomic Layer Deposition And Atomic Layer Etch App 20160293398 - Danek; Michal ; et al.	2016-10-06
Method to integrate a halide-containing ALD film on sensitive materials Grant 9,385,318 - Henri July 5, 2	2016-07-05
Methods For Depositing Films On Sensitive Substrates App 20160155676 - Kang; Hu ; et al.	2016-06-02
Selective Inhibition In Atomic Layer Deposition Of Silicon-containing Films App 20160148800 - Henri; Jon ; et al.	2016-05-26
Method Of Depositing Ammonia Free And Chlorine Free Conformal Silicon Nitride Film App 20160148806 - Henri; Jon ; et al.	2016-05-26
Methods for depositing films on sensitive substrates Grant 9,287,113 - Kang , et al. March 15, 2	2016-03-15
Methods of depositing smooth and conformal ashable hard mask films Grant 9,240,320 - Subramonium , et al. January 19, 2	2016-01-19
Plasma activated conformal film deposition Grant 9,230,800 - LaVoie , et al. January 5, 2	2016-01-05
Methods and apparatuses for uniform reduction of the in-feature wet etch rate of a silicon nitride film formed by ALD Grant 9,214,333 - Sims , et al. December 15, 2	2015-12-15
Method For Depositing A Chlorine-free Conformal Sin Film App 20150259791 - Hausmann; Dennis ; et al.	2015-09-17
Temperature Controlled Showerhead For High Temperature Operations App 20150218701 - Bartlett; Christopher M. ; et al.	2015-08-06
Plasma Activated Conformal Dielectric Film Deposition App 20150206719 - Swaminathan; Shankar ; et al.	2015-07-23
Plasma enhanced atomic layer deposition with pulsed plasma exposure Grant 9,076,646 - Sims , et al. July 7, 2	2015-07-07
Method for depositing a chlorine-free conformal sin film Grant 9,070,555 - Hausmann , et al. June 30, 2	2015-06-30
Temperature controlled showerhead for high temperature operations Grant 9,034,142 - Bartlett , et al. May 19, 2	2015-05-19
Plasma activated conformal dielectric film deposition Grant 8,999,859 - Swaminathan , et al. April 7, 2	2015-04-07
Methods and apparatus for plasma-based deposition Grant 8,962,101 - Subramonium , et al. February 24, 2	2015-02-24
Plasma Activated Conformal Dielectric Film Deposition App 20140216337 - Swaminathan; Shankar ; et al.	2014-08-07
Plasma Activated Conformal Film Deposition App 20140209562 - LaVoie; Adrien ; et al.	2014-07-31
Methods For Depositing Films On Sensitive Substrates App 20140141542 - Kang; Hu ; et al.	2014-05-22
Method For Depositing A Chlorine-free Conformal Sin Film App 20140141626 - Hausmann; Dennis ; et al.	2014-05-22
Plasma activated conformal film deposition Grant 8,728,956 - LaVoie , et al. May 20, 2	2014-05-20
Plasma Enhanced Atomic Layer Deposition With Pulsed Plasma Exposure App 20140113457 - Sims; James S. ; et al.	2014-04-24
Diffusion barrier and etch stop films Grant 8,669,181 - Yu , et al. March 11, 2	2014-03-11
Methods And Apparatus For Plasma-based Deposition App 20140057454 - Subramonium; Pramod ; et al.	2014-02-27
Plasma Clean Method For Deposition Chamber App 20140053867 - Fang; Zhiyuan ; et al.	2014-02-27
Methods For Uv-assisted Conformal Film Deposition App 20140051262 - Lavoie; Adrien ; et al.	2014-02-20
Methods for UV-assisted conformal film deposition Grant 8,647,993 - LaVoie , et al. February 11, 2	2014-02-11
Plasma activated conformal dielectric film deposition Grant 8,637,411 - Swaminathan , et al. January 28, 2	2014-01-28
Method for depositing a chlorine-free conformal sin film Grant 8,592,328 - Hausmann , et al. November 26, 2	2013-11-26
Plasma clean method for deposition chamber Grant 8,591,659 - Fang , et al. November 26, 2	2013-11-26
Methods For Uv-assisted Conformal Film Deposition App 20130196516 - Lavoie; Adrien ; et al.	2013-08-01
Method For Depositing A Chlorine-free Conformal Sin Film App 20130189854 - Hausmann; Dennis ; et al.	2013-07-25
Methods of depositing smooth and conformal ashable hard mask films Grant 8,435,608 - Subramonium , et al. May 7, 2	2013-05-07
High compressive stress carbon liners for MOS devices Grant 8,362,571 - Wu , et al. January 29, 2	2013-01-29
Increasing Etch Selectivity Of Carbon Films With Lower Absorption Co-efficient And Stress App 20120258261 - Reddy; Sirish ; et al.	2012-10-11
Pulsed PECVD method for modulating hydrogen content in hard mask Grant 8,110,493 - Subramonium , et al. February 7, 2	2012-02-07
Plasma Activated Conformal Dielectric Film Deposition App 20120028454 - Swaminathan; Shankar ; et al.	2012-02-02
Edge removal of films using externally generated plasma species Grant 8,100,081 - Henri , et al. January 24, 2	2012-01-24
Silicon Nitride Films And Methods App 20110256734 - Hausmann; Dennis M. ; et al.	2011-10-20
Plasma Activated Conformal Film Deposition App 20110256726 - LaVoie; Adrien ; et al.	2011-10-20
Method of eliminating small bin defects in high throughput TEOS films Grant 8,034,725 - Henri , et al. October 11, 2	2011-10-11
Methods of depositing stable and hermetic ashable hardmask films Grant 7,981,777 - Subramonium , et al. July 19, 2	2011-07-19
Methods of depositing highly selective transparent ashable hardmask films Grant 7,981,810 - Subramonium , et al. July 19, 2	2011-07-19
Temperature Controlled Showerhead For High Temperature Operations App 20110146571 - Bartlett; Christopher M. ; et al.	2011-06-23
Method for improved thickness repeatability of PECVD deposited carbon films Grant 7,955,990 - Henri , et al. June 7, 2	2011-06-07
Method of reducing defects in PECVD TEOS films Grant 7,923,376 - Dhas , et al. April 12, 2	2011-04-12
Diffusion barrier and etch stop films Grant 7,915,166 - Yu , et al. March 29, 2	2011-03-29
High compressive stress carbon liners for MOS devices Grant 7,906,817 - Wu , et al. March 15, 2	2011-03-15
Method For Improved Thickness Repeatability Of Pecvd Deposited Carbon Films App 20100151691 - Henri; Jon ; et al.	2010-06-17
Method of eliminating small bin defects in high throughput TEOS films Grant 7,704,894 - Henri , et al. April 27, 2	2010-04-27
Pulsed PECVD method for modulating hydrogen content in hard mask Grant 7,381,644 - Subramonium , et al. June 3, 2	2008-06-03
Anode and anode chamber for copper electroplating Grant 6,821,407 - Reid , et al. November 23, 2	2004-11-23
Electroplating process for avoiding defects in metal features of integrated circuit devices Grant 6,793,796 - Reid , et al. September 21, 2	2004-09-21
Method for controlling the grain size of tungsten films Grant 6,524,956 - Tian , et al. February 25, 2	2003-02-25
Controlled induction by use of power supply trigger in electrochemical processing Grant 6,440,291 - Henri , et al. August 27, 2	2002-08-27
Electroplating process for avoiding defects in metal features of integrated circuit devices App 20010015321 - Reid, Jonathan D. ; et al.	2001-08-23
Process for forming a via in an integrated circuit structure by etching through an insulation layer while inhibiting sputtering of underlying metal Grant 5,176,790 - Arleo , et al. January 5, 1	1993-01-05

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