Hausmann; Dennis M.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hausmann; Dennis M..The latest application filed is for "vacuum-integrated hardmask processes and apparatus".

Company Profile

31.61.49

Hausmann; Dennis M. - Lake Oswego OR
Hausmann; Dennis M. - Los Gatos CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Selective deposition using hydrolysis Grant 11,404,275 - Hausmann , et al. August 2, 2	2022-08-02
Vacuum-integrated Hardmask Processes And Apparatus App 20220075260 - Marks; Jeffrey ; et al.	2022-03-10
Gapfill Of Variable Aspect Ratio Features With A Composite Peald And Pecvd Method App 20220059348 - Kang; Hu ; et al.	2022-02-24
Vacuum-integrated hardmask processes and apparatus Grant 11,209,729 - Marks , et al. December 28, 2	2021-12-28
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method Grant 11,133,180 - Kang , et al. September 28, 2	2021-09-28
Selective growth of metal-containing hardmask thin films Grant 11,107,683 - Smith , et al. August 31, 2	2021-08-31
Selective deposition with atomic layer etch reset Grant 10,998,187 - Reddy , et al. May 4, 2	2021-05-04
Selective Processing With Etch Residue-based Inhibitors App 20210098257 - Sharma; Kashish ; et al.	2021-04-01
Selective deposition of silicon oxide Grant 10,903,071 - Smith , et al. January 26, 2	2021-01-26
Selective Deposition Using Hydrolysis App 20210005460 - Hausmann; Dennis M. ; et al.	2021-01-07
Conformality modulation of metal oxide films using chemical inhibition Grant 10,843,618 - Smith , et al. November 24, 2	2020-11-24
Vacuum-integrated hardmask processes and apparatus Grant 10,831,096 - Marks , et al. November 10, 2	2020-11-10
Selective growth of SIO2 on dielectric surfaces in the presence of copper Grant 10,825,679 - Hausmann , et al. November 3, 2	2020-11-03
Selective inhibition in atomic layer deposition of silicon-containing films Grant 10,804,099 - Henri , et al. October 13, 2	2020-10-13
Deposition of aluminum oxide etch stop layers Grant 10,804,144 - Rainville , et al. October 13, 2	2020-10-13
Selective deposition of silicon nitride on silicon oxide using catalytic control Grant 10,777,407 - Smith , et al. Sept	2020-09-15
Geometrically selective deposition of a dielectric film Grant 10,763,108 - Hausmann , et al. Sep	2020-09-01
Deposition Of Aluminum Oxide Etch Stop Layers App 20200251384 - Kind Code	2020-08-06
Selective Growth Of Metal-containing Hardmask Thin Films App 20200227260 - Smith; David Charles ; et al.	2020-07-16
Selective Deposition Of Silicon Oxide App 20200219718 - Smith; David Charles ; et al.	2020-07-09
Deposition of Aluminum oxide etch stop layers Grant 10,665,501 - Rainville , et al.	2020-05-26
Integrating Atomic Scale Processes: Ald (atomic Layer Deposition) And Ale (atomic Layer Etch) App 20200161139 - Kanarik; Keren Jacobs ; et al.	2020-05-21
Selective growth of metal-containing hardmask thin films Grant 10,643,846 - Smith , et al.	2020-05-05
Selective deposition of silicon oxide Grant 10,629,429 - Smith , et al.	2020-04-21
Selective Deposition With Atomic Layer Etch Reset App 20200118809 - Reddy; Kapu Sirish ; et al.	2020-04-16
Vacuum-integrated Hardmask Processes And Apparatus App 20200089104 - Marks; Jeffrey ; et al.	2020-03-19
Selective deposition with atomic layer etch reset Grant 10,559,461 - Reddy , et al. Feb	2020-02-11
Selective Growth Of Sio2 On Dielectric Surfaces In The Presence Of Copper App 20200013615 - Hausmann; Dennis M. ; et al.	2020-01-09
Selective Growth Of Metal-containing Hardmask Thin Films App 20200006073 - Smith; David Charles ; et al.	2020-01-02
Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) Grant 10,515,816 - Kanarik , et al. Dec	2019-12-24
Vacuum-integrated hardmask processes and apparatus Grant 10,514,598 - Marks , et al. Dec	2019-12-24
Selective growth of silicon nitride Grant 10,490,413 - Smith , et al. Nov	2019-11-26
Selective growth of SiO2 on dielectric surfaces in the presence of copper Grant 10,460,930 - Hausmann , et al. Oc	2019-10-29
Method for reducing the wet etch rate of a sin film without damaging the underlying substrate Grant 10,454,029 - McKerrow , et al. Oc	2019-10-22
Gapfill Of Variable Aspect Ratio Features With A Composite Peald And Pecvd Method App 20190311897 - Kang; Hu ; et al.	2019-10-10
Technique to deposit sidewall passivation for high aspect ratio cylinder etch Grant 10,373,840 - Hudson , et al.	2019-08-06
Conformality Modulation Of Metal Oxide Films Using Chemical Inhibition App 20190203354 - Smith; David C. ; et al.	2019-07-04
Selective Growth Of Sio2 On Dielectric Surfaces In The Presence Of Copper App 20190157076 - Hausmann; Dennis M. ; et al.	2019-05-23
Selective Deposition Of Silicon Nitride On Silicon Oxide Using Catalytic Control App 20190148128 - Smith; David Charles ; et al.	2019-05-16
Integrating Atomic Scale Processes: Ald (atomic Layer Deposition) And Ale (atomic Layer Etch) App 20190139778 - Kanarik; Keren Jacobs ; et al.	2019-05-09
Etching Metal Oxide Substrates Using Ale And Selective Deposition App 20190131130 - Smith; David Charles ; et al.	2019-05-02
Selective Deposition Of Silicon Oxide App 20190115207 - Smith; David Charles ; et al.	2019-04-18
Vacuum-integrated Hardmask Processes And Apparatus App 20190094685 - Marks; Jeffrey ; et al.	2019-03-28
Selective deposition of silicon nitride on silicon oxide using catalytic control Grant 10,242,866 - Smith , et al.	2019-03-26
Geometrically Selective Deposition Of A Dielectric Film App 20190057858 - Hausmann; Dennis M. ; et al.	2019-02-21
Selective growth of silicon oxide or silicon nitride on silicon surfaces in the presence of silicon oxide Grant 10,199,212 - Smith , et al. Fe	2019-02-05
Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch) Grant 10,186,426 - Kanarik , et al. Ja	2019-01-22
Selective deposition of silicon oxide Grant 10,176,984 - Smith , et al. J	2019-01-08
Bromine containing silicon precursors for encapsulation layers Grant 10,141,505 - Hausmann Nov	2018-11-27
Selective Deposition With Atomic Layer Etch Reset App 20180308680 - Reddy; Kapu Sirish ; et al.	2018-10-25
Selective Growth Of Silicon Nitride App 20180269058 - Smith; David Charles ; et al.	2018-09-20
Selective Growth Of Silicon Oxide Or Silicon Nitride On Silicon Surfaces In The Presence Of Silicon Oxide App 20180261448 - Smith; David Charles ; et al.	2018-09-13
Selective Deposition Of Silicon Nitride On Silicon Oxide Using Catalytic Control App 20180261447 - Smith; David Charles ; et al.	2018-09-13
Selective Deposition Of Silicon Oxide App 20180233349 - Smith; David Charles ; et al.	2018-08-16
Selective growth of silicon oxide or silicon nitride on silicon surfaces in the presence of silicon oxide Grant 10,043,656 - Smith , et al. August 7, 2	2018-08-07
Deposition Of Aluminum Oxide Etch Stop Layers App 20180197770 - Rainville; Meliha Gozde ; et al.	2018-07-12
EUV photopatterning of vapor-deposited metal oxide-containing hardmasks Grant 9,996,004 - Smith , et al. June 12, 2	2018-06-12
Method For Reducing The Wet Etch Rate Of A Sin Film Without Damaging The Underlying Substrate App 20180138405 - McKerrow; Andrew John ; et al.	2018-05-17
Selective Inhibition In Atomic Layer Deposition Of Silicon-containing Films App 20180138028 - Henri; Jon ; et al.	2018-05-17
Bromine Containing Silicon Precursors For Encapsulation Layers App 20180114903 - Hausmann; Dennis M.	2018-04-26
Selective growth of silicon nitride Grant 9,911,595 - Smith , et al. March 6, 2	2018-03-06
Integrating Atomic Scale Processes: Ald (atomic Layer Deposition) And Ale (atomic Layer Etch) App 20180033635 - Kanarik; Keren Jacobs ; et al.	2018-02-01
Multi-station sequential curing of dielectric films Grant 9,873,946 - Haverkamp , et al. January 23, 2	2018-01-23
Selective inhibition in atomic layer deposition of silicon-containing films Grant 9,875,891 - Henri , et al. January 23, 2	2018-01-23
Bromine containing silicon precursors for encapsulation layers Grant 9,865,815 - Hausmann January 9, 2	2018-01-09
Vacuum-integrated Hardmask Processes And Apparatus App 20180004083 - Marks; Jeffrey ; et al.	2018-01-04
Deposition of aluminum oxide etch stop layers Grant 9,859,153 - Rainville , et al. January 2, 2	2018-01-02
Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) Grant 9,805,941 - Kanarik , et al. October 31, 2	2017-10-31
Vacuum-integrated hardmask processes and apparatus Grant 9,778,561 - Marks , et al. October 3, 2	2017-10-03
Euv Photopatterning Of Vapor-deposited Metal Oxide-containing Hardmasks App 20170146909 - Smith; David ; et al.	2017-05-25
Selective Inhibition In Atomic Layer Deposition Of Silicon-containing Films App 20170117134 - Henri; Jon ; et al.	2017-04-27
Integrating Atomic Scale Processes: Ald (atomic Layer Deposition) And Ale (atomic Layer Etch) App 20170117159 - Kanarik; Keren Jacobs ; et al.	2017-04-27
Method For Encapsulating A Chalcogenide Material App 20170092856 - Henri; Jon ; et al.	2017-03-30
Bromine Containing Silicon Precursors For Encapsulation Layers App 20170092857 - Hausmann; Dennis M.	2017-03-30
Method for encapsulating a chalcogenide material Grant 9,601,693 - Henri , et al. March 21, 2	2017-03-21
Method of depositing ammonia free and chlorine free conformal silicon nitride film Grant 9,589,790 - Henri , et al. March 7, 2	2017-03-07
Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) Grant 9,576,811 - Kanarik , et al. February 21, 2	2017-02-21
Selective inhibition in atomic layer deposition of silicon-containing films Grant 9,564,312 - Henri , et al. February 7, 2	2017-02-07
Technique To Deposit Sidewall Passivation For High Aspect Ratio Cylinder Etch App 20160260617 - Hudson; Eric A. ; et al.	2016-09-08
Integrating Atomic Scale Processes: Ald (atomic Layer Deposition) And Ale (atomic Layer Etch) App 20160203995 - Kanarik; Keren Jacobs ; et al.	2016-07-14
Technique to deposit sidewall passivation for high aspect ratio cylinder etch Grant 9,384,998 - Hudson , et al. July 5, 2	2016-07-05
Technique To Deposit Sidewall Passivation For High Aspect Ratio Cylinder Etch App 20160163561 - Hudson; Eric A. ; et al.	2016-06-09
Selective Inhibition In Atomic Layer Deposition Of Silicon-containing Films App 20160148800 - Henri; Jon ; et al.	2016-05-26
Method Of Depositing Ammonia Free And Chlorine Free Conformal Silicon Nitride Film App 20160148806 - Henri; Jon ; et al.	2016-05-26
Plasma activated conformal film deposition Grant 9,230,800 - LaVoie , et al. January 5, 2	2016-01-05
Methods and apparatuses for uniform reduction of the in-feature wet etch rate of a silicon nitride film formed by ALD Grant 9,214,333 - Sims , et al. December 15, 2	2015-12-15
Vacuum-integrated Hardmask Processes And Apparatus App 20150221519 - Marks; Jeffrey ; et al.	2015-08-06
Multi-station Sequential Curing Of Dielectric Films App 20150114292 - Haverkamp; Jason Dirk ; et al.	2015-04-30
Plasma activated conformal dielectric film deposition Grant 8,999,859 - Swaminathan , et al. April 7, 2	2015-04-07
Plasma Activated Conformal Dielectric Film Deposition App 20140216337 - Swaminathan; Shankar ; et al.	2014-08-07
Plasma Activated Conformal Film Deposition App 20140209562 - LaVoie; Adrien ; et al.	2014-07-31
Plasma activated conformal film deposition Grant 8,728,956 - LaVoie , et al. May 20, 2	2014-05-20
Plasma activated conformal dielectric film deposition Grant 8,637,411 - Swaminathan , et al. January 28, 2	2014-01-28
Plasma Activated Conformal Dielectric Film Deposition App 20120028454 - Swaminathan; Shankar ; et al.	2012-02-02
Silicon Nitride Films And Methods App 20110256734 - Hausmann; Dennis M. ; et al.	2011-10-20
Plasma Activated Conformal Film Deposition App 20110256726 - LaVoie; Adrien ; et al.	2011-10-20
Sequential deposition/anneal film densification method Grant 7,790,633 - Tarafdar , et al. September 7, 2	2010-09-07
Metal-free catalysts for pulsed deposition layer process for conformal silica laminates Grant 7,491,653 - Papasouliotis , et al. February 17, 2	2009-02-17
Conformal nanolaminate dielectric deposition and etch bag gap fill process Grant 7,482,247 - Papasouliotis , et al. January 27, 2	2009-01-27
Method for controlling properties of conformal silica nanolaminates formed by rapid vapor deposition Grant 7,297,608 - Papasouliotis , et al. November 20, 2	2007-11-20
Methods for the use of alkoxysilanol precursors for vapor deposition of SiO.sub.2 films Grant 7,294,583 - Rulkens , et al. November 13, 2	2007-11-13
Methods for forming high density, conformal, silica nanolaminate films via pulsed deposition layer in structures of confined geometry Grant 7,271,112 - Papasouliotis , et al. September 18, 2	2007-09-18
Dynamic rapid vapor deposition process for conformal silica laminates Grant 7,223,707 - Papasouliotis , et al. May 29, 2	2007-05-29
Silica thin films produced by rapid surface catalyzed vapor deposition (RVD) using a nucleation layer Grant 7,202,185 - Hausmann , et al. April 10, 2	2007-04-10
Sequential deposition/anneal film densification method Grant 7,148,155 - Tarafdar , et al. December 12, 2	2006-12-12
Aluminum phosphate incorporation in silica thin films produced by rapid surface catalyzed vapor deposition (RVD) Grant 7,129,189 - Hausmann , et al. October 31, 2	2006-10-31
Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiO.sub.2 films Grant 7,097,878 - Rulkens , et al. August 29, 2	2006-08-29
Properties of a silica thin film produced by a rapid vapor deposition (RVD) process Grant 6,867,152 - Hausmann , et al. March 15, 2	2005-03-15

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