Hattangady; Sunil V.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hattangady; Sunil V..The latest application filed is for "semiconductor with a nitrided silicon gate oxide and method".

Company Profile

0.12.5

Hattangady; Sunil V. - McKinney TX
Hattangady; Sunil V. - Dallas TX

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Semiconductor with a nitrided silicon gate oxide and method Grant 6,956,267 - Hattangady , et al. October 18, 2	2005-10-18
Semiconductor with a nitrided silicon gate oxide and method App 20040159898 - Hattangady, Sunil V. ; et al.	2004-08-19
Semiconductor with a nitrided silicon gate oxide and method Grant 6,716,695 - Hattangady , et al. April 6, 2	2004-04-06
Semiconductor device and method App 20030143813 - Khamankar, Rajesh B. ; et al.	2003-07-31
Multi-thickness oxide growth with in-situ scanned laser heating App 20020098712 - Mavoori, Jaideep ; et al.	2002-07-25
Process to produce ultrathin crystalline silicon nitride on Si (111) for advanced gate dielectrics Grant 6,420,729 - Wallace , et al. July 16, 2	2002-07-16
Fabrication technique for controlled incorporation of nitrogen in gate dielectric Grant 6,399,445 - Hattangady , et al. June 4, 2	2002-06-04
Stacked/composite gate dielectric which incorporates nitrogen at an interface Grant 6,323,114 - Hattangady , et al. November 27, 2	2001-11-27
Nitridation For Split Gate Multiple Voltage Devices App 20010021588 - MISIUM, GEORGE R. ; et al.	2001-09-13
Low temperature process for multiple voltage devices Grant 6,268,296 - Misium , et al. July 31, 2	2001-07-31
Remote plasma nitridation to allow selectively etching of oxide Grant 6,261,973 - Misium , et al. July 17, 2	2001-07-17
Process for polycrystalline silicon gates and high-K dielectric compatibility Grant 6,251,761 - Rodder , et al. June 26, 2	2001-06-26
Process to produce ultrathin crystalline silicon nitride on Si (111 ) for advanced gate dielectrics App 20010002709 - Wallace, Robert M. ; et al.	2001-06-07
Remote plasma nitridation for contact etch stop Grant 6,140,024 - Misium , et al. October 31, 2	2000-10-31
Method of forming multiple gate oxide thicknesses using high density plasma nitridation Grant 6,110,842 - Okuno , et al. August 29, 2	2000-08-29
Semiconductor device having dual gate and method of formation Grant 5,989,962 - Holloway , et al. November 23, 1	1999-11-23
Method of forming an integrated circuit having both low voltage and high voltage MOS transistors Grant 5,970,345 - Hattangady , et al. October 19, 1	1999-10-19

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