Hasei; Masaaki
Patent Applications and Registrations
Patent applications and USPTO patent grants for Hasei; Masaaki.The latest application filed is for "single-substrate-heat-treating apparatus for semiconductor process system".
- Hasei; Masaaki - Tsukui-gun JP
- Hasei; Masaaki - Sagamihara JP
| Patent | Date |
|---|---|
| Single-substrate-heat-treating apparatus for semiconductor process system Grant 6,399,922 - Okase , et al. June 4, 2 | 2002-06-04 |
| Single-substrate-heat-treating apparatus for semiconductor process system App 20010012604 - Okase, Wataru ; et al. | 2001-08-09 |
| Single-substrate-heat-treating apparatus for semiconductor process system Grant 6,228,173 - Okase , et al. May 8, 2 | 2001-05-08 |
| Wafer processing apparatus with a processing vessel, upper and lower separately sealed heating vessels, and means for maintaining the vessels at predetermined pressures Grant 6,111,225 - Ohkase , et al. August 29, 2 | 2000-08-29 |
| Heat treatment processing apparatus and cleaning method thereof Grant 5,554,226 - Okase , et al. September 10, 1 | 1996-09-10 |
| Method for cleaning heat treatment processing apparatus Grant 5,427,625 - Okase , et al. June 27, 1 | 1995-06-27 |
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