Patent | Date |
---|
Method to improve semiconductor surfaces and polishing Grant 9,252,050 - Hall , et al. February 2, 2 | 2016-02-02 |
Method to improve semiconductor surfaces and polishing Grant 9,230,857 - Hall , et al. January 5, 2 | 2016-01-05 |
Method To Improve Semiconductor Surfaces And Polishing App 20150044869 - Hall; Lindsey H. ;   et al. | 2015-02-12 |
Method To Improve Semiconductor Surfaces And Polishing App 20140073131 - Hall; Lindsey H. ;   et al. | 2014-03-13 |
Mitigation of edge degradation in ferroelectric memory devices through plasma etch clean Grant 8,053,252 - Udayakumar , et al. November 8, 2 | 2011-11-08 |
Mitigation of edge degradation in ferroelectric memory devices through plasma etch clean Grant 7,799,582 - Udayakumar , et al. September 21, 2 | 2010-09-21 |
Method for cleaning post-etch noble metal residues Grant 7,723,199 - Obeng , et al. May 25, 2 | 2010-05-25 |
Mitigation Of Edge Degradation In Ferroelectric Memory Devices Through Plasma Etch Clean App 20090275147 - UDAYAKUMAR; Kezhakkedath R. ;   et al. | 2009-11-05 |
Mitigation Of Edge Degradation In Ferroelectric Memory Devices Through Plasma Etch Clean App 20090275148 - UDAYAKUMAR; Kezhakkedath R. ;   et al. | 2009-11-05 |
Mitigation of edge degradation in ferroelectric memory devices through plasma etch clean Grant 7,572,698 - Udayakumar , et al. August 11, 2 | 2009-08-11 |
Recessed drain extensions in transistor device Grant 7,517,779 - Hall April 14, 2 | 2009-04-14 |
Method for manufacturing a semiconductor device containing metal silicide regions Grant 7,422,967 - DeLoach , et al. September 9, 2 | 2008-09-09 |
Silicon recess improvement through improved post implant resist removal and cleans Grant 7,371,691 - Hall , et al. May 13, 2 | 2008-05-13 |
Method For Cleaning Post-etch Noble Metal Residues App 20070298521 - Obeng; Yaw S. ;   et al. | 2007-12-27 |
Mitigation of edge degradation in ferroelectric memory devices through plasma etch clean App 20070281422 - Udayakumar; Kezhakkedath R. ;   et al. | 2007-12-06 |
Recessed Drain Extensions in Transistor Device App 20070278524 - Hall; Lindsey H. | 2007-12-06 |
Method for fabricating dual work function metal gates Grant 7,253,049 - Lu , et al. August 7, 2 | 2007-08-07 |
Clean for high density capacitors Grant 7,252,773 - Hall August 7, 2 | 2007-08-07 |
FRAM capacitor stack clean Grant 7,228,865 - Hall , et al. June 12, 2 | 2007-06-12 |
Ferroelectric capacitor stack etch cleaning methods Grant 7,220,600 - Summerfelt , et al. May 22, 2 | 2007-05-22 |
Novel method for manufacturing a semiconductor device containing metal silicide regions App 20060258091 - DeLoach; Juanita ;   et al. | 2006-11-16 |
Method for fabricating dual work function metal gates App 20060134844 - Lu; Jiong-Ping ;   et al. | 2006-06-22 |
Ferroelectric capacitor stack etch cleaning methods App 20060134808 - Summerfelt; Scott R. ;   et al. | 2006-06-22 |
Recessed drain extensions in transistor device App 20060081894 - Hall; Lindsey H. | 2006-04-20 |
Silicon recess improvement through improved post implant resist removal and cleans App 20060024972 - Hall; Lindsey H. ;   et al. | 2006-02-02 |
Recess reduction for leakage improvement in high density capacitors App 20050233563 - Hall, Lindsey H. ;   et al. | 2005-10-20 |
FRAM capacitor stack clean App 20050045590 - Hall, Lindsey H. ;   et al. | 2005-03-03 |
FRAM capacitor stack clean App 20040237998 - Hall, Lindsey H. ;   et al. | 2004-12-02 |
Wet clean method for PZT capacitors App 20040166678 - Hall, Lindsey H. | 2004-08-26 |
Surface defect elimination using directed beam method App 20040157456 - Hall, Lindsey H. ;   et al. | 2004-08-12 |
Use of a sulfuric acid clean to remove titanium fluoride nodules App 20040115946 - Hall, Lindsey H. | 2004-06-17 |
Clean for high density capacitors App 20040072441 - Hall, Lindsey H. | 2004-04-15 |
FeRAM capacitor post stack etch clean/repair Grant 6,656,748 - Hall , et al. December 2, 2 | 2003-12-02 |
Feram Capacitor Post Stack Etch Clean/repair App 20030143800 - Hall, Lindsey H. ;   et al. | 2003-07-31 |
Integrated circuit planarization method Grant 6,372,648 - Hall , et al. April 16, 2 | 2002-04-16 |
High selectivity slurry for shallow trench isolation processing Grant 6,019,806 - Sees , et al. February 1, 2 | 2000-02-01 |