Gurba; April

Patent Applications and Registrations

Patent applications and USPTO patent grants for Gurba; April.The latest application filed is for "rework methodology that preserves gate performance".

Company Profile

0.7.9

Gurba; April - Allen TX
Gurba; April - Plano TX

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Reliable high voltage gate dielectric layers using a dual nitridation process Grant 7,560,792 - Khamankar , et al. July 14, 2	2009-07-14
Post high voltage gate oxide pattern high-vacuum outgas surface treatment Grant 7,402,524 - Kirkpatrick , et al. July 22, 2	2008-07-22
Rework Methodology That Preserves Gate Performance App 20080076076 - Obeng; Yaw Samuel ; et al.	2008-03-27
Dual-gate integrated circuit semiconductor device Grant 7,339,240 - Kirkpatrick , et al. March 4, 2	2008-03-04
Reliable high voltage gate dielectric layers using a dual nitridation process App 20070117331 - Khamankar; Rajesh ; et al.	2007-05-24
Reliable high voltage gate dielectric layers using a dual nitridation process Grant 7,183,165 - Khamankar , et al. February 27, 2	2007-02-27
Post high voltage gate dielectric pattern plasma surface treatment App 20060183337 - Kirkpatrick; Brian K. ; et al.	2006-08-17
Monitoring of nitrided oxide gate dielectrics by determination of a wet etch Grant 7,087,440 - Gurba , et al. August 8, 2	2006-08-08
Post high voltage gate dielectric pattern plasma surface treatment Grant 7,049,242 - Kirkpatrick , et al. May 23, 2	2006-05-23
Post high voltage gate oxide pattern high-vacuum outgas surface treatment App 20060084229 - Kirkpatrick; Brian K. ; et al.	2006-04-20
Post high voltage gate oxide pattern high-vacuum outgas surface treatment Grant 7,018,925 - Kirkpatrick , et al. March 28, 2	2006-03-28
Post high voltage gate oxide pattern high-vacuum outgas surface treatment App 20040266113 - Kirkpatrick, Brian K. ; et al.	2004-12-30
Monitoring of nitrided oxide gate dielectrics by determination of a wet etch App 20040235203 - Gurba, April ; et al.	2004-11-25
Post high voltage gate dielectric pattern plasma surface treatment App 20040142570 - Kirkpatrick, Brian K. ; et al.	2004-07-22
Reliable high voltage gate dielectric layers using a dual nitridation process App 20040102010 - Khamankar, Rajesh ; et al.	2004-05-27
Nickel SALICIDE process technology for CMOS devices App 20030235973 - Lu, Jiong-Ping ; et al.	2003-12-25

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