Gung; Tza-Jing

Patent Applications and Registrations

Patent applications and USPTO patent grants for Gung; Tza-Jing.The latest application filed is for "methods and apparatus for processing a substrate".

Company Profile

19.53.62

Gung; Tza-Jing - San Jose CA
Gung; Tza-Jing - Sunnyvale CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods And Apparatus For Processing A Substrate App 20220310364 - CHONG; Halbert ; et al.	2022-09-29
Methods And Apparatus For Processing A Substrate App 20220310363 - CHONG; Halbert ; et al.	2022-09-29
Film stack overlay improvement Grant 11,339,475 - Han , et al. May 24, 2	2022-05-24
Analyzing In-plane Distortion App 20220138396 - Wang; Wenjiao ; et al.	2022-05-05
Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability Grant 11,289,312 - Allen , et al. March 29, 2	2022-03-29
On stack overlay improvement for 3D NAND Grant 11,276,569 - Lin , et al. March 15, 2	2022-03-15
Directional Selective Junction Clean With Field Polymer Protections App 20210366722 - Lei; Yu ; et al.	2021-11-25
Metal Oxide Preclean Chamber With Improved Selectivity And Flow Conductance App 20210343508 - NGUYEN; Andrew ; et al.	2021-11-04
Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions Grant 11,152,248 - Liang , et al. October 19, 2	2021-10-19
Methods And Apparatus For Processing A Substrate App 20210319989 - CHONG; Halbert ; et al.	2021-10-14
Physical Vapor Deposition (pvd) Chamber With In Situ Chamber Cleaning Capability App 20200395198 - ALLEN; ADOLPH M. ; et al.	2020-12-17
High Pressure Rf-dc Sputtering And Methods To Improve Film Uniformity And Step-coverage Of This Process App 20200357616 - ALLEN; Adolph Miller ; et al.	2020-11-12
Electrostatic chuck with variable pixelated magnetic field Grant 10,790,180 - Hsu , et al. September 29, 2	2020-09-29
Cyclic Flowable Deposition And High-density Plasma Treatment Processes For High Quality Gap Fill Solutions App 20200286773 - LIANG; Jingmei ; et al.	2020-09-10
High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process Grant 10,763,090 - Allen , et al. Sep	2020-09-01
Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions Grant 10,707,116 - Liang , et al.	2020-07-07
Film Stack Overlay Improvement For 3d Nand Application App 20200173022 - HAN; Xinhai ; et al.	2020-06-04
Magnetic Housing Systems App 20200144029 - GANDIKOTA; Srinivas ; et al.	2020-05-07
Oxide with higher utilization and lower cost Grant 10,595,477 - Guo , et al.	2020-03-24
Single oxide metal deposition chamber Grant 10,597,785 - Subramani , et al.	2020-03-24
Sputtering showerhead Grant 10,577,689 - Subramani , et al.	2020-03-03
On Stack Overlay Improvement For 3d Nand App 20200043723 - LIN; Yongjing ; et al.	2020-02-06
Power deposition control in inductively coupled plasma (ICP) reactors Grant 10,553,398 - Banna , et al. Fe	2020-02-04
Processing chamber with irradiance curing lens Grant 10,541,159 - Trejo , et al. Ja	2020-01-21
Electrostatic Chuck With Variable Pixelated Magnetic Field App 20200013661 - Hsu; Chih-Hsun ; et al.	2020-01-09
Dry etch rate reduction of silicon nitride films Grant 10,515,796 - Tsiang , et al. Dec	2019-12-24
Electrostatic chuck with variable pixelated magnetic field Grant 10,460,968 - Hsu , et al. Oc	2019-10-29
Systems and methods for electrical and magnetic uniformity and skew tuning in plasma processing reactors Grant 10,410,889 - Sadjadi , et al. Sept	2019-09-10
Treatment Methods For Silicon Nitride Thin Films App 20190233940 - GUO; Jinrui ; et al.	2019-08-01
Dry Etch Rate Reduction Of Silicon Nitride Films App 20190157077 - TSIANG; Michael Wenyoung ; et al.	2019-05-23
Magnet configurations for radial uniformity tuning of ICP plasmas Grant 10,249,479 - Aubuchon , et al.	2019-04-02
Oxide With Higher Utilization And Lower Cost App 20190074176 - GUO; Lei ; et al.	2019-03-07
Cyclic Flowable Deposition And High-density Plasma Treatment Processes For High Quality Gap Fill Solutions App 20180330980 - LIANG; Jingmei ; et al.	2018-11-15
Method and apparatus for controlling a magnetic field in a plasma chamber Grant 10,115,566 - Lane , et al. October 30, 2	2018-10-30
Dual radio-frequency tuner for process control of a plasma process Grant 10,109,462 - Hammond, IV , et al. October 23, 2	2018-10-23
Dual Radio-frequency Tuner For Process Control Of A Plasma Process App 20180261431 - HAMMOND, IV; Edward P. ; et al.	2018-09-13
Sputtering target for PVD chamber Grant 10,060,024 - Liu , et al. August 28, 2	2018-08-28
Sputtering Showerhead App 20180087155 - SUBRAMANI; Anantha K. ; et al.	2018-03-29
Single Oxide Metal Deposition Chamber App 20180073150 - SUBRAMANI; Anantha K. ; et al.	2018-03-15
Sputtering Target for PVD Chamber App 20170350001 - Liu; Zhendong ; et al.	2017-12-07
Processing Chamber With Irradiance Curing Lens App 20170345649 - TREJO; Orlando ; et al.	2017-11-30
Electromagnetic dipole for plasma density tuning in a substrate processing chamber Grant 9,779,953 - Aubuchon , et al. October 3, 2	2017-10-03
Sputtering target for PVD chamber Grant 9,752,228 - Liu , et al. September 5, 2	2017-09-05
Sputter Source For Semiconductor Process Chambers App 20170211175 - SUBRAMANI; ANANTHA K. ; et al.	2017-07-27
Method And Apparatus For Controlling A Magnetic Field In A Plasma Chamber App 20170162365 - LANE; STEVEN ; et al.	2017-06-08
Tunable magnetic field to improve uniformity Grant 9,646,843 - Nguyen , et al. May 9, 2	2017-05-09
Sputter source for semiconductor process chambers Grant 9,620,339 - Subramani , et al. April 11, 2	2017-04-11
Method and apparatus for controlling a magnetic field in a plasma chamber Grant 9,613,783 - Lane , et al. April 4, 2	2017-04-04
High Pressure Rf-dc Sputtering And Methods To Improve Film Uniformity And Step-coverage Of This Process App 20170029941 - ALLEN; Adolph Miller ; et al.	2017-02-02
High density TiN RF/DC PVD deposition with stress tuning Grant 9,499,901 - Cao , et al. November 22, 2	2016-11-22
Magnet Configurations For Radial Uniformity Tuning Of Icp Plasmas App 20160225590 - Aubuchon; Joseph F. ; et al.	2016-08-04
Tunable Magnetic Field To Improve Uniformity App 20160163511 - NGUYEN; Andrew ; et al.	2016-06-09
Method And Apparatus For Controlling A Magnetic Field In A Plasma Chamber App 20160027613 - LANE; STEVEN ; et al.	2016-01-28
Systems And Methods For Electrical And Magnetic Uniformity And Skew Tuning In Plasma Processing Reactors App 20160027667 - SADJADI; S. M. REZA ; et al.	2016-01-28
Methods For Extending Chamber Component Life For Plasma Processing Semiconductor Applications App 20150294843 - CHEN; Feng ; et al.	2015-10-15
Electrostatic Chuck With Variable Pixelated Magnetic Field App 20150155193 - Hsu; Chih-Hsun ; et al.	2015-06-04
Magnetron design for extended target life in radio frequency (RF) plasmas Grant 9,028,659 - Ritchie , et al. May 12, 2	2015-05-12
Method for ultra-uniform sputter deposition using simultaneous RF and DC power on target Grant 8,992,741 - Wang , et al. March 31, 2	2015-03-31
Electromagnetic Dipole For Plasma Density Tuning In A Substrate Processing Chamber App 20150087157 - AUBUCHON; JOSEPH F. ; et al.	2015-03-26
Power Deposition Control In Inductively Coupled Plasma (icp) Reactors App 20150068682 - BANNA; SAMER ; et al.	2015-03-12
Electromagnet array in a sputter reactor Grant 8,871,064 - Gung , et al. October 28, 2	2014-10-28
Methods for forming interconnect structures Grant 8,841,211 - Lee , et al. September 23, 2	2014-09-23
Sputter Source For Semiconductor Process Chambers App 20140262767 - SUBRAMANI; Anantha K. ; et al.	2014-09-18
Skew Elimination And Control In A Plasma Enhanced Substrate Processing Chamber App 20140209244 - BANNA; SAMER ; et al.	2014-07-31
Mechanism for continuously varying radial position of a magnetron Grant 8,685,215 - Miller , et al. April 1, 2	2014-04-01
Magnetron Design For Extended Target Life In Radio Frequency (rf) Plasmas App 20140042023 - RITCHIE; ALAN ; et al.	2014-02-13
Magnetron design for RF/DC physical vapor deposition Grant 8,580,094 - Wang , et al. November 12, 2	2013-11-12
Sputtering chamber having auxiliary backside magnet to improve etch uniformity and magnetron producing sustained self sputtering of ruthenium and tantalum Grant 8,557,094 - Tang , et al. October 15, 2	2013-10-15
HIGH DENSITY TiN RF/DC PVD DEPOSITION WITH STRESS TUNING App 20130199925 - CAO; YONG ; et al.	2013-08-08
Methods of forming layers on substrates Grant 8,476,162 - Ha , et al. July 2, 2	2013-07-02
Pvd Process With Synchronized Process Parameters And Magnet Position App 20120181166 - LUO; QIAN ; et al.	2012-07-19
Methods Of Forming Layers On Substrates App 20120108058 - HA; TAE HONG ; et al.	2012-05-03
Magnetron Design For Rf/dc Physical Vapor Deposition App 20110311735 - WANG; RONGJUN ; et al.	2011-12-22
Methods For Forming Interconnect Structures App 20110306200 - LEE; JOUNG JOO ; et al.	2011-12-15
Method to modulate coverage of barrier and seed layer using titanium nitride Grant 7,829,456 - Lam , et al. November 9, 2	2010-11-09
High Pressure Rf-dc Sputtering And Methods To Improve Film Uniformity And Step-coverage Of This Process App 20100252417 - Allen; Adolph Miller ; et al.	2010-10-07
Sputtering Target for PVD Chamber App 20100252416 - Liu; Zhendong ; et al.	2010-10-07
Mechanism for continuously varying radial position of a magnetron App 20100243440 - Miller; Keith A. ; et al.	2010-09-30
Position controlled dual magnetron Grant 7,767,064 - Pavloff , et al. August 3, 2	2010-08-03
Electromagnet array in a sputter reactor App 20100155223 - GUNG; Tza-Jing ; et al.	2010-06-24
Magnetron having continuously variable radial position Grant 7,736,473 - Miller , et al. June 15, 2	2010-06-15
Method To Modulate Coverage Of Barrier And Seed Layer Using Titanium Nitride App 20100105204 - LAM; WINSOR ; et al.	2010-04-29
Pvd Cu Seed Overhang Re-sputtering With Enhanced Cu Ionization App 20100096253 - Cao; Yong ; et al.	2010-04-22
Multi-step process for forming a metal barrier in a sputter reactor Grant 7,686,926 - Gung , et al. March 30, 2	2010-03-30
Pressure switched dual magnetron Grant 7,686,928 - Gung March 30, 2	2010-03-30
Method For Ultra-uniform Sputter Deposition Using Simultaneous Rf And Dc Power On Target App 20100032289 - WANG; RONGJUN ; et al.	2010-02-11
Apparatus And Method For Uniform Deposition App 20090308732 - Cao; Yong ; et al.	2009-12-17
Shields usable with an inductively coupled plasma reactor Grant 7,569,125 - Gung , et al. August 4, 2	2009-08-04
Variable quadruple electromagnet array in plasma processing Grant 7,527,713 - Gung , et al. May 5, 2	2009-05-05
Resputtered Copper Seed Layer App 20080190760 - TANG; XIANMIN ; et al.	2008-08-14
Position Controlled Dual Magnetron App 20080099329 - Pavloff; Cristopher M. ; et al.	2008-05-01
Sputtering Chamber Having Auxiliary Backside Magnet to Improve Etch Uniformity and Magnetron Producing Sustained Self Sputtering of Ruthenium and Tantalum App 20080083610 - Tang; Xianmin ; et al.	2008-04-10
Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry Grant 7,186,319 - Yang , et al. March 6, 2	2007-03-06
Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry App 20060144703 - Yang; Hong S. ; et al.	2006-07-06
Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith Grant 7,041,201 - Gung , et al. May 9, 2	2006-05-09
Magnetron having continuously variable radial position App 20060076232 - Miller; Keith A. ; et al.	2006-04-13
Selectable dual position magnetron Grant 7,018,515 - Gung , et al. March 28, 2	2006-03-28
Pressure switched dual magnetron App 20060060470 - Gung; Tza-Jing	2006-03-23
Multi-step process for forming a metal barrier in a sputter reactor App 20050263390 - Gung, Tza-Jing ; et al.	2005-12-01
Variable quadruple electromagnet array in plasma processing App 20050263389 - Gung, Tza-Jing ; et al.	2005-12-01
Selectable dual position magnetron App 20050211548 - Gung, Tza-Jing ; et al.	2005-09-29
Shields usable with an inductively coupled plasma reactor App 20050199491 - Gung, Tza-Jing ; et al.	2005-09-15
Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith App 20040055880 - Gung, Tza-Jing ; et al.	2004-03-25
Tubular magnet as center pole in unbalanced sputtering magnetron Grant 6,663,754 - Gung December 16, 2	2003-12-16
Auxiliary vertical magnet outside a nested unbalanced magnetron Grant 6,491,801 - Gung December 10, 2	2002-12-10
Tubular magnet as center pole in unbalanced sputtering magnetron App 20020175074 - Gung, Tza-Jing	2002-11-28

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.