loadpatents
name:-0.022387981414795
name:-0.026366949081421
name:-0.0016231536865234
Grimard; Dennis S. Patent Filings

Grimard; Dennis S.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Grimard; Dennis S..The latest application filed is for "high definition heater system having a fluid medium".

Company Profile
0.23.15
  • Grimard; Dennis S. - Ann Arbor MI
  • Grimard; Dennis S. - US
  • Grimard; Dennis S. - Ann Harbor MI
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
High definition heater system having a fluid medium
Grant 11,133,201 - Smith , et al. September 28, 2
2021-09-28
High definition heater system having a fluid medium
Grant 10,361,103 - Smith , et al.
2019-07-23
High Definition Heater System Having A Fluid Medium
App 20170236732 - Smith; Kevin R. ;   et al.
2017-08-17
High Definition Heater System Having A Fluid Medium
App 20170092514 - Smith; Kevin R. ;   et al.
2017-03-30
Plasma control using dual cathode frequency mixing
Grant 7,838,430 - Shannon , et al. November 23, 2
2010-11-23
Time-based wafer de-chucking from an electrostatic chuck having separate RF BIAS and DC chucking electrodes
Grant 7,813,103 - Shannon , et al. October 12, 2
2010-10-12
Time-based wafer de-chucking from an electrostatic chuck having separate RF bias and DC chucking electrodes
App 20090097185 - Shannon; Steven C. ;   et al.
2009-04-16
Plasma generation and control using dual frequency RF signals
Grant 7,510,665 - Shannon , et al. March 31, 2
2009-03-31
Plasma Control Using Dual Cathode Frequency Mixing
App 20070000611 - Shannon; Steven C. ;   et al.
2007-01-04
Plasma generation and control using dual frequency RF signals
App 20060266735 - Shannon; Steven C. ;   et al.
2006-11-30
Plasma control using dual cathode frequency mixing
App 20050090118 - Shannon, Steven C. ;   et al.
2005-04-28
Electrostatic chuck having dielectric member with stacked layers and manufacture
App 20040190215 - Weldon, Edwin C. ;   et al.
2004-09-30
High temperature electrical connector
Grant 6,736,668 - Kholodenko , et al. May 18, 2
2004-05-18
Electrostatic chuck having composite dielectric layer and method of manufacture
Grant 6,721,162 - Weldon , et al. April 13, 2
2004-04-13
Method and apparatus for improving exhaust gas consumption in an exhaust conduit
Grant 6,642,489 - Ramaswamy , et al. November 4, 2
2003-11-04
Fabricating an electrostatic chuck having plasma resistant gas conduits
Grant 6,581,275 - Narendrnath , et al. June 24, 2
2003-06-24
Electrostatic chuck having heater and method
Grant 6,538,872 - Wang , et al. March 25, 2
2003-03-25
Electrostatic chuck with dielectric coating
App 20030010292 - Kholodenko, Arnold V. ;   et al.
2003-01-16
Plasma chamber support with coupled electrode
Grant 6,494,958 - Shamouilian , et al. December 17, 2
2002-12-17
Support for supporting a substrate in a process chamber
Grant 6,490,144 - Narendrnath , et al. December 3, 2
2002-12-03
Electrostatic chuck bonded to base with a bond layer and method
Grant 6,490,146 - Wang , et al. December 3, 2
2002-12-03
Plasma chamber support having dual electrodes
Grant 6,478,924 - Shamouilian , et al. November 12, 2
2002-11-12
Electrostatic chuck having improved electrical connector and method
Grant 6,462,928 - Shamouilian , et al. October 8, 2
2002-10-08
Electrostatic chuck having composite dielectric layer and method of manufacture
App 20020135969 - Weldon, Edwin C. ;   et al.
2002-09-26
Fabricating an electrostatic chuck having plasma resistant gas conduits
App 20020095782 - Narendrnath, Kadthala R. ;   et al.
2002-07-25
Method and apparatus for improving exhaust gas consumption in an exhaust conduit
App 20020088797 - Ramaswamy, Kartik ;   et al.
2002-07-11
Electrostatic chuck bonded to base with a bond layer and method
App 20020075624 - Wang, You ;   et al.
2002-06-20
Electrostatic Chuck Having Composite Base And Method
App 20020036881 - SHAMOUILIAN, SHAMOUIL ;   et al.
2002-03-28
Connectors For An Eletrostatic Chuck
App 20020022403 - CHENG, WING L. ;   et al.
2002-02-21
Chuck having pressurized zones of heat transfer gas
Grant 6,320,736 - Shamouilian , et al. November 20, 2
2001-11-20
Electrostatic chuck having gas cavity and method
Grant 6,310,755 - Kholodenko , et al. October 30, 2
2001-10-30
Substrate support for plasma processing
Grant 6,273,958 - Shamouilian , et al. August 14, 2
2001-08-14
Substrate Support For Plasma Processing
App 20010003298 - SHAMOUILIAN, SHAMOUIL ;   et al.
2001-06-14
Connectors for an electrostatic chuck and combination thereof
Grant 6,151,203 - Shamouilian , et al. November 21, 2
2000-11-21
Electrostatic chuck having improved gas conduits
Grant 6,108,189 - Weldon , et al. August 22, 2
2000-08-22
High density plasma process chamber
Grant 6,095,084 - Shamouilian , et al. August 1, 2
2000-08-01
Plasma chamber support having an electrically coupled collar ring
Grant 6,074,488 - Roderick , et al. June 13, 2
2000-06-13
Hybrid Johnsen-Rahbek electrostatic chuck having highly resistive mesas separating the chuck from a wafer supported thereupon and method of fabricating same
Grant 5,903,428 - Grimard , et al. May 11, 1
1999-05-11

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