Patent | Date |
---|
Vertical heat treatment apparatus Grant 11,282,721 - Iriuda , et al. March 22, 2 | 2022-03-22 |
Substrate processing apparatus Grant 11,208,721 - Fukushima , et al. December 28, 2 | 2021-12-28 |
Vertical Heat Treatment Apparatus App 20200058526 - IRIUDA; Hiroki ;   et al. | 2020-02-20 |
Substrate processing apparatus Grant 10,475,641 - Fukushima , et al. Nov | 2019-11-12 |
Substrate processing apparatus, gas supply method, substrate processing method, and film forming method Grant 10,287,682 - Kikuchi , et al. | 2019-05-14 |
Substrate Processing Method and Substrate Processing Apparatus App 20190093230 - FUKUSHIMA; Kohei | 2019-03-28 |
Substrate Processing Apparatus App 20180258528 - FUKUSHIMA; Kohei ;   et al. | 2018-09-13 |
Substrate processing apparatus having ground electrode Grant 9,970,111 - Fukushima , et al. May 15, 2 | 2018-05-15 |
Gas Introduction Mechanism and Processing Apparatus App 20180087156 - FUKUSHIMA; Kohei ;   et al. | 2018-03-29 |
Substrate Processing Apparatus App 20180076021 - FUKUSHIMA; Kohei ;   et al. | 2018-03-15 |
Apparatus for detecting rammer tip-over Grant 9,789,579 - Fukushima , et al. October 17, 2 | 2017-10-17 |
Driving method of vertical heat treatment apparatus, storage medium and vertical heat treatment apparatus Grant 9,776,202 - Motoyama , et al. October 3, 2 | 2017-10-03 |
Substrate Processing Apparatus, Gas Supply Method, Substrate Processing Method, and Film Forming Method App 20170275757 - KIKUCHI; Kazuyuki ;   et al. | 2017-09-28 |
Dummy wafer Grant D786,810 - Motoyama , et al. May 16, 2 | 2017-05-16 |
Dummy wafer Grant D785,576 - Motoyama , et al. May 2, 2 | 2017-05-02 |
Vertical Heat Treatment Apparatus App 20170114464 - IRIUDA; Hiroki ;   et al. | 2017-04-27 |
Dummy wafer Grant D784,937 - Motoyama , et al. April 25, 2 | 2017-04-25 |
Film forming apparatus, film forming method, and non-transitory computer-readable storage medium Grant 9,624,579 - Fukushima April 18, 2 | 2017-04-18 |
Operating method of vertical heat treatment apparatus, storage medium, and vertical heat treatment apparatus Grant 9,487,859 - Motoyama , et al. November 8, 2 | 2016-11-08 |
Film Forming Apparatus App 20160024654 - FUKUSHIMA; Kohei ;   et al. | 2016-01-28 |
Vertical Heat Treatment Apparatus And Method Of Operating Vertical Heat Treatment Apparatus App 20150376789 - MOTOYAMA; Yutaka ;   et al. | 2015-12-31 |
Film Forming Apparatus, Film Forming Method, And Non-transitory Computer-readable Storage Medium App 20150275366 - FUKUSHIMA; Kohei | 2015-10-01 |
Film Forming Apparatus Using Gas Nozzles App 20150275368 - MOTOYAMA; Yutaka ;   et al. | 2015-10-01 |
Substrate Processing Apparatus App 20150275359 - FUKUSHIMA; Kohei ;   et al. | 2015-10-01 |
Operating Method Of Vertical Heat Treatment Apparatus, Storage Medium, And Vertical Heat Treatment Apparatus App 20150267293 - MOTOYAMA; Yutaka ;   et al. | 2015-09-24 |
Vertical Heat Treatment Apparatus, Method Of Operating Vertical Heat Treatment Apparatus, And Storage Medium App 20150259799 - MOTOYAMA; Yutaka ;   et al. | 2015-09-17 |
Substrate Processing Apparatus App 20150007772 - FUKUSHIMA; Kohei ;   et al. | 2015-01-08 |
Driving Method Of Vertical Heat Treatment Apparatus, Storage Medium And Vertical Heat Treatment Apparatus App 20140295082 - MOTOYAMA; Yutaka ;   et al. | 2014-10-02 |
Apparatus For Detecting Rammer Tip-over App 20140076596 - Fukushima; Kohei ;   et al. | 2014-03-20 |
Plasma processing apparatus Grant 8,608,902 - Fukushima , et al. December 17, 2 | 2013-12-17 |
Plasma processing apparatus Grant 8,336,490 - Matsuura , et al. December 25, 2 | 2012-12-25 |
Plasma Processing Apparatus App 20120103525 - MATSUURA; Hiroyuki ;   et al. | 2012-05-03 |
Vertical plasma processing method for forming silicon containing film Grant 7,825,039 - Takahashi , et al. November 2, 2 | 2010-11-02 |
Plasma Processing Apparatus App 20100186898 - FUKUSHIMA; Kohei ;   et al. | 2010-07-29 |
Method and apparatus for forming silicon-containing insulating film Grant 7,758,920 - Hasebe , et al. July 20, 2 | 2010-07-20 |
Vertical Plasma Processing Apparatus And Method For Semiconductor Process App 20090181548 - Takahashi; Toshiki ;   et al. | 2009-07-16 |
Plasma processing apparatus App 20090056877 - Matsuura; Hiroyuki ;   et al. | 2009-03-05 |
CVD method for forming silicon nitride film Grant 7,462,376 - Kato , et al. December 9, 2 | 2008-12-09 |
Vertical Plasma Processing Apparatus And Method For Semiconductor Process App 20070234961 - Takahashi; Toshiki ;   et al. | 2007-10-11 |
Method and apparatus for forming silicon-containing insulating film App 20070032047 - Hasebe; Kazuhide ;   et al. | 2007-02-08 |
Silicon nitride film forming method, silicon nitride film forming system and silicon nitride film forming system precleaning method Grant 7,156,923 - Kato , et al. January 2, 2 | 2007-01-02 |
Cvd method for forming silicon nitride film App 20060286817 - Kato; Hitoshi ;   et al. | 2006-12-21 |
Silicon nitride film forming method, silicon nitride film forming system and silicon nitride film forming system precleaning method App 20050081789 - Kato, Hitoshi ;   et al. | 2005-04-21 |
Precleaning method of precleaning a silicon nitride film forming system Grant 6,844,273 - Kato , et al. January 18, 2 | 2005-01-18 |
Silicon nitride film forming method, silicon nitride film forming system and silicon nitride film forming system precleaning method App 20020106909 - Kato, Hitoshi ;   et al. | 2002-08-08 |