Fukasawa; Masato
Patent Applications and Registrations
Patent applications and USPTO patent grants for Fukasawa; Masato.The latest application filed is for "polishing liquid, polishing liquid set, and substrate polishing method".
Company Profile
0.25.27
- Fukasawa; Masato - Tokyo JP
- FUKASAWA; Masato - Chiyoda-ku Tokyo
- Fukasawa; Masato - Izunokuni Shizuoka JP
- Fukasawa; Masato - Hitachi JP
- Fukasawa; Masato - Hitachi-shi JP
- Fukasawa; Masato - Ibaraki JP
Patent Activity
| Patent | Date |
|---|---|
| Polishing liquid, polishing liquid set, and substrate polishing method Grant 11,046,869 - Akutsu , et al. June 29, 2 | 2021-06-29 |
| Polishing Liquid, Polishing Liquid Set, And Substrate Polishing Method App 20180258319 - AKUTSU; Toshiaki ; et al. | 2018-09-13 |
| Ink Jet Head App 20180072051 - Fukasawa; Masato | 2018-03-15 |
| Ink Jet Head App 20180072052 - FUKASAWA; Masato | 2018-03-15 |
| Polishing method Grant 9,299,573 - Mishima , et al. March 29, 2 | 2016-03-29 |
| Polishing solution for CMP and polishing method using the polishing solution Grant 9,022,834 - Satou , et al. May 5, 2 | 2015-05-05 |
| Polishing Method App 20150031205 - Mishima; Kouji ; et al. | 2015-01-29 |
| Polishing slurry for metal films and polishing method Grant 8,901,002 - Tanaka , et al. December 2, 2 | 2014-12-02 |
| CMP polishing slurry and method of polishing substrate Grant 8,900,335 - Fukasawa , et al. December 2, 2 | 2014-12-02 |
| Polishing solution for metal films and polishing method using the same Grant 8,734,204 - Haga , et al. May 27, 2 | 2014-05-27 |
| Polishing Slurry For Metal Films And Polishing Method App 20140065826 - Tanaka; Takaaki ; et al. | 2014-03-06 |
| Polishing slurry for metal films and polishing method Grant 8,609,541 - Tanaka , et al. December 17, 2 | 2013-12-17 |
| CMP abrasive slurry for polishing insulation film, polishing method, and semiconductor electronic part polished by the polishing method Grant 8,524,111 - Fukasawa , et al. September 3, 2 | 2013-09-03 |
| Polishing Liquid For Metal Film And Polishing Method App 20130217229 - Haga; Kouji ; et al. | 2013-08-22 |
| Polishing liquid for metal film and polishing method Grant 8,501,625 - Haga , et al. August 6, 2 | 2013-08-06 |
| Polishing slurry and polishing method Grant 8,481,428 - Amanokura , et al. July 9, 2 | 2013-07-09 |
| Polishing liquid for metal and method of polishing Grant 8,288,282 - Nomura , et al. October 16, 2 | 2012-10-16 |
| CMP polishing slurry and polishing method Grant 8,168,541 - Fukasawa , et al. May 1, 2 | 2012-05-01 |
| Polishing Slurry And Polishing Method App 20120064721 - Amanokura; Jin ; et al. | 2012-03-15 |
| Polishing slurry and polishing method Grant 8,084,363 - Amanokura , et al. December 27, 2 | 2011-12-27 |
| Polishing slurry and polishing method Grant 8,084,362 - Amanokura , et al. December 27, 2 | 2011-12-27 |
| Polishing slurry and polishing method Grant 8,075,800 - Koyama , et al. December 13, 2 | 2011-12-13 |
| Polishing Solution For Cmp And Polishing Method Using The Polishing Solution App 20110275285 - Satou; Eiichi ; et al. | 2011-11-10 |
| Polishing Solution For Metal Films And Polishing Method Using The Same App 20110104992 - Haga; Kouji ; et al. | 2011-05-05 |
| Cmp Polishing Slurry And Polishing Method App 20110028073 - Fukasawa; Masato ; et al. | 2011-02-03 |
| Polishing Slurry For Metal Films And Polishing Method App 20110009033 - Tanaka; Takaaki ; et al. | 2011-01-13 |
| Polishing Liquid For Metal Film And Polishing Method App 20100323584 - Haga; Kouji ; et al. | 2010-12-23 |
| CMP polishing compound and polishing method Grant 7,838,482 - Fukasawa , et al. November 23, 2 | 2010-11-23 |
| CMP polishing slurry and polishing method Grant 7,837,800 - Fukasawa , et al. November 23, 2 | 2010-11-23 |
| Cmp Polishing Slurry And Method Of Polishing Substrate App 20100210109 - Fukasawa; Masato ; et al. | 2010-08-19 |
| Polishing Liquid For Metal And Method Of Polishing App 20100197201 - Nomura; Yutaka ; et al. | 2010-08-05 |
| Cmp Polishing Slurry, Additive Liquid For Cmp Polishing Slurry, And Substrate-polishing Processes Using The Same App 20100015806 - Fukasawa; Masato ; et al. | 2010-01-21 |
| Polishing Slurry For Cmp App 20090283715 - Nobe; Shigeru ; et al. | 2009-11-19 |
| Polishing slurry and polishing method App 20090156007 - Amanokura; Jin ; et al. | 2009-06-18 |
| CMP Abrasive Slurry for Polishing Insulation Film, Polishing Method, and Semiconductor Electronic Part Polished by the Polishing Method App 20090047786 - Fukasawa; Masato ; et al. | 2009-02-19 |
| Cmp Polishing Slurry and Method of Polishing Substrate App 20080254717 - Fukasawa; Masato ; et al. | 2008-10-16 |
| CMP polishing slurry and polishing method App 20080214093 - Fukasawa; Masato ; et al. | 2008-09-04 |
| Cmp Polishing Slurry and Method of Polishing Substrate App 20080003925 - Fukasawa; Masato ; et al. | 2008-01-03 |
| Polishing slurry and polishing method App 20070232197 - Amanokura; Jin ; et al. | 2007-10-04 |
| Cmp Polishing Slurry And Method Of Polishing Substrate App 20070218811 - Kurata; Yasushi ; et al. | 2007-09-20 |
| Polishing slurry for silicon oxide, additive liquid and polishing method App 20070175104 - Nishiyama; Masaya ; et al. | 2007-08-02 |
| Hazardous substance decomposer and process for producing the same App 20060289826 - Koyama; Naoyuki ; et al. | 2006-12-28 |
| Cmp polishing compound and polishing method App 20060148667 - Fukasawa; Masato ; et al. | 2006-07-06 |
| Polishing fluid and polishing method App 20050050803 - Amanokura, Jin ; et al. | 2005-03-10 |
| Dry toner, dry developer and process for forming electrophotographic images Grant 4,985,328 - Kumagai , et al. January 15, 1 | 1991-01-15 |
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