loadpatents
name:-0.032352924346924
name:-0.0173659324646
name:-0.017067909240723
Fenwick; David Patent Filings

Fenwick; David

Patent Applications and Registrations

Patent applications and USPTO patent grants for Fenwick; David.The latest application filed is for "atomic layer deposition of protective coatings for semiconductor process chamber components".

Company Profile
17.13.29
  • Fenwick; David - Los Altos CA
  • Fenwick; David - Los Altos Hills CA
  • Fenwick, David - Sandwich GB
  • Fenwick; David - Santa Cruz CA
  • Fenwick; David - Portland OR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Atomic Layer Deposition Of Protective Coatings For Semiconductor Process Chamber Components
App 20220235458 - Fenwick; David ;   et al.
2022-07-28
Multi-layer Plasma Resistant Coating By Atomic Layer Deposition
App 20220157568 - Wu; Xiaowei ;   et al.
2022-05-19
Atomic layer deposition of protective coatings for semiconductor process chamber components
Grant 11,326,253 - Fenwick , et al. May 10, 2
2022-05-10
Multi-layer plasma resistant coating by atomic layer deposition
Grant 11,251,023 - Wu , et al. February 15, 2
2022-02-15
Atomic layer deposition of protective coatings for semiconductor process chamber components
Grant 11,198,936 - Fenwick , et al. December 14, 2
2021-12-14
Atomic layer deposition of protective coatings for semiconductor process chamber components
Grant 11,198,937 - Fenwick , et al. December 14, 2
2021-12-14
Y2O3-ZrO2 EROSION RESISTANT MATERIAL FOR CHAMBER COMPONENTS IN PLASMA ENVIRONMENTS
App 20210230070 - Sun; Jennifer Y. ;   et al.
2021-07-29
Y.sub.2O.sub.3--ZrO.sub.2 erosion resistant material for chamber components in plasma environments
Grant 11,014,853 - Sun , et al. May 25, 2
2021-05-25
Multi-layer coating with diffusion barrier layer and erosion resistant layer
Grant 11,008,653 - Fenwick , et al. May 18, 2
2021-05-18
Hafnium Aluminum Oxide Coatings Deposited By Atomic Layer Deposition
App 20210123143 - Fenwick; David ;   et al.
2021-04-29
Ultrathin Conformal Coatings For Electrostatic Dissipation In Semiconductor Process Tools
App 20210100141 - Natu; Gayatri ;   et al.
2021-04-01
Ultrathin Conformal Coatings For Electrostatic Dissipation In Semiconductor Process Tools
App 20210100087 - Natu; Gayatri ;   et al.
2021-04-01
Multi-layer Plasma Resistant Coating By Atomic Layer Deposition
App 20200185200 - Wu; Xiaowei ;   et al.
2020-06-11
Metal Oxy-flouride Films Based On Oxidation Of Metal Flourides
App 20200140996 - Wu; Xiaowei ;   et al.
2020-05-07
Multi-layer plasma resistant coating by atomic layer deposition
Grant 10,573,497 - Wu , et al. Feb
2020-02-25
Metal oxy-flouride films based on oxidation of metal flourides
Grant 10,563,303 - Wu , et al. Feb
2020-02-18
Enhanced Anodization For Processing Equipment
App 20190376202 - HE; Xiao-Ming ;   et al.
2019-12-12
Flourination process to create sacrificial oxy-flouride layer
Grant 10,443,125 - Wu , et al. Oc
2019-10-15
Y2O3-ZrO2 EROSION RESISTANT MATERIAL FOR CHAMBER COMPONENTS IN PLASMA ENVIRONMENTS
App 20190276366 - Sun; Jennifer Y. ;   et al.
2019-09-12
Atomic Layer Deposition Of Protective Coatings For Semiconductor Process Chamber Components
App 20190271076 - Fenwick; David ;   et al.
2019-09-05
Atomic Layer Deposition Coatings For High Temperature Heaters
App 20190136372 - Zhan; Guodong ;   et al.
2019-05-09
Y2O3-SiO2 PROTECTIVE COATINGS FOR SEMICONDUCTOR PROCESS CHAMBER COMPONENTS
App 20190131113 - Fenwick; David ;   et al.
2019-05-02
Fluorinated Rare Earth Oxide Ald Coating For Chamber Productivity Enhancement
App 20190078200 - Wu; Xiaowei ;   et al.
2019-03-14
Rare-earth-based Oxyfluoride Ald Coating For Chamber Productivity Enhancement
App 20190078199 - Wu; Xiaowei ;   et al.
2019-03-14
Fluorinated Rare Earth Oxide Ald Coating For Chamber Productivity Enhancement
App 20190078206 - Wu; Xiaowei ;   et al.
2019-03-14
Multi-layer plasma resistant coating by atomic layer deposition
Grant 10,186,400 - Wu , et al. Ja
2019-01-22
Flourination Process To Create Sacrificial Oxy-flouride Layer
App 20180327898 - Wu; Xiaowei ;   et al.
2018-11-15
Metal Oxy-flouride Films For Chamber Components
App 20180327892 - Wu; Xiaowei ;   et al.
2018-11-15
Metal Oxy-flouride Films Based On Oxidation Of Metal Flourides
App 20180327899 - Wu; Xiaowei ;   et al.
2018-11-15
Sintered Ceramic Protective Layer Formed By Hot Pressing
App 20180251406 - Sun; Jennifer Y. ;   et al.
2018-09-06
Multi-layer Plasma Resistant Coating By Atomic Layer Deposition
App 20180240648 - Wu; Xiaowei ;   et al.
2018-08-23
Multi-layer Plasma Resistant Coating By Atomic Layer Deposition
App 20180209042 - Wu; Xiaowei ;   et al.
2018-07-26
Multi-layer Coating With Diffusion Barrier Layer And Erosion Resistant Layer
App 20180112311 - Fenwick; David ;   et al.
2018-04-26
Atomic Layer Deposition Of Protective Coatings For Semiconductor Process Chamber Components
App 20180105932 - Fenwick; David ;   et al.
2018-04-19
Multi-layer Coating With Diffusion Barrier Layer And Erosion Resistant Layer
App 20180016678 - Fenwick; David ;   et al.
2018-01-18
Protective Metal Oxy-fluoride Coatings
App 20170323772 - Fenwick; David ;   et al.
2017-11-09
Atomic Layer Deposition Of Protective Coatings For Semiconductor Process Chamber Components
App 20170314125 - Fenwick; David ;   et al.
2017-11-02
Imidazopyridine compounds as 5-HT4 receptor modulators
App 20040034226 - Uchida, Chikara ;   et al.
2004-02-19
Imidazopyridine compounds as 5-HT4 receptor modulators
Grant 6,624,162 - Uchida , et al. September 23, 2
2003-09-23
Imidazopyridine compounds as 5-HT4 receptor modulators
App 20030092699 - Uchida, Chikara ;   et al.
2003-05-15
Pattern recognition system having inter-pattern spacing correction
Grant 5,161,245 - Fenwick November 3, 1
1992-11-03
Dynamic input processing system
Grant 4,704,703 - Fenwick November 3, 1
1987-11-03

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