Patent | Date |
---|
Atomic Layer Deposition Of Protective Coatings For Semiconductor Process Chamber Components App 20220235458 - Fenwick; David ;   et al. | 2022-07-28 |
Multi-layer Plasma Resistant Coating By Atomic Layer Deposition App 20220157568 - Wu; Xiaowei ;   et al. | 2022-05-19 |
Atomic layer deposition of protective coatings for semiconductor process chamber components Grant 11,326,253 - Fenwick , et al. May 10, 2 | 2022-05-10 |
Multi-layer plasma resistant coating by atomic layer deposition Grant 11,251,023 - Wu , et al. February 15, 2 | 2022-02-15 |
Atomic layer deposition of protective coatings for semiconductor process chamber components Grant 11,198,936 - Fenwick , et al. December 14, 2 | 2021-12-14 |
Atomic layer deposition of protective coatings for semiconductor process chamber components Grant 11,198,937 - Fenwick , et al. December 14, 2 | 2021-12-14 |
Y2O3-ZrO2 EROSION RESISTANT MATERIAL FOR CHAMBER COMPONENTS IN PLASMA ENVIRONMENTS App 20210230070 - Sun; Jennifer Y. ;   et al. | 2021-07-29 |
Y.sub.2O.sub.3--ZrO.sub.2 erosion resistant material for chamber components in plasma environments Grant 11,014,853 - Sun , et al. May 25, 2 | 2021-05-25 |
Multi-layer coating with diffusion barrier layer and erosion resistant layer Grant 11,008,653 - Fenwick , et al. May 18, 2 | 2021-05-18 |
Hafnium Aluminum Oxide Coatings Deposited By Atomic Layer Deposition App 20210123143 - Fenwick; David ;   et al. | 2021-04-29 |
Ultrathin Conformal Coatings For Electrostatic Dissipation In Semiconductor Process Tools App 20210100141 - Natu; Gayatri ;   et al. | 2021-04-01 |
Ultrathin Conformal Coatings For Electrostatic Dissipation In Semiconductor Process Tools App 20210100087 - Natu; Gayatri ;   et al. | 2021-04-01 |
Multi-layer Plasma Resistant Coating By Atomic Layer Deposition App 20200185200 - Wu; Xiaowei ;   et al. | 2020-06-11 |
Metal Oxy-flouride Films Based On Oxidation Of Metal Flourides App 20200140996 - Wu; Xiaowei ;   et al. | 2020-05-07 |
Multi-layer plasma resistant coating by atomic layer deposition Grant 10,573,497 - Wu , et al. Feb | 2020-02-25 |
Metal oxy-flouride films based on oxidation of metal flourides Grant 10,563,303 - Wu , et al. Feb | 2020-02-18 |
Enhanced Anodization For Processing Equipment App 20190376202 - HE; Xiao-Ming ;   et al. | 2019-12-12 |
Flourination process to create sacrificial oxy-flouride layer Grant 10,443,125 - Wu , et al. Oc | 2019-10-15 |
Y2O3-ZrO2 EROSION RESISTANT MATERIAL FOR CHAMBER COMPONENTS IN PLASMA ENVIRONMENTS App 20190276366 - Sun; Jennifer Y. ;   et al. | 2019-09-12 |
Atomic Layer Deposition Of Protective Coatings For Semiconductor Process Chamber Components App 20190271076 - Fenwick; David ;   et al. | 2019-09-05 |
Atomic Layer Deposition Coatings For High Temperature Heaters App 20190136372 - Zhan; Guodong ;   et al. | 2019-05-09 |
Y2O3-SiO2 PROTECTIVE COATINGS FOR SEMICONDUCTOR PROCESS CHAMBER COMPONENTS App 20190131113 - Fenwick; David ;   et al. | 2019-05-02 |
Fluorinated Rare Earth Oxide Ald Coating For Chamber Productivity Enhancement App 20190078200 - Wu; Xiaowei ;   et al. | 2019-03-14 |
Rare-earth-based Oxyfluoride Ald Coating For Chamber Productivity Enhancement App 20190078199 - Wu; Xiaowei ;   et al. | 2019-03-14 |
Fluorinated Rare Earth Oxide Ald Coating For Chamber Productivity Enhancement App 20190078206 - Wu; Xiaowei ;   et al. | 2019-03-14 |
Multi-layer plasma resistant coating by atomic layer deposition Grant 10,186,400 - Wu , et al. Ja | 2019-01-22 |
Flourination Process To Create Sacrificial Oxy-flouride Layer App 20180327898 - Wu; Xiaowei ;   et al. | 2018-11-15 |
Metal Oxy-flouride Films For Chamber Components App 20180327892 - Wu; Xiaowei ;   et al. | 2018-11-15 |
Metal Oxy-flouride Films Based On Oxidation Of Metal Flourides App 20180327899 - Wu; Xiaowei ;   et al. | 2018-11-15 |
Sintered Ceramic Protective Layer Formed By Hot Pressing App 20180251406 - Sun; Jennifer Y. ;   et al. | 2018-09-06 |
Multi-layer Plasma Resistant Coating By Atomic Layer Deposition App 20180240648 - Wu; Xiaowei ;   et al. | 2018-08-23 |
Multi-layer Plasma Resistant Coating By Atomic Layer Deposition App 20180209042 - Wu; Xiaowei ;   et al. | 2018-07-26 |
Multi-layer Coating With Diffusion Barrier Layer And Erosion Resistant Layer App 20180112311 - Fenwick; David ;   et al. | 2018-04-26 |
Atomic Layer Deposition Of Protective Coatings For Semiconductor Process Chamber Components App 20180105932 - Fenwick; David ;   et al. | 2018-04-19 |
Multi-layer Coating With Diffusion Barrier Layer And Erosion Resistant Layer App 20180016678 - Fenwick; David ;   et al. | 2018-01-18 |
Protective Metal Oxy-fluoride Coatings App 20170323772 - Fenwick; David ;   et al. | 2017-11-09 |
Atomic Layer Deposition Of Protective Coatings For Semiconductor Process Chamber Components App 20170314125 - Fenwick; David ;   et al. | 2017-11-02 |
Imidazopyridine compounds as 5-HT4 receptor modulators App 20040034226 - Uchida, Chikara ;   et al. | 2004-02-19 |
Imidazopyridine compounds as 5-HT4 receptor modulators Grant 6,624,162 - Uchida , et al. September 23, 2 | 2003-09-23 |
Imidazopyridine compounds as 5-HT4 receptor modulators App 20030092699 - Uchida, Chikara ;   et al. | 2003-05-15 |
Pattern recognition system having inter-pattern spacing correction Grant 5,161,245 - Fenwick November 3, 1 | 1992-11-03 |
Dynamic input processing system Grant 4,704,703 - Fenwick November 3, 1 | 1987-11-03 |