Endo; Koutaro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Endo; Koutaro.The latest application filed is for "fluorinated polymers, photoresists and processes for microlithography".

Company Profile

0.4.7

Endo; Koutaro - Kanagawa-ken JP
Endo, Koutaro - Kanagawa JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Multilayered body for photolithographic patterning Grant 7,033,731 - Tachikawa , et al. April 25, 2	2006-04-25
Fluorinated polymers, photoresists and processes for microlithography App 20050203262 - Feiring, Andrew Edward ; et al.	2005-09-15
Positive resist composition and base material carrying layer of the positive resist composition App 20050123854 - Ogata, Toshiyuki ; et al.	2005-06-09
Negative-working photoresist composition Grant 6,864,036 - Tachikawa , et al. March 8, 2	2005-03-08
Multilayered body for photolithographic patterning App 20050008972 - Tachikawa, Toshikazu ; et al.	2005-01-13
Positive resist composition and base material carrying layer of the positive resist composition Grant 6,787,284 - Ogata , et al. September 7, 2	2004-09-07
Positive resist composition and base material carrying layer of the positive resist composition App 20040152860 - Ogata, Toshiyuki ; et al.	2004-08-05
Multilayered body for photolithographic patterning App 20020146645 - Tachikawa, Toshikazu ; et al.	2002-10-10
Negative-working photoresist composition Grant 6,406,829 - Tachikawa , et al. June 18, 2	2002-06-18
Negative-working photoresist composition App 20020061467 - Tachikawa, Toshikazu ; et al.	2002-05-23
Positive resist composition and base material carrying layer of the positive resist composition App 20020025495 - Ogata, Toshiyuki ; et al.	2002-02-28

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