Patent | Date |
---|
Interconnect line selectively isolated from an underlying contact plug Grant 9,123,786 - Drynan September 1, 2 | 2015-09-01 |
Interconnect Line Selectively Isolated From An Underlying Contact Plug App 20140312504 - Drynan; John M. | 2014-10-23 |
Interconnect line selectively isolated from an underlying contact plug Grant 8,796,815 - Drynan August 5, 2 | 2014-08-05 |
Interconnect Line Selectively Isolated From An Underlying Contact Plug App 20110115008 - Drynan; John M. | 2011-05-19 |
Interconnect line selectively isolated from an underlying contact plug Grant 7,888,774 - Drynan February 15, 2 | 2011-02-15 |
Interconnect Line Selectively Isolated From An Underlying Contact Plug App 20100013048 - Drynan; John M. | 2010-01-21 |
Interconnect line selectively isolated from an underlying contact plug Grant 7,573,087 - Drynan August 11, 2 | 2009-08-11 |
Semiconductor constructions comprising multi-level patterns of radiation-imageable material Grant 7,535,112 - Aiton , et al. May 19, 2 | 2009-05-19 |
Methods of forming wire bonds for semiconductor constructions Grant 7,517,786 - Aiton , et al. April 14, 2 | 2009-04-14 |
Semiconductor device precursor structures to a double-sided capacitor or a contact Grant 7,321,150 - Fishburn , et al. January 22, 2 | 2008-01-22 |
Dynamic random access memory circuitry and integrated circuitry Grant 7,285,814 - Drynan , et al. October 23, 2 | 2007-10-23 |
Method of forming a double-sided capacitor Grant 7,273,779 - Fishburn , et al. September 25, 2 | 2007-09-25 |
Method of forming a contact using a sacrificial structure Grant 7,268,039 - Fishburn , et al. September 11, 2 | 2007-09-11 |
Methods of forming wire bonds for semiconductor constructions Grant 7,262,123 - Aiton , et al. August 28, 2 | 2007-08-28 |
Method of forming a contact using a sacrificial structure App 20070141777 - Fishburn; Fred ;   et al. | 2007-06-21 |
Interconnect line selectively isolated from an underlying contact plug App 20070096190 - Drynan; John M. | 2007-05-03 |
Semiconductor constructions comprising multi-level patterns of radiation-imageable material App 20070072343 - Aiton; John ;   et al. | 2007-03-29 |
Methods of forming wire bonds for semiconductor constructions App 20060246705 - Aiton; John ;   et al. | 2006-11-02 |
Planarization of metal container structures App 20060170025 - Drynan; John M. | 2006-08-03 |
Dynamic random assess memory circuitry and integrated circuitry App 20060157767 - Drynan; John M. ;   et al. | 2006-07-20 |
Interconnect line selectively isolated from an underlying contact plug Grant 7,061,115 - Drynan June 13, 2 | 2006-06-13 |
Planarization of metal container structures Grant 7,053,462 - Yang , et al. May 30, 2 | 2006-05-30 |
Dynamic random access memory circuitry comprising insulative collars Grant 7,019,347 - Drynan , et al. March 28, 2 | 2006-03-28 |
Interconnect line selectively isolated from an underlying contact plug App 20060033123 - Drynan; John M. | 2006-02-16 |
Semiconductor constructions comprising multi-level patterns of radiation-imageable material; and methods of forming wire bonds for semiconductor constructions App 20060024942 - Aiton; John ;   et al. | 2006-02-02 |
Interconnect line selectively isolated from an underlying contact plug Grant 6,969,882 - Drynan November 29, 2 | 2005-11-29 |
Methods of forming a double-sided capacitor or a contact using a sacrificial structure Grant 6,962,846 - Fishburn , et al. November 8, 2 | 2005-11-08 |
Methods of forming a double-sided capacitor or a contact using a sacrificial structure and semiconductor device precursor structures to a double-sided capacitor or a contact App 20050208729 - Fishburn, Fred ;   et al. | 2005-09-22 |
Dynamic random access memory circuitry comprising insulative collars App 20050124163 - Drynan, John M. ;   et al. | 2005-06-09 |
Semiconductor device precursor structures to a double-sided capacitor or a contact App 20050118760 - Fishburn, Fred ;   et al. | 2005-06-02 |
Methods Of Forming A Double-sided Capacitor Or A Contact Using A Sacrificial Structure App 20050106806 - Fishburn, Fred ;   et al. | 2005-05-19 |
Integrated circuitry comprising insulative collars and integrated circuitry comprising sidewall spacers over a conductive line projecting outwardly from a first insulative material Grant 6,861,713 - Drynan , et al. March 1, 2 | 2005-03-01 |
Interconnect line selectively isolated from an underlying contact plug App 20050026412 - Drynan, John M. | 2005-02-03 |
Interconnect line selectively isolated from an underlying contact plug App 20040262657 - Drynan, John M. | 2004-12-30 |
Interconnect line selectively isolated from an underlying contact plug Grant 6,781,182 - Drynan August 24, 2 | 2004-08-24 |
Method Of Forming A Patterned Substantially Crystalline Ta2o5 Comprising Material, And Method Of Forming A Capacitor Having A Capacitor Dielectric Region Comprising Substantially Crystalline Ta2o5 Comprising Material Grant 6,767,806 - Basceri , et al. July 27, 2 | 2004-07-27 |
Interconnect line selectively isolated from an underlying contact plug App 20040108535 - Drynan, John M. | 2004-06-10 |
Interconnect line selectively isolated from an underlying contact plug Grant 6,713,378 - Drynan March 30, 2 | 2004-03-30 |
Methods of forming conductive contacts to conductive structures Grant 6,645,846 - Drynan , et al. November 11, 2 | 2003-11-11 |
Methods of depositing a layer comprising tungsten and methods of forming a transistor gate line Grant 6,617,250 - Basceri , et al. September 9, 2 | 2003-09-09 |
Planarization of metal container structures App 20030082903 - Yang, Sam ;   et al. | 2003-05-01 |
Methods of forming conductive contacts to conductive structures, and integrated circuitry App 20030075799 - Drynan, John M. ;   et al. | 2003-04-24 |
Interconnect line selectively isolated from an underlying contact plug App 20030077891 - Drynan, John M. | 2003-04-24 |
Methods of forming conductive contacts to conductive structures App 20030074787 - Drynan, John M. ;   et al. | 2003-04-24 |
Interconnect line selectively isolated from an underlying contact plug Grant 6,511,879 - Drynan January 28, 2 | 2003-01-28 |
Interconnect line selectively isolated from an underlying contact plug App 20020187606 - Drynan, John M. | 2002-12-12 |