Detrick; Troy S.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Detrick; Troy S..The latest application filed is for "apparatus and method for analyzing thermal properties of composite structures".

Company Profile

0.9.12

Detrick; Troy S. - Los Altos CA US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Apparatus and method for analyzing thermal properties of composite structures Grant 8,878,926 - Ye , et al. November 4, 2	2014-11-04
Apparatus And Method For Analyzing Thermal Properties Of Composite Structures App 20120069174 - Ye; Zheng John ; et al.	2012-03-22
Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator Grant 8,080,479 - Collins , et al. December 20, 2	2011-12-20
Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes Grant 8,076,247 - Collins , et al. December 13, 2	2011-12-13
Plasma reactor with reduced electrical skew using electrical bypass elements Grant 7,988,815 - Rauf , et al. August 2, 2	2011-08-02
Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity Grant 7,968,469 - Collins , et al. June 28, 2	2011-06-28
Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources Grant 7,884,025 - Collins , et al. February 8, 2	2011-02-08
Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources Grant 7,879,731 - Collins , et al. February 1, 2	2011-02-01
Plasma control using dual cathode frequency mixing Grant 7,838,430 - Shannon , et al. November 23, 2	2010-11-23
Plasma Reactor With Reduced Electrical Skew Using Electrical Bypass Elements App 20090025878 - Rauf; Shahid ; et al.	2009-01-29
Plasma Reactor With Reduced Electrical Skew Using A Conductive Baffle App 20090025879 - Rauf; Shahid ; et al.	2009-01-29
Method Of Processing A Workpiece In A Plasma Reactor With Variable Height Ground Return Path To Control Plasma Ion Density Uniformity App 20080179181 - COLLINS; KENNETH S. ; et al.	2008-07-31
Plasma Reactor With Ion Distribution Uniformity Controller Employing Plural Vhf Sources App 20080178803 - COLLINS; KENNETH S. ; et al.	2008-07-31
Plasma Process Uniformity Across A Wafer By Controlling A Variable Frequency Coupled To A Harmonic Resonator App 20080182418 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Reactor With Wide Process Window Employing Plural Vhf Sources App 20080179011 - COLLINS; KENNETH S. ; et al.	2008-07-31
Plasma Process Uniformity Across A Wafer By Controlling Rf Phase Between Opposing Electrodes App 20080180028 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Process Uniformity Across A Wafer By Apportioning Ground Return Path Impedances Among Plural Vhf Sources App 20080182417 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Process Uniformity Across A Wafer By Apportioning Power Among Plural Vhf Sources App 20080182416 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Control Using Dual Cathode Frequency Mixing App 20070000611 - Shannon; Steven C. ; et al.	2007-01-04
Plasma control using dual cathode frequency mixing App 20050090118 - Shannon, Steven C. ; et al.	2005-04-28

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