DeOrnellas; Stephen P.
Patent Applications and Registrations
Patent applications and USPTO patent grants for DeOrnellas; Stephen P..The latest application filed is for "reactor with heated and textured electrodes and surfaces".
- DeOrnellas; Stephen P. - Santa Rosa CA
| Patent | Date |
|---|---|
| Reactor With Heated And Textured Electrodes And Surfaces App 20080318432 - DeOrnellas; Stephen P. ; et al. | 2008-12-25 |
| Plasma etch reactor and method Grant 7,223,699 - DeOrnellas , et al. May 29, 2 | 2007-05-29 |
| Method for using a hard mask for critical dimension growth containment Grant 6,958,295 - DeOrnellas , et al. October 25, 2 | 2005-10-25 |
| Method for using a hard mask for critical dimension growth containment Grant 6,951,820 - DeOrnellas , et al. October 4, 2 | 2005-10-04 |
| Plasma etch reactor and method App 20050164513 - DeOrnellas, Stephen P. ; et al. | 2005-07-28 |
| Plasma etch reactor and method Grant 6,905,969 - DeOrnellas , et al. June 14, 2 | 2005-06-14 |
| Method for minimizing the critical dimension growth of a feature on a semiconductor wafer Grant 6,774,046 - DeOrnellas , et al. August 10, 2 | 2004-08-10 |
| Plasma etch reactor and method Grant 6,620,335 - DeOrnellas , et al. September 16, 2 | 2003-09-16 |
| Plasma etch reactor and method App 20020139665 - DeOrnellas, Stephen P. ; et al. | 2002-10-03 |
| Method for using a hard mask for critical dimension growth containment App 20020132485 - DeOrnellas, Stephen P. ; et al. | 2002-09-19 |
| Cobalt silicide etch process and apparatus Grant 6,391,148 - Marks , et al. May 21, 2 | 2002-05-21 |
| Plasma etch reactor having a plurality of magnets Grant 6,354,240 - DeOrnellas , et al. March 12, 2 | 2002-03-12 |
| Method for minimizing the critical dimension growth of a feature on a semiconductor wafer App 20010031561 - DeOrnellas, Stephen P. ; et al. | 2001-10-18 |
| Plasma reactor with a deposition shield App 20010029894 - DeOrnellas, Stephen P. ; et al. | 2001-10-18 |
| Cobalt silicide etch process and apparatus App 20010003676 - Marks, Steven ; et al. | 2001-06-14 |
| Method And Apparatus For Increasing Wafer Throughput Between Cleanings In Semiconductor Processing Reactors App 20010001413 - DEORNELLAS, STEPHEN P. ; et al. | 2001-05-24 |
| Plasma etch reactor and method for emerging films Grant 6,190,496 - DeOrnellas , et al. February 20, 2 | 2001-02-20 |
| Method and apparatus for etching a semiconductor wafer with features having vertical sidewalls Grant 6,127,277 - DeOrnellas , et al. October 3, 2 | 2000-10-03 |
| Plasma etch reactor and method for emerging films Grant 6,048,435 - DeOrnellas , et al. April 11, 2 | 2000-04-11 |
| Plasma reactor with a deposition shield Grant 6,006,694 - DeOrnellas , et al. December 28, 1 | 1999-12-28 |
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