loadpatents
name:-0.047033786773682
name:-0.031419038772583
name:-0.0026390552520752
Daugherty; John E. Patent Filings

Daugherty; John E.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Daugherty; John E..The latest application filed is for "pin-lifter test substrate".

Company Profile
2.25.29
  • Daugherty; John E. - Fremont CA
  • Daugherty; John E. - Alameda CA
  • Daugherty; John E. - Newark CA
  • Daugherty; John E. - Alamada CA
  • Daugherty; John E. - Oakland CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Wafer transport assembly with integrated buffers
Grant 11,393,705 - Daugherty , et al. July 19, 2
2022-07-19
Pin-lifter Test Substrate
App 20220013388 - Daugherty; John E. ;   et al.
2022-01-13
Quartz Component With Protective Coating
App 20210343510 - Xu; Lin ;   et al.
2021-11-04
Mems Coriolis Gas Flow Controller
App 20210140807 - SHAREEF; Iqbal A. ;   et al.
2021-05-13
Wafer Transport Assembly With Integrated Buffers
App 20210005485 - Daugherty; John E. ;   et al.
2021-01-07
Monolithic gas distribution manifold and various construction techniques and use cases therefor
Grant 10,557,197 - Lee , et al. Feb
2020-02-11
Quartz Component With Protective Coating
App 20190272981 - Xu; Lin ;   et al.
2019-09-05
Monolithic Gas Distribution Manifold And Various Construction Techniques And Use Cases Therefor
App 20160108523 - Lee; Andrew C. ;   et al.
2016-04-21
Substrate For Mounting Gas Supply Components And Methods Thereof
App 20160111257 - Kellogg; Michael C. ;   et al.
2016-04-21
Ductile mode drilling methods for brittle components of plasma processing apparatuses
Grant 9,314,854 - Huang , et al. April 19, 2
2016-04-19
Ductile Mode Drilling Methods For Brittle Components Of Plasma Processing Apparatuses
App 20140213061 - Huang; Lihua Li ;   et al.
2014-07-31
Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
Grant 8,486,841 - O'Donnell , et al. July 16, 2
2013-07-16
Methods of finishing quartz glass surfaces and components made by the methods
Grant 8,318,035 - Kiehlbauch , et al. November 27, 2
2012-11-27
On-line chamber cleaning using dry ice blasting
Grant 8,292,698 - Shih , et al. October 23, 2
2012-10-23
Apparatus for shielding process chamber port
Grant 7,685,965 - Hao , et al. March 30, 2
2010-03-30
Corrosion Resistant Component Of Semiconductor Processing Equipment And Method Of Manufacture Thereof
App 20100003826 - O'DONNELL; ROBERT J. ;   et al.
2010-01-07
Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
Grant 7,605,086 - O'Donnell , et al. October 20, 2
2009-10-20
Methodology for cleaning of surface metal contamination from electrode assemblies
Grant 7,578,889 - Shih , et al. August 25, 2
2009-08-25
Methodology for cleaning of surface metal contamination from electrode assemblies
App 20080236620 - Shih; Hong ;   et al.
2008-10-02
Methods of removing metal contaminants from a component for a plasma processing apparatus
Grant 7,402,258 - Kiehlbauch , et al. July 22, 2
2008-07-22
Methods of finishing quartz glass surfaces and components made by the methods
App 20080014754 - Kiehlbauch; Mark W. ;   et al.
2008-01-17
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor
Grant 7,311,797 - O'Donnell , et al. December 25, 2
2007-12-25
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor
Grant 7,300,537 - O'Donnell , et al. November 27, 2
2007-11-27
Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
Grant 7,255,898 - O'Donnell , et al. August 14, 2
2007-08-14
Methods of finishing quartz glass surfaces and components made by the methods
Grant 7,250,114 - Kiehlbauch , et al. July 31, 2
2007-07-31
Methods of removing metal contaminants from a component for a plasma processing apparatus
App 20070051699 - Kiehlbauch; Mark W. ;   et al.
2007-03-08
Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
App 20070012657 - O'Donnell; Robert J. ;   et al.
2007-01-18
Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
Grant 7,128,804 - O'Donnell , et al. October 31, 2
2006-10-31
In-situ cleaning of a polymer coated plasma processing chamber
Grant 6,994,769 - Singh , et al. February 7, 2
2006-02-07
Methods and apparatus for optimal temperature control in a plasma processing system
App 20060000551 - Saldana; Miguel A. ;   et al.
2006-01-05
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor
App 20050150866 - O'Donnell, Robert J. ;   et al.
2005-07-14
Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof
App 20050064248 - O'Donnell, Robert J. ;   et al.
2005-03-24
Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof
Grant 6,830,622 - O'Donnell , et al. December 14, 2
2004-12-14
Methods of finishing quartz glass surfaces and components made by the methods
App 20040238487 - Kiehlbauch, Mark W. ;   et al.
2004-12-02
In-situ cleaning of a polymer coated plasma processing chamber
App 20040231800 - Singh, Harmeet ;   et al.
2004-11-25
Fullerene coated component of semiconductor processing equipment and method of manufacturing thereof
Grant 6,790,242 - O'Donnell , et al. September 14, 2
2004-09-14
In-situ cleaning of a polymer coated plasma processing chamber
Grant 6,776,851 - Singh , et al. August 17, 2
2004-08-17
Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof
Grant 6,773,751 - O'Donnell , et al. August 10, 2
2004-08-10
Boron Nitride/yttria Composite Components Of Semiconductor Processing Equipment And Method Of Manufacturing Thereof
App 20040137147 - O'Donnell, Robert J. ;   et al.
2004-07-15
Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
App 20040023047 - O'Donnell, Robert J. ;   et al.
2004-02-05
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor
App 20040002221 - O'Donnell, Robert J. ;   et al.
2004-01-01
Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
Grant 6,620,520 - O'Donnell , et al. September 16, 2
2003-09-16
Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof
Grant 6,613,442 - O'Donnell , et al. September 2, 2
2003-09-02
Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof
Grant 6,533,910 - O'Donnell , et al. March 18, 2
2003-03-18
High pressure wafer-less auto clean for etch applications
App 20030005943 - Singh, Harmeet ;   et al.
2003-01-09
Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof
App 20020142611 - O'Donnell, Robert J. ;   et al.
2002-10-03
Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof
App 20020094378 - O'Donnell, Robert J. ;   et al.
2002-07-18
Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
App 20020086153 - O'Donnell, Robert J. ;   et al.
2002-07-04
Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
App 20020086545 - O'Donnell, Robert J. ;   et al.
2002-07-04
Fullerene coated component of semiconductor processing equipment and method of manufacturing thereof
App 20020086553 - O'Donnell, Robert J. ;   et al.
2002-07-04
Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof
App 20020086554 - O'Donnell, Robert J. ;   et al.
2002-07-04
Diamond coatings on reactor wall and method of manufacturing thereof
App 20020086501 - O'Donnell, Robert J. ;   et al.
2002-07-04
Techniques for improving etch rate uniformity
Grant 6,344,105 - Daugherty , et al. February 5, 2
2002-02-05

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