loadpatents
Patent applications and USPTO patent grants for DAGAN; Eli.The latest application filed is for "atomic oxygen and ozone cleaning device having a temperature control apparatus".
Patent | Date |
---|---|
Atomic Oxygen And Ozone Cleaning Device Having A Temperature Control Apparatus App 20220288259 - WU; Banqiu ;   et al. | 2022-09-15 |
Method for removing photoresist from photomask substrate Grant 11,114,350 - Wu , et al. September 7, 2 | 2021-09-07 |
Portion of layer removal at substrate edge Grant 11,054,746 - Wu , et al. July 6, 2 | 2021-07-06 |
Adhesive Material Removal From Photomask In Ultraviolet Lithography Application App 20210185793 - WU; Banqiu ;   et al. | 2021-06-17 |
Method and apparatus for high throughput photomask curing Grant 10,962,889 - Wu , et al. March 30, 2 | 2021-03-30 |
Photomask pellicle glue residue removal Grant 10,933,624 - Wu , et al. March 2, 2 | 2021-03-02 |
Attachment feature removal from photomask in extreme ultraviolet lithography application Grant 10,928,724 - Wu , et al. February 23, 2 | 2021-02-23 |
Method For Removing Photoresist From Photomask Substrate App 20200328128 - WU; Banqiu ;   et al. | 2020-10-15 |
Photomask laser etch Grant 10,802,392 - Wu , et al. October 13, 2 | 2020-10-13 |
Photomask Pellicle Glue Residue Removal App 20200290339 - WU; Banqiu ;   et al. | 2020-09-17 |
Photomask pellicle glue residue removal Grant 10,710,358 - Wu , et al. | 2020-07-14 |
Attachment Feature Removal From Photomask In Extreme Ultraviolet Lithography Application App 20200183268 - WU; Banqiu ;   et al. | 2020-06-11 |
Method And Apparatus For High Throughput Photomask Curing App 20200166834 - WU; Banqiu ;   et al. | 2020-05-28 |
Portion Of Layer Removal At Substrate Edge App 20200096860 - WU; Banqiu ;   et al. | 2020-03-26 |
Atomic Oxygen And Ozone Device For Cleaning And Surface Treatment App 20200098556 - WU; Banqiu ;   et al. | 2020-03-26 |
Photomask Laser Etch App 20200057362 - WU; Banqiu ;   et al. | 2020-02-20 |
Pellicle Adhesive Residue Removal System And Methods App 20200033740 - WU; Banqiu ;   et al. | 2020-01-30 |
Photomask Pellicle Glue Residue Removal App 20200009854 - WU; Banqiu ;   et al. | 2020-01-09 |
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