Cruse; James P.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Cruse; James P..The latest application filed is for "etch process having adaptive control with etch depth of pressure and power".

Company Profile

2.45.49

Cruse; James P. - Santa Cruz CA
Cruse; James P. - Soquel CA
- Santa Cruz CA US
Cruse; James P. - San Jose CA
Cruse; James P. - Capitola CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods and apparatus for providing a gas mixture to a pair of process chambers Grant 9,587,789 - Lee , et al. March 7, 2	2017-03-07
Methods and apparatus for rapidly responsive heat control in plasma processing devices Grant 9,155,134 - Zhang , et al. October 6, 2	2015-10-06
Method for removing halogen-containing residues from substrate Grant 8,992,689 - Diaz , et al. March 31, 2	2015-03-31
Gas delivery system and method of use thereof Grant 8,931,512 - Cruse , et al. January 13, 2	2015-01-13
Methods and apparatus for rapidly responsive heat control in plasma processing devices Grant 8,895,889 - Zhang , et al. November 25, 2	2014-11-25
Etch Process Having Adaptive Control With Etch Depth Of Pressure And Power App 20140342570 - Doan; Kenny Linh ; et al.	2014-11-20
Method extending the service interval of a gas distribution plate Grant 8,845,816 - Diaz , et al. September 30, 2	2014-09-30
Methods for processing substrates in process systems having shared resources Grant 8,721,798 - Cruse , et al. May 13, 2	2014-05-13
Methods and apparatus for calibrating flow controllers in substrate processing systems Grant 8,707,754 - Cruse , et al. April 29, 2	2014-04-29
Methods And Apparatus For Providing A Gas Mixture To A Pair Of Process Chambers App 20140076850 - LEE; JARED AHMAD ; et al.	2014-03-20
Methods and apparatus for providing a gas mixture to a pair of process chambers Grant 8,616,224 - Lee , et al. December 31, 2	2013-12-31
Methods and apparatus for calibrating pressure gauges in a substrate processing system Grant 8,616,043 - Cruse , et al. December 31, 2	2013-12-31
Methods and apparatus for calibrating pressure gauges in a substrate processing system Grant 08616043 -	2013-12-31
Apparatus for radial delivery of gas to a chamber and methods of use thereof Grant 8,562,742 - Lee , et al. October 22, 2	2013-10-22
Methods and apparatus for tuning matching networks Grant 8,513,889 - Zhang , et al. August 20, 2	2013-08-20
Methods for processing substrates in process systems having shared resources Grant 8,496,756 - Cruse , et al. July 30, 2	2013-07-30
Methods And Apparatus For Rapidly Responsive Heat Control In Plasma Processing Devices App 20130180963 - ZHANG; CHUNLEI ; et al.	2013-07-18
Methods for monitoring processing equipment Grant 8,473,247 - Cruse , et al. June 25, 2	2013-06-25
Methods for extending the lifetime of pressure gauges coupled to substrate process chambers Grant 8,454,756 - Cruse June 4, 2	2013-06-04
Gas Delivery System And Method Of Use Thereof App 20120227817 - CRUSE; JAMES P. ; et al.	2012-09-13
Method For Removing Halogen-containing Residues From Substrate App 20120222699 - Diaz; Adauto ; et al.	2012-09-06
Method Extending The Service Interval Of A Gas Distribution Plate App 20120222752 - Diaz; Adauto ; et al.	2012-09-06
Apparatus for multiple frequency power application Grant 8,237,517 - Shannon , et al. August 7, 2	2012-08-07
Low power RF tuning using optical and non-reflected power methods Grant 8,144,329 - Cruse , et al. March 27, 2	2012-03-27
Methods for processing substrates in a dual chamber processing system having shared resources Grant 8,097,088 - Lim , et al. January 17, 2	2012-01-17
Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator Grant 8,080,479 - Collins , et al. December 20, 2	2011-12-20
Methods For Removing Byproducts From Load Lock Chambers App 20110304078 - LEE; JARED AHMAD ; et al.	2011-12-15
Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes Grant 8,076,247 - Collins , et al. December 13, 2	2011-12-13
Apparatus For Multiple Frequency Power Application App 20110291771 - Shannon; Steven C. ; et al.	2011-12-01
Methods And Apparatus For Calibrating Flow Controllers In Substrate Processing Systems App 20110265549 - CRUSE; JAMES P. ; et al.	2011-11-03
System And Method For Calibrating Pressure Gauges In A Substrate Processing System App 20110265899 - CRUSE; JAMES P. ; et al.	2011-11-03
Methods For Monitoring Processing Equipment App 20110270574 - CRUSE; JAMES P. ; et al.	2011-11-03
Process Chambers Having Shared Resources And Methods Of Use Thereof App 20110269314 - LEE; JARED AHMAD ; et al.	2011-11-03
Methods For Processing Substrates In Process Systems Having Shared Resources App 20110266256 - Cruse; James P. ; et al.	2011-11-03
Methods And Apparatus For Reducing Flow Splitting Errors Using Orifice Ratio Conductance Control App 20110265883 - CRUSE; JAMES P. ; et al.	2011-11-03
Methods For Processing Substrates In Process Systems Having Shared Resources App 20110265814 - CRUSE; JAMES P. ; et al.	2011-11-03
Methods And Apparatus For Providing A Gas Mixture To A Pair Of Process Chambers App 20110265831 - LEE; JARED AHMAD ; et al.	2011-11-03
Apparatus For Radial Delivery Of Gas To A Chamber And Methods Of Use Thereof App 20110265887 - LEE; JARED AHMAD ; et al.	2011-11-03
Methods For Extending The Lifetime Of Pressure Gauges Coupled To Substrate Process Chambers App 20110265824 - CRUSE; JAMES P.	2011-11-03
Twin Chamber Processing System App 20110265951 - XU; MING ; et al.	2011-11-03
Low Power Rf Tuning Using Optical And Non-reflected Power Methods App 20110263050 - Cruse; James P. ; et al.	2011-10-27
Apparatus for multiple frequency power application Grant 7,994,872 - Shannon , et al. August 9, 2	2011-08-09
Plasma reactor with reduced electrical skew using electrical bypass elements Grant 7,988,815 - Rauf , et al. August 2, 2	2011-08-02
Methods And Apparatus For Tuning Matching Networks App 20110162798 - ZHANG; CHUNLEI ; et al.	2011-07-07
Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity Grant 7,968,469 - Collins , et al. June 28, 2	2011-06-28
Elimination of flow and pressure gradients in low utilization processes Grant 7,955,646 - Cruse , et al. June 7, 2	2011-06-07
Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources Grant 7,884,025 - Collins , et al. February 8, 2	2011-02-08
Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources Grant 7,879,731 - Collins , et al. February 1, 2	2011-02-01
Low Power Rf Tuning Using Optical And Non-reflected Power Methods App 20110011743 - Cruse; James P. ; et al.	2011-01-20
Plasma Reactor With Rf Generator And Automatic Impedance Match With Minimum Reflected Power-seeking Control App 20110009999 - Zhang; Chunlei ; et al.	2011-01-13
Methods And Apparatus For Rapidly Responsive Heat Control In Plasma Processing Devices App 20100096109 - ZHANG; CHUNLEI ; et al.	2010-04-22
Apparatus For Multiple Frequency Power Application App 20100013572 - SHANNON; STEVEN C. ; et al.	2010-01-21
Methods for low temperature oxidation of a semiconductor device Grant 7,645,709 - Chua , et al. January 12, 2	2010-01-12
Method And Apparatus Of A Substrate Etching System And Process App 20090272717 - Pamarthy; Sharma V. ; et al.	2009-11-05
Plasma ignition and complete faraday shielding of capacitive coupling for an inductively-coupled plasma Grant 7,605,008 - Chua , et al. October 20, 2	2009-10-20
Process for wafer backside polymer removal with a ring of plasma under the wafer Grant 7,552,736 - Collins , et al. June 30, 2	2009-06-30
Methods For Low Temperature Oxidation Of A Semiconductor Device App 20090035952 - CHUA; THAI CHENG ; et al.	2009-02-05
Plasma Reactor With Reduced Electrical Skew Using Electrical Bypass Elements App 20090025878 - Rauf; Shahid ; et al.	2009-01-29
Plasma Reactor With Reduced Electrical Skew Using A Conductive Baffle App 20090025879 - Rauf; Shahid ; et al.	2009-01-29
Device That Enables Plasma Ignition And Complete Faraday Shielding Of Capacitive Coupling For An Inductively-coupled Plasma App 20080241419 - CHUA; THAI CHENG ; et al.	2008-10-02
Reactor For Wafer Backside Polymer Removal Having An Etch Plasma Jet Stream Source App 20080179009 - COLLINS; KENNETH S. ; et al.	2008-07-31
Process For Wafer Backside Polymer Removal With A Plasma Stream App 20080179289 - COLLINS; KENNETH S. ; et al.	2008-07-31
Reactor For Wafer Backside Polymer Removal Using Plasma Products In A Lower Process Zone And Purge Gases In An Upper Process Zone App 20080179007 - COLLINS; KENNETH S. ; et al.	2008-07-31
Process For Wafer Backside Polymer Removal With A Ring Of Plasma Under The Wafer App 20080178913 - COLLINS; KENNETH S. ; et al.	2008-07-31
Method Of Processing A Workpiece In A Plasma Reactor With Variable Height Ground Return Path To Control Plasma Ion Density Uniformity App 20080179181 - COLLINS; KENNETH S. ; et al.	2008-07-31
Plasma Reactor With Ion Distribution Uniformity Controller Employing Plural Vhf Sources App 20080178803 - COLLINS; KENNETH S. ; et al.	2008-07-31
Reactor For Wafer Backside Polymer Removal Using An Etch Plasma Feeding A Lower Process Zone And A Scavenger Plasma Feeding An Upper Process Zone App 20080179008 - Collins; Kenneth S. ; et al.	2008-07-31
Process For Wafer Backside Polymer Removal And Wafer Front Side Scavenger Plasma App 20080179288 - COLLINS; KENNETH S. ; et al.	2008-07-31
Process For Wafer Backside Polymer Removal With Wafer Front Side Gas Purge App 20080179287 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Process Uniformity Across A Wafer By Apportioning Ground Return Path Impedances Among Plural Vhf Sources App 20080182417 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Reactor With Wide Process Window Employing Plural Vhf Sources App 20080179011 - COLLINS; KENNETH S. ; et al.	2008-07-31
Plasma Process Uniformity Across A Wafer By Apportioning Power Among Plural Vhf Sources App 20080182416 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Process Uniformity Across A Wafer By Controlling A Variable Frequency Coupled To A Harmonic Resonator App 20080182418 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Process Uniformity Across A Wafer By Controlling Rf Phase Between Opposing Electrodes App 20080180028 - Collins; Kenneth S. ; et al.	2008-07-31
Temperature-switched Process For Wafer Backside Polymer Removal And Front Side Photoresist Strip App 20080179290 - Collins; Kenneth S. ; et al.	2008-07-31
Low Power RF Tuning Using Optical and Non-Reflected Power Methods App 20080003702 - Cruse; James P. ; et al.	2008-01-03
Elimination of flow and pressure gradients in low utilization processes App 20060029747 - Cruse; James P. ; et al.	2006-02-09
Plasma Method And Apparatus For Processing A Substrate App 20030232513 - Kraus, Philip Allan ; et al.	2003-12-18
Plasma method and apparatus for processing a substrate Grant 6,660,659 - Kraus , et al. December 9, 2	2003-12-09
Process monitoring apparatus and method Grant 6,652,710 - Cruse November 25, 2	2003-11-25
Process Monitoring Apparatus and Method App 20010051437 - CRUSE, JAMES P.	2001-12-13
Method and apparatus for monitoring processes using multiple parameters of a semiconductor wafer processing system Grant 5,910,011 - Cruse June 8, 1	1999-06-08