Patent | Date |
---|
Plasma process device and plasma process method Grant 8,394,231 - Takatsuki , et al. March 12, 2 | 2013-03-12 |
Substrate processing method Grant 7,662,728 - Kashiwagi , et al. February 16, 2 | 2010-02-16 |
Method for forming insulation film and apparatus for forming insulation film Grant 7,601,402 - Kashiwagi , et al. October 13, 2 | 2009-10-13 |
Semiconductor device App 20090085130 - Suzuki; Kenji ;   et al. | 2009-04-02 |
Substrate Processing Method App 20090011149 - KASHIWAGI; Yusaku ;   et al. | 2009-01-08 |
Plasma process device and plasma process method App 20070131171 - Takatsuki; Koichi ;   et al. | 2007-06-14 |
Substrate processing method App 20060205191 - Kashiwagi; Yusaku ;   et al. | 2006-09-14 |
Electroless plating apparatus and electroless plating method App 20060037858 - Marumo; Yoshinori ;   et al. | 2006-02-23 |
Solution treatment apparatus and solution treatment method App 20060000704 - Sato; Hiroshi ;   et al. | 2006-01-05 |
Semiconductor device and fabrication method therefor Grant 6,949,829 - Akahori , et al. September 27, 2 | 2005-09-27 |
Coating device and coating method App 20050170093 - Chung, Gishi ;   et al. | 2005-08-04 |
Fabrication process of a semiconductor device including a CVD process of a metal film Grant 6,893,953 - Hoshino , et al. May 17, 2 | 2005-05-17 |
Low-dielectric silicon nitride film and method of forming the same, semiconductor device and fabrication process thereof Grant 6,890,869 - Chung May 10, 2 | 2005-05-10 |
Electroless plating apparatus and electroless plating method App 20040251141 - Chung, Gishi ;   et al. | 2004-12-16 |
Semiconductor manufacturing apparatus and heat treatment method App 20040253839 - Shimizu, Masahiro ;   et al. | 2004-12-16 |
Method for forming insulation film and apparatus for forming insulation film App 20040212114 - Kashiwagi, Yusaku ;   et al. | 2004-10-28 |
Plasma processing device and plasma processing method App 20040127033 - Takatsuki, Koichi ;   et al. | 2004-07-01 |
Semiconductor device and fabrication method therefor App 20040041266 - Akahori, Takashi ;   et al. | 2004-03-04 |
Low-dielectric silicon nitride film and method of forming the same, semiconductor device and fabrication process thereof App 20030162412 - Chung, Gishi | 2003-08-28 |
Method and apparatus for manufacturing semiconductor device App 20020173078 - Kawano, Yumiko ;   et al. | 2002-11-21 |
Fabrication process of a semiconductor device including a CVD process of a metal film App 20020009872 - Hoshino, Tomohisa ;   et al. | 2002-01-24 |
Dynamic memory storage capacitor having reduced gated diode leakage Grant 5,352,913 - Chung , et al. October 4, 1 | 1994-10-04 |
High angle implant around top of trench to reduce gated diode leakage Grant 5,112,762 - Anderson , et al. May 12, 1 | 1992-05-12 |
Method of making trench DRAM cell with stacked capacitor and buried lateral contact Grant 4,978,634 - Shen , et al. December 18, 1 | 1990-12-18 |