| Patent | Date |
|---|
Disposable Syringe Set Having Improved Compatibility
App 20200345939 - CHOI; Dae Han | 2020-11-05 |
System and method for detecting damaged tool of multi-axis head machining equipment
Grant 10,589,395 - Kim , et al. | 2020-03-17 |
Method for charging electronic device, electronic device, and storage medium
Grant 10,574,077 - Choi Feb | 2020-02-25 |
System And Method For Detecting Damaged Tool Of Multi-axis Head Machining Equipment
App 20190134766 - Kim; Ho-Hwan ; et al. | 2019-05-09 |
Method For Charging Electronic Device, Electronic Device, And Storage Medium
App 20180175636 - CHOI; Dae-Han | 2018-06-21 |
Semiconductor structure having gap fill dielectric layer disposed between fins
Grant 9,735,154 - Wei , et al. August 15, 2 | 2017-08-15 |
Apparatus for the deposition of a conformal film on a substrate and methods therefor
Grant 9,384,979 - Choi , et al. July 5, 2 | 2016-07-05 |
Method Of Forming Semiconductor Fins
App 20160043081 - Wei; Andy Chih-Hung ; et al. | 2016-02-11 |
Finfet With Confined Epitaxy
App 20160005868 - Wei; Andy Chih-Hung ; et al. | 2016-01-07 |
Method of forming semiconductor fins
Grant 9,196,499 - Wei , et al. November 24, 2 | 2015-11-24 |
Fin field-effect transistor (FinFET) device formed using a single spacer, double hardmask scheme
Grant 9,159,630 - Wei , et al. October 13, 2 | 2015-10-13 |
Devices And Methods Of Forming Fins At Tight Fin Pitches
App 20150287595 - WEI; Andy ; et al. | 2015-10-08 |
Method Of Forming Semiconductor Fins
App 20150279684 - Wei; Andy Chih-Hung ; et al. | 2015-10-01 |
Partially Crystallized Fin Hard Mask For Fin Field-effect-transistor (finfet) Device
App 20150270175 - Hu; Xiang ; et al. | 2015-09-24 |
Forming Source/drain Regions With Single Reticle And Resulting Device
App 20150255353 - WAN; Jing ; et al. | 2015-09-10 |
Devices and methods of forming fins at tight fin pitches
Grant 9,105,478 - Wei , et al. August 11, 2 | 2015-08-11 |
Facilitating mask pattern formation
Grant 9,034,767 - Hu , et al. May 19, 2 | 2015-05-19 |
Facilitating Mask Pattern Formation
App 20150132962 - HU; Xiang ; et al. | 2015-05-14 |
Devices And Methods Of Forming Fins At Tight Fin Pitches
App 20150115418 - WEI; Andy ; et al. | 2015-04-30 |
Selective removal of gate structure sidewall(s) to facilitate sidewall spacer protection
Grant 8,993,445 - Choi , et al. March 31, 2 | 2015-03-31 |
Double patterning via triangular shaped sidewall spacers
Grant 8,969,205 - Shen , et al. March 3, 2 | 2015-03-03 |
Mask formation processing
Grant 8,871,651 - Choi , et al. October 28, 2 | 2014-10-28 |
Double Patterning Via Triangular Shaped Sidewall Spacers
App 20140291735 - Shen; HongLiang ; et al. | 2014-10-02 |
Methods for fabricating integrated circuits with improved semiconductor fin structures
Grant 8,835,328 - Hwang , et al. September 16, 2 | 2014-09-16 |
Methods For Fabricating Integrated Circuits With Improved Semiconductor Fin Structures
App 20140227879 - Hwang; Wontae ; et al. | 2014-08-14 |
Selective Removal Of Gate Structure Sidewall(s) To Facilitate Sidewall Spacer Protection
App 20140199845 - CHOI; Dae-Han ; et al. | 2014-07-17 |
Gate Structure Formation Processes
App 20140179093 - CHOI; Dae-Han ; et al. | 2014-06-26 |
Method Of Forming Semiconductor Fins
App 20140148011 - Choi; Dae-han ; et al. | 2014-05-29 |
Semiconductor device having a gate formed on a uniform surface and method for forming the same
Grant 8,697,501 - Choi , et al. April 15, 2 | 2014-04-15 |
Selective Fin Cut Process
App 20140065828 - CHOI; Dae-Han ; et al. | 2014-03-06 |
Selective fin cut process
Grant 8,658,536 - Choi , et al. February 25, 2 | 2014-02-25 |
Critical dimension reduction and roughness control
Grant 8,614,149 - Lee , et al. December 24, 2 | 2013-12-24 |
Methods For Fabricating Integrated Circuits Using Tailored Chamfered Gate Liner Profiles
App 20130224944 - Khanna; Puneet ; et al. | 2013-08-29 |
Apparatus For The Deposition Of A Conformal Film On A Substrate And Methods Therefor
App 20130074769 - CHOI; Dae-Han ; et al. | 2013-03-28 |
Apparatus for the deposition of a conformal film on a substrate and methods therefor
Grant 8,357,434 - Choi , et al. January 22, 2 | 2013-01-22 |
Critical Dimension Reduction And Roughness Control
App 20120309201 - Lee; Sangheon ; et al. | 2012-12-06 |
Critical dimension reduction and roughness control
Grant 8,268,118 - Lee , et al. September 18, 2 | 2012-09-18 |
Critical Dimension Reduction And Roughness Control
App 20100148317 - LEE; Sangheon ; et al. | 2010-06-17 |
Critical dimension reduction and roughness control
Grant 7,695,632 - Lee , et al. April 13, 2 | 2010-04-13 |
Etch rate uniformity using the independent movement of electrode pieces
App 20060278339 - Kim; Jisoo ; et al. | 2006-12-14 |
Critical dimension reduction and roughness control
App 20060266478 - Lee; Sangheon ; et al. | 2006-11-30 |
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