Patent | Date |
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Method Of Fabricating Semiconductor Device App 20210272815 - Chang; Chong Kwang ;   et al. | 2021-09-02 |
Method of fabricating semiconductor device Grant 11,024,509 - Chang , et al. June 1, 2 | 2021-06-01 |
Image Sensor App 20210126028 - JEON; MIN HWAN ;   et al. | 2021-04-29 |
Method Of Fabricating Semiconductor Device App 20200234966 - Chang; Chong Kwang ;   et al. | 2020-07-23 |
Semiconductor device Grant 10,276,570 - You , et al. | 2019-04-30 |
Method of manufacturing integrated circuit device Grant 10,224,204 - Khang , et al. | 2019-03-05 |
Method Of Manufacturing Integrated Circuit Device App 20190051526 - KHANG; DONG-HOON ;   et al. | 2019-02-14 |
Semiconductor Device App 20180226404 - YOU; Jung-Gun ;   et al. | 2018-08-09 |
Semiconductor device Grant 9,941,281 - You , et al. April 10, 2 | 2018-04-10 |
Semiconductor devices and methods of manufacturing the same Grant 9,865,736 - Chang , et al. January 9, 2 | 2018-01-09 |
Semiconductor Device App 20170133370 - YOU; Jung-Gun ;   et al. | 2017-05-11 |
Semiconductor Devices And Methods Of Manufacturing The Same App 20170110569 - CHANG; Chong-Kwang ;   et al. | 2017-04-20 |
Semiconductor device Grant 9,553,089 - You , et al. January 24, 2 | 2017-01-24 |
Semiconductor Device App 20160293599 - You; Jung-Gun ;   et al. | 2016-10-06 |
Semiconductor Device App 20160293600 - YOU; Jung-Gun ;   et al. | 2016-10-06 |
Methods Of Fabricating Semiconductor Devices Having Gate Structure App 20140120681 - CHANG; Chong-Kwang ;   et al. | 2014-05-01 |
Method For Fabricating Semiconductor Device App 20140103405 - Chang; Chong-Kwang ;   et al. | 2014-04-17 |
Semiconductor device manufacturing methods Grant 8,697,339 - Zhuang , et al. April 15, 2 | 2014-04-15 |
Method of fabricating semiconductor integrated circuit device Grant 8,518,723 - Chang , et al. August 27, 2 | 2013-08-27 |
Method Of Forming A Contact Hole And Apparatus For Performing The Same App 20130023127 - CHANG; Chong-Kwang ;   et al. | 2013-01-24 |
Method of manufacturing semiconductor device Grant 8,357,576 - Chang , et al. January 22, 2 | 2013-01-22 |
Apparatus for etching edge of wafer Grant 8,349,126 - Chang , et al. January 8, 2 | 2013-01-08 |
Semiconductor integrated circuit device Grant 8,207,594 - Shin , et al. June 26, 2 | 2012-06-26 |
Method Of Fabricating Semiconductor Device App 20110256700 - Chang; Chong-Kwang ;   et al. | 2011-10-20 |
Method Of Forming Fine Patterns Of Semiconductor Device App 20110201202 - CHANG; Chong-Kwang ;   et al. | 2011-08-18 |
Method Of Manufacturing Semiconductor Device App 20110195550 - CHANG; Chong-Kwang ;   et al. | 2011-08-11 |
Semiconductor Device Manufacturing Methods App 20110183266 - Zhuang; Haoren ;   et al. | 2011-07-28 |
Methods for forming contacts for dual stress liner CMOS semiconductor devices Grant 7,816,271 - Lee , et al. October 19, 2 | 2010-10-19 |
Semiconductor Device With Improved Stressor Shape App 20100230758 - CHANG; Chong Kwang ;   et al. | 2010-09-16 |
Methods for removing gate sidewall spacers in CMOS semiconductor fabrication processes Grant 7,790,622 - Lee , et al. September 7, 2 | 2010-09-07 |
Apparatus for Etching Edge of Wafer App 20100212833 - Chang; Chong-Kwang ;   et al. | 2010-08-26 |
Semiconductor Integrated Circuit Device App 20100200929 - Shin; Dong Suk ;   et al. | 2010-08-12 |
Method of fabricating semiconductor integrated circuit device App 20100173497 - Chang; Chong-Kwang ;   et al. | 2010-07-08 |
Method of fabricating semiconductor integrated circuit device App 20100136790 - Chang; Chong-Kwang ;   et al. | 2010-06-03 |
Methods of fabricating integrated circuit devices using anti-reflective coating as implant blocking layer Grant 7,585,763 - Park , et al. September 8, 2 | 2009-09-08 |
Methods of forming mask patterns on semiconductor wafers that compensate for nonuniform center-to-edge etch rates during photolithographic processing Grant 7,541,290 - Chang , et al. June 2, 2 | 2009-06-02 |
Methods of fabricating integrated circuit transistors by simultaneously removing a photoresist layer and a carbon-containing layer on different active areas Grant 7,541,234 - Chang , et al. June 2, 2 | 2009-06-02 |
Methods For Removing Gate Sidewall Spacers In CMOS Semiconductor Fabrication Processes App 20090017625 - Lee; Kyoung Woo ;   et al. | 2009-01-15 |
Methods For Forming Contacts For Dual Stress Liner CMOS Semiconductor Devices App 20090017630 - Lee; Kyoung Woo ;   et al. | 2009-01-15 |
Semiconductor device manufacturing methods App 20080286698 - Zhuang; Haoren ;   et al. | 2008-11-20 |
Methods of Forming Mask Patterns on Semiconductor Wafers that Compensate for Nonuniform Center-to-Edge Etch Rates During Photolithographic Processing App 20080220609 - Chang; Chong Kwang ;   et al. | 2008-09-11 |
Methods of fabricating integrated circuit devices using anti-reflective coating as implant blocking layer App 20070105293 - Park; Sang Jine ;   et al. | 2007-05-10 |
Methods of fabricating integrated circuit transistors by simultaneously removing a photoresist layer and a carbon-containing layer on different active areas App 20070099126 - Chang; Chong Kwang ;   et al. | 2007-05-03 |