name:-0.00071597099304199
name:-0.01104998588562
name:-0.00042605400085449
Candela Instruments Patent Filings

Candela Instruments

Patent Applications and Registrations

Patent applications and USPTO patent grants for Candela Instruments.The latest application filed is for "method of detecting and classifying scratches and particles on thin film disks or wafers".

Company Profile
0.11.0
  • Candela Instruments - Fremont CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Trademarks
Patent Activity
PatentDate
Method of detecting and classifying scratches and particles on thin film disks or wafers
Grant 7,123,357 - Meeks October 17, 2
2006-10-17
Method of detecting and classifying scratches, particles and pits on thin film disks or wafers
Grant 6,909,500 - Meeks June 21, 2
2005-06-21
Material independent optical profilometer
Grant 6,897,957 - Meeks May 24, 2
2005-05-24
Method of automatically focusing an optical beam on transparent or reflective thin film wafers or disks
Grant 6,781,103 - Lane , et al. August 24, 2
2004-08-24
Combined high speed optical profilometer and ellipsometer
Grant 6,757,056 - Meeks , et al. June 29, 2
2004-06-29
System for simultaneously measuring thin film layer thickness, reflectivity, roughness, surface profile and magnetic pattern
Grant 6,717,671 - Meeks , et al. April 6, 2
2004-04-06
System and method for simultaneously measuring thin film layer thickness, reflectivity, roughness, surface profile and magnetic pattern in thin film magnetic disks and silicon wafers
Grant 6,665,078 - Meeks , et al. December 16, 2
2003-12-16
High speed optical profilometer for measuring surface height variation
Grant 6,392,749 - Meeks , et al. May 21, 2
2002-05-21
System and method for measuring thin film properties and analyzing two-dimensional histograms using and/not operations
Grant 6,268,919 - Meeks , et al. July 31, 2
2001-07-31
System and method for measuring thin film properties and analyzing two-dimensional histograms using a symmetry operation
Grant 6,130,749 - Meeks , et al. October 10, 2
2000-10-10
System and method for simultaneously measuring lubricant thickness and degradation, thin film thickness and wear, and surface roughness
Grant 6,031,615 - Meeks , et al. February 29, 2
2000-02-29
Company Registrations
SEC0001071285CANDELA INSTRUMENTS

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