| Patent | Date |
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Formation Of Fully Silicided Metal Gate Using Dual Self-aligned Silicide Process
App 20080026551 - Cabral; Cyril JR. ; et al. | 2008-01-31 |
Opto-thermal annealing methods for forming metal gate and fully silicided gate field effect transistors
App 20070249131 - Allen; Scott D. ; et al. | 2007-10-25 |
Changing An Electrical Resistance Of A Resistor
App 20070229212 - Ballantine; Arne W. ; et al. | 2007-10-04 |
Structure And Method Of Forming Electrodeposited Contacts
App 20070222066 - Cabral; Cyril JR. ; et al. | 2007-09-27 |
Method And Apparatus For Fabricating Cmos Field Effect Transistors
App 20070128785 - CABRAL; CYRIL JR. ; et al. | 2007-06-07 |
Structure And Method To Generate Local Mechanical Gate Stress For Mosfet Channel Mobility Modification
App 20070111421 - Cabral; Cyril JR. ; et al. | 2007-05-17 |
Alpha particle shields in chip packaging
App 20070045844 - Andry; Paul Stephen ; et al. | 2007-03-01 |
Metal Gate Mosfet By Full Semiconductor Metal Alloy Conversion
App 20070034967 - Nayfeh; Hasan M. ; et al. | 2007-02-15 |
Method and structure for reduction of soft error rates in integrated circuits
App 20070013073 - Cabral; Cyril JR. ; et al. | 2007-01-18 |
Selective implementation of barrier layers to achieve threshold voltage control in CMOS device fabrication with high k dielectrics
App 20060275977 - Bojarczuk; Nestor A. JR. ; et al. | 2006-12-07 |
Interconnect Structure Diffusion Barrier With High Nitrogen Content
App 20060264048 - Cabral; Cyril JR. ; et al. | 2006-11-23 |
CMOS silicide metal gate integration
App 20060189061 - Amos; Ricky S. ; et al. | 2006-08-24 |
Metal carbide gate structure and method of fabrication
App 20060186490 - Cabral; Cyril JR. ; et al. | 2006-08-24 |
Gate stack engineering by electrochemical processing utilizing through-gate-dielectric current flow
App 20060166474 - Vereecken; Philippe M. ; et al. | 2006-07-27 |
Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures
App 20060138603 - Cabral; Cyril JR. ; et al. | 2006-06-29 |
Structure And Method To Generate Local Mechanical Gate Stress For Mosfet Channel Mobility Modification
App 20060124974 - Cabral; Cyril Jr. ; et al. | 2006-06-15 |
Method For Forming Self-aligned Dual Fully Silicided Gates In Cmos Devices
App 20060121663 - Fang; Sunfei ; et al. | 2006-06-08 |
Method for forming self-aligned dual salicide in CMOS technologies
App 20060121664 - Fang; Sunfei ; et al. | 2006-06-08 |
Method For Forming Self-aligned Dual Salicide In Cmos Technologies
App 20060121665 - Fang; Sunfei ; et al. | 2006-06-08 |
Method For Forming Self-aligned Dual Salicide In Cmos Technologies
App 20060121662 - Fang; Sunfei ; et al. | 2006-06-08 |
Nitrogen-containing field effect transistor gate stack containing a threshold voltage control layer formed via deposition of a metal oxide
App 20060102968 - Bojarczuk; Nestor A. JR. ; et al. | 2006-05-18 |
Process options of forming silicided metal gates for advanced CMOS devices
App 20060105515 - Amos; Ricky S. ; et al. | 2006-05-18 |
Field effect transistor with electroplated metal gate
App 20060081885 - Saenger; Katherine L. ; et al. | 2006-04-20 |
Method of forming low resistance and reliable via in inter-level dielectric interconnect
App 20060084256 - Cabral; Cyril JR. ; et al. | 2006-04-20 |
Method and process for forming a self-aligned silicide contact
App 20060051961 - Cabral; Cyril JR. ; et al. | 2006-03-09 |
Self-aligned silicide (salicide) process for low resistivity contacts to thin film silicon-on-insulator and bulk mosfets and for shallow junctions
App 20060043484 - Cabral; Cyril JR. ; et al. | 2006-03-02 |
Temperature stable metal nitride gate electrode
App 20060040439 - Park; Dae-Gyu ; et al. | 2006-02-23 |
Formation of fully silicided metal gate using dual self-aligned silicide process
App 20060022280 - Cabral; Cyril JR. ; et al. | 2006-02-02 |
Nitride and polysilicon interface with titanium layer
App 20060001162 - Schutz; Ronald J. ; et al. | 2006-01-05 |
Atomic layer deposition metallic contacts, gates and diffusion barriers
App 20060003557 - Cabral; Cyril JR. ; et al. | 2006-01-05 |
Temperature Stable Metal Nitride Gate Electrode
App 20050280099 - Park, Dae-Gyu ; et al. | 2005-12-22 |
Selective implementation of barrier layers to achieve threshold voltage control in CMOS device fabrication with high k dielectrics
App 20050269634 - Bojarczuk, Nestor A. JR. ; et al. | 2005-12-08 |
Selective implementation of barrier layers to achieve threshold voltage control in CMOS device fabrication with high-k dielectrics
App 20050269635 - Bojarczuk, Nestor A. JR. ; et al. | 2005-12-08 |
Self-aligned metal to form contacts to Ge containing substrates and structure formed thereby
App 20050250301 - Cabral, Cyril JR. ; et al. | 2005-11-10 |
CVD tantalum compounds for FET gate electrodes
App 20050250318 - Narayanan, Vijay ; et al. | 2005-11-10 |
CMOS silicide metal gate integration
App 20050186747 - Amos, Ricky S. ; et al. | 2005-08-25 |
Retarding agglomeration of Ni monosilicide using Ni alloys
App 20050176247 - Cabral, Cyril JR. ; et al. | 2005-08-11 |
High performance FET with laterally thin extension
App 20050148142 - Cabral, Cyril JR. ; et al. | 2005-07-07 |
Electroplated CoWP composite structures as copper barrier layers
App 20050127518 - Cabral, Cyril JR. ; et al. | 2005-06-16 |
Metal carbide gate structure and method of fabrication
App 20050116230 - Cabral, Cyril JR. ; et al. | 2005-06-02 |
Method for integration of silicide contacts and silicide gate metals
App 20050118757 - Cabral, Cyril JR. ; et al. | 2005-06-02 |
Interconnect Structure Diffusion Barrier with High Nitrogen Content
App 20050110144 - Cabral, Cyril JR. ; et al. | 2005-05-26 |
Ultra-thin Silicidation-stop Extensions In Mosfet Devices
App 20050112857 - Gluschenkov, Oleg G. ; et al. | 2005-05-26 |
CVD tantalum compounds for FET get electrodes
App 20050104142 - Narayanan, Vijav ; et al. | 2005-05-19 |
Method and process to make multiple-threshold metal gates CMOS technology
App 20050106788 - Amos, Ricky ; et al. | 2005-05-19 |
Electroplated CoWP composite structures as copper barrier layers
App 20050104216 - Cabral, Cyril JR. ; et al. | 2005-05-19 |
Field effect transistor with electroplated metal gate
App 20050095852 - Saenger, Katherine L. ; et al. | 2005-05-05 |
High Performance Fet With Laterally Thin Extension
App 20050087824 - Cabral, Cyril JR. ; et al. | 2005-04-28 |
Pre-anneal Of Cosi, To Prevent Formation Of Amorphous Layer Between Ti-o-n And Cosi
App 20050070098 - Bruley, John ; et al. | 2005-03-31 |
Method and apparatus for fabricating CMOS field effect transistors
App 20050064636 - Cabral, Cyril JR. ; et al. | 2005-03-24 |
Process Options Of Forming Silicided Metal Gates For Advanced Cmos Devices
App 20050064690 - Amos, Ricky S. ; et al. | 2005-03-24 |
Reduction of silicide formation temperature on SiGe containing substrates
App 20050059242 - Cabral, Cyril JR. ; et al. | 2005-03-17 |
Structure And Method For Metal Replacement Gate Of High Performance
App 20050051854 - Cabral, Cyril JR. ; et al. | 2005-03-10 |
Atomic layer deposition of metallic contacts, gates and diffusion barriers
App 20050042865 - Cabral, Cyril JR. ; et al. | 2005-02-24 |
Elevated source drain disposable spacer CMOS
App 20040266124 - Roy, Ronnen A. ; et al. | 2004-12-30 |
Method and structure for reduction of contact resistance of metal silicides using a metal-germanium alloy
App 20040195695 - Cabral,, Cyril JR. ; et al. | 2004-10-07 |
Retarding agglomeration of Ni monosilicide using Ni alloys
App 20040123922 - Cabral, Cyril JR. ; et al. | 2004-07-01 |
Self-aligned silicide process for silicon sidewall source and drain contacts and structure formed thereby
App 20040108598 - Cabral, Cyril JR. ; et al. | 2004-06-10 |
Semiconductor structure having in-situ formed unit resistors and method for fabrication
App 20040104438 - Cabral, Cyril JR. ; et al. | 2004-06-03 |
Semiconductor structure having in-situ formed unit resistors and method for fabrication
App 20040094843 - Cabral, Cyril JR. ; et al. | 2004-05-20 |
Method and process to make multiple-threshold metal gates CMOS technology
App 20040094804 - Amos, Ricky ; et al. | 2004-05-20 |
Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures
App 20040092073 - Cabral, Cyril JR. ; et al. | 2004-05-13 |
Changing an electrical resistance of a resistor
App 20040085181 - Ballantine, Arne W. ; et al. | 2004-05-06 |
Method and structure for controlling the interface roughness of cobalt disilicide
App 20040087160 - Agnello, Paul David ; et al. | 2004-05-06 |
Metal spacer gate for CMOS FET
App 20040056285 - Cabral, Cyril JR. ; et al. | 2004-03-25 |
Method for changing an electrical resistance of a resistor
App 20040027232 - Ballantine, Arne W. ; et al. | 2004-02-12 |
Elevated source drain disposable spacer CMOS
App 20030232464 - Roy, Ronnen A. ; et al. | 2003-12-18 |
Method and structure for ultra-low contact resistance CMOS formed by vertically self-alligned CoSi2 on raised source drain Si/SiGe device
App 20030219971 - Cabral, Cyril JR. ; et al. | 2003-11-27 |
Method And Structure For Ultra-low Contact Resistance Cmos Formed By Vertically Self-aligned Cosi2 On Raised Source Drain Si/sige Device
App 20030219965 - Cabral, Cyril JR. ; et al. | 2003-11-27 |
Semiconductor device incorporating elements formed of refractory metal-silicon-nitrogen and method for fabrication
App 20030151116 - Cabral, Cyril JR. ; et al. | 2003-08-14 |
Self-aligned silicide process utilizing ion implants for reduced silicon consumption and control of the silicide formation temperature and structure formed thereby
App 20030132487 - Cabral, Cyril JR. ; et al. | 2003-07-17 |
Method for forming refractory metal-silicon-nitrogen capacitors and structures formed
App 20030107075 - Cabral, Cyril JR. ; et al. | 2003-06-12 |
High temperature processing compatible metal gate electrode for pFETS and methods for fabrication
App 20030098489 - Amos, Ricky ; et al. | 2003-05-29 |
Self-aligned silicide (salicide) process for strained silicon MOSFET on SiGe and structure formed thereby
App 20030068883 - Ajmera, Atul Champaklal ; et al. | 2003-04-10 |
Self-aligned silicide process utilizing ion implants for reduced silicon consumption and control of the silicide formation temperature and structure formed thereby
App 20020185691 - Cabral, Cyril JR. ; et al. | 2002-12-12 |
Method for forming refractory metal-silicon-nitrogen capacitors and structures formed
App 20020185689 - Cabral, Cyril JR. ; et al. | 2002-12-12 |
Method for producing a flat interface for a metal-silicon contact barrier film
App 20020180046 - Wang, Yun-Yu ; et al. | 2002-12-05 |
Method and structure for controlling the interface roughness of cobalt disilicide
App 20020182836 - Agnello, Paul David ; et al. | 2002-12-05 |
Method for forming interconnects on semiconductor substrates and structures formed
App 20020171151 - Andricacos, Panayotis Constantinou ; et al. | 2002-11-21 |
Self-aligned silicide process for silicon sidewall source and drain contacts and structure formed thereby
App 20020155690 - Cabral, Cyril JR. ; et al. | 2002-10-24 |
Method and structure for retarding high temperature agglomeration of silicides using alloys
App 20020151158 - Cabral, Cyril JR. ; et al. | 2002-10-17 |
Semiconductor device incorporating elements formed of refractory metal-silicon-nitrogen and method for fabrication
App 20020130367 - Cabral, Cyril JR. ; et al. | 2002-09-19 |
Method for fabricating ultra high-resistive conductors in semiconductor devices and devices fabricated
App 20020125986 - Cabral, Cyril JR. ; et al. | 2002-09-12 |
Self-aligned silicide process for reduction of Si consumption in shallow junction and thin SOI electronic devices
App 20020115262 - Cabral, Cyril JR. ; et al. | 2002-08-22 |
Method for forming electromigration-resistant structures by doping
App 20020115292 - Andricacos, Panayotis Constantinou ; et al. | 2002-08-22 |
Method For Forming Interconnects On Semiconductor Substrates And Structures Formed
App 20020105082 - Andricacos, Panayotis Constantinou ; et al. | 2002-08-08 |
Feram cell with internal oxygen source and method of oxygen release
App 20020074581 - Black, Charles Thomas ; et al. | 2002-06-20 |
Interconnects with Ti-containing liners
App 20020076574 - Cabral, Cyril JR. ; et al. | 2002-06-20 |
Method for plating copper conductors and devices formed
App 20020066673 - Rodbell, Kenneth P. ; et al. | 2002-06-06 |
Method And Structure For Retarding High Temperature Agglomeration Of Silicides Using Alloys
App 20020061636 - Cabral, Cyril JR. ; et al. | 2002-05-23 |
Thin film metal barrier for electrical interconnections
App 20020046874 - Cabral, Cyril JR. ; et al. | 2002-04-25 |
Method and structure for reduction of contact resistance of metal silicides using a metal-germanium alloy
App 20020042197 - Cabral,, Cyril JR. ; et al. | 2002-04-11 |
Self-aligned silicone process for low resistivity contacts to thin film silicon-on-insulator mosfets
App 20020031909 - Cabral, Cyril JR. ; et al. | 2002-03-14 |
Self-aligned silicide (salicide) process for low resistivity contacts to thin film silicon-on-insulator and bulk MOSFETS and for shallow Junctions
App 20020022366 - Cabral, Cyril JR. ; et al. | 2002-02-21 |
Method and materials for through-mask electroplating and selective base removal
App 20010000926 - Andricacos, Panayotis Constantinou ; et al. | 2001-05-10 |
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