| Patent | Date |
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Ionized physical vapor deposition (IPVD) apparatus and method for an inductively coupled plasma sweeping source
Grant 10,672,596 - Brcka | 2020-06-02 |
Poly-phased inductively coupled plasma source
Grant 10,431,425 - Brcka O | 2019-10-01 |
Methods and systems for dielectrophoresis (DEP) separation
Grant 10,413,913 - Brcka Sept | 2019-09-17 |
Method of cleaning the filament and reactor's interior in FACVD
Grant 10,066,293 - Brcka , et al. September 4, 2 | 2018-09-04 |
Methods and Systems for Dielectrophoresis (DEP) Separation
App 20180229246 - Brcka; Jozef | 2018-08-16 |
Ionized Physical Vapor Deposition (IPVD) Apparatus And Method For An Inductively Coupled Plasma Sweeping Source
App 20170278686 - Brcka; Jozef | 2017-09-28 |
Poly-phased Inductively Coupled Plasma Source
App 20170243720 - Brcka; Jozef | 2017-08-24 |
System and method for tissue construction using an electric field applicator
Grant 9,228,261 - Brcka January 5, 2 | 2016-01-05 |
Method And Device For Controlling Pattern And Structure Formation By An Electric Field
App 20150152556 - Brcka; Jozef ; et al. | 2015-06-04 |
Method Of Cleaning The Filament And Reactor's Interior In Facvd
App 20150044390 - Brcka; Jozef ; et al. | 2015-02-12 |
Method and device for controlling pattern and structure formation by an electric field
Grant 8,916,055 - Brcka , et al. December 23, 2 | 2014-12-23 |
Multi-zone gas distribution system for a treatment system
Grant 8,715,455 - Brcka May 6, 2 | 2014-05-06 |
Method And Device For Controlling Pattern And Structure Formation By An Electric Field
App 20130217210 - Brcka; Jozef ; et al. | 2013-08-22 |
System And Method For Tissue Construction Using An Electric Field Applicator
App 20130192990 - Brcka; Jozef | 2013-08-01 |
Multiple gas plasma forming method and ICP source
Grant 8,480,914 - Brcka July 9, 2 | 2013-07-09 |
Control of ion angular distribution function at wafer surface
Grant 8,409,398 - Brcka April 2, 2 | 2013-04-02 |
Multiple Gas Plasma Forming Method And Icp Source
App 20120329283 - Brcka; Jozef | 2012-12-27 |
Plasma fluid modeling with transient to stochastic transformation
Grant 8,103,492 - Brcka January 24, 2 | 2012-01-24 |
Method and apparatus of distributed plasma processing system for conformal ion stimulated nanoscale deposition process
Grant 8,092,658 - Brcka January 10, 2 | 2012-01-10 |
Flow Plate Utilization In Filament Assisted Chemical Vapor Deposition
App 20110244128 - Brcka; Jozef ; et al. | 2011-10-06 |
Plasma processing system with locally-efficient inductive plasma coupling
Grant 8,028,655 - Brcka , et al. October 4, 2 | 2011-10-04 |
Method Of Cleaning The Filament And Reactor's Interior In Facvd
App 20110232567 - Brcka; Jozef ; et al. | 2011-09-29 |
Embedded multi-inductive large area plasma source
Grant 7,976,674 - Brcka July 12, 2 | 2011-07-12 |
Plasma Processing System With Locally-efficient Inductive Plasma Coupling
App 20110146911 - Brcka; Jozef ; et al. | 2011-06-23 |
Control Of Ion Angular Distribution Function At Wafer Surface
App 20110079355 - Brcka; Jozef | 2011-04-07 |
Control of ion angular distribution function at wafer surface
Grant 7,867,409 - Brcka January 11, 2 | 2011-01-11 |
Modulated gap segmented antenna for inductively-coupled plasma processing system
Grant 7,854,213 - Brcka December 21, 2 | 2010-12-21 |
Plasma processing system with locally-efficient inductive plasma coupling
Grant 7,810,449 - Brcka , et al. October 12, 2 | 2010-10-12 |
Selective-redeposition structures for calibrating a plasma process
Grant 7,776,748 - Brcka , et al. August 17, 2 | 2010-08-17 |
Etch system with integrated inductive coupling
Grant 7,771,562 - Brcka August 10, 2 | 2010-08-10 |
RLSA CVD deposition control using halogen gas for hydrogen scavenging
Grant 7,763,551 - Brcka , et al. July 27, 2 | 2010-07-27 |
Selective-redeposition sources for calibrating a plasma process
Grant 7,749,398 - Brcka , et al. July 6, 2 | 2010-07-06 |
Ionized PVD with sequential deposition and etching
Grant 7,744,735 - Robison , et al. June 29, 2 | 2010-06-29 |
Plasma Fluid Modeling With Transient To Stochastic Transformation
App 20100063787 - Brcka; Jozef | 2010-03-11 |
Locally-efficient inductive plasma coupling for plasma processing system
Grant 7,673,583 - Brcka March 9, 2 | 2010-03-09 |
Solid precursor vaporization system for use in chemical vapor deposition
Grant 7,651,570 - Brcka January 26, 2 | 2010-01-26 |
Rlsa Cvd Deposition Control Using Halogen Gas For Hydrogen Scavenging
App 20090241310 - Brcka; Jozef ; et al. | 2009-10-01 |
Adjustable Magnet Pack For Semiconductor Wafer Processing
App 20090242396 - Brcka; Jozef ; et al. | 2009-10-01 |
Enhanced reliability deposition baffle for iPVD
Grant 7,591,935 - Brcka , et al. September 22, 2 | 2009-09-22 |
Plasma Processing System With Locally-efficient Inductive Plasma Coupling
App 20090200949 - Brcka; Jozef ; et al. | 2009-08-13 |
Method for saturating a carrier gas with precursor vapor
Grant 7,566,477 - Brcka July 28, 2 | 2009-07-28 |
Highly ionized PVD with moving magnetic field envelope for uniform coverage of feature structure and wafer
Grant 7,556,718 - Brcka July 7, 2 | 2009-07-07 |
Embedded Multi-inductive Large Area Plasma Source
App 20080308409 - Brcka; Jozef | 2008-12-18 |
Compact, distributed inductive element for large scale inductively-coupled plasma sources
Grant 7,464,662 - Brcka December 16, 2 | 2008-12-16 |
Plasma enhanced atomic layer deposition system and method
Grant 7,435,454 - Brcka October 14, 2 | 2008-10-14 |
Multiflow Integrated Icp Source
App 20080236491 - Brcka; Jozef | 2008-10-02 |
Control Of Ion Angular Distribution Function At Wafer Surface
App 20080242065 - Brcka; Jozef | 2008-10-02 |
Integrated electrostatic inductive coupling for plasma processing
Grant 7,426,900 - Brcka September 23, 2 | 2008-09-23 |
Multi-zone Gas Distribution System For A Treatment System
App 20080185104 - Brcka; Jozef | 2008-08-07 |
Method and apparatus for monitoring the thickness of a conductive coating
Grant 7,407,324 - Brcka August 5, 2 | 2008-08-05 |
Selective-redeposition Sources For Calibrating A Plasma Process
App 20080087638 - Brcka; Jozef ; et al. | 2008-04-17 |
Selective-redeposition Structures For Calibrating A Plasma Process
App 20080081482 - Brcka; Jozef ; et al. | 2008-04-03 |
Plasma enhanced atomic layer deposition system and method
Grant 7,341,959 - Brcka March 11, 2 | 2008-03-11 |
Method And Apparatus Of Distributed Plasma Processing System For Conformal Ion Stimulated Nanoscale Deposition Process
App 20080026574 - Brcka; Jozef | 2008-01-31 |
Plasma processing system with locally-efficient inductive plasma coupling
Grant 7,273,533 - Brcka , et al. September 25, 2 | 2007-09-25 |
Enhanced reliability deposition baffle for iPVD
App 20070131544 - Brcka; Jozef ; et al. | 2007-06-14 |
Etch System With Integrated Inductive Coupling
App 20070113981 - Brcka; Jozef | 2007-05-24 |
Method And System For Depositing Material On A Substrate Using A Solid Precursor
App 20070113789 - Brcka; Jozef | 2007-05-24 |
Hollow body plasma uniformity adjustment device and method
App 20070068795 - Brcka; Jozef | 2007-03-29 |
Method and apparatus for monitoring thickness of conductive coating
App 20070036198 - Brcka; Jozef | 2007-02-15 |
Segmented biased peripheral electrode in plasma processing method and apparatus
App 20070029193 - Brcka; Jozef | 2007-02-08 |
Intelligent system for detection of process status, process fault and preventive maintenance
App 20060259198 - Brcka; Jozef ; et al. | 2006-11-16 |
Locally-efficient Inductive Plasma Coupling For Plasma Processing System
App 20060254519 - Brcka; Jozef | 2006-11-16 |
Method and system for depositing material on a substrate using a solid precursor
Grant 7,132,128 - Brcka November 7, 2 | 2006-11-07 |
Modulated Gap Segmented Antenna For Inductively-coupled Plasma Processing System
App 20060231030 - Brcka; Jozef | 2006-10-19 |
Method and system for depositing material on a substrate using a solid precursor
App 20060219177 - Brcka; Jozef | 2006-10-05 |
Method for saturating a carrier gas with precursor vapor
App 20060222769 - Brcka; Jozef | 2006-10-05 |
Solid precursor vaporization system for use in chemical vapor deposition
App 20060219168 - Brcka; Jozef | 2006-10-05 |
Plasma enhanced atomic layer deposition system and method
App 20060211223 - Brcka; Jozef | 2006-09-21 |
Plasma enhanced atomic layer deposition system and method
App 20060210713 - Brcka; Jozef | 2006-09-21 |
Apparatus and methods for compensating plasma sheath non-uniformities at the substrate in a plasma processing system
Grant 7,075,771 - Brcka July 11, 2 | 2006-07-11 |
Highly ionized PVD with moving magnetic field envelope for uniform coverage of feature structure and wafer
App 20050279624 - Brcka, Jozef | 2005-12-22 |
Method and apparatus of distributed plasma processing system for conformal ion stimulated nanoscale deposition process
App 20050266173 - Brcka, Jozef | 2005-12-01 |
Modified transfer function deposition baffles and high density plasma ignition therewith in semiconductor processing
Grant 6,946,054 - Brcka September 20, 2 | 2005-09-20 |
Compact, distributed inductive element for large scale inductively-coupled plasma sources
App 20050160985 - Brcka, Jozef | 2005-07-28 |
Integrated electrostatic inductive coupling for plasma processing
App 20050103444 - Brcka, Jozef | 2005-05-19 |
Plasma processing system with locally-efficient inductive plasma coupling
App 20050103445 - Brcka, Jozef ; et al. | 2005-05-19 |
Method for characterizing the performance of an electrostatic chuck
Grant 6,853,953 - Brcka , et al. February 8, 2 | 2005-02-08 |
Apparatus and methods for compensating plasma sheath non-uniformities at the substrate in a plasma processing system
App 20040233608 - Brcka, Jozef | 2004-11-25 |
Ionized PVD with sequential deposition and etching
App 20040188239 - Robison, Rodney Lee ; et al. | 2004-09-30 |
Cooled deposition baffle in high density plasma semiconductor processing
App 20040129221 - Brcka, Jozef ; et al. | 2004-07-08 |
Method and apparatus for ionized physical vapor deposition
Grant 6,719,886 - Drewery , et al. April 13, 2 | 2004-04-13 |
Protection of dielectric window in inductively coupled plasma generation
Grant 6,666,982 - Brcka December 23, 2 | 2003-12-23 |
Inductively-coupled plasma processing system
Grant 6,652,711 - Brcka , et al. November 25, 2 | 2003-11-25 |
Modified transfer function deposition baffles and high density plasma ignition therewith in semiconductor processing
App 20030159782 - Brcka, Jozef | 2003-08-28 |
Protection of dielectric window in inductively coupled plasma generation
App 20030079838 - Brcka, Jozef | 2003-05-01 |
Ring-shaped high-density plasma source and method
Grant 6,523,493 - Brcka February 25, 2 | 2003-02-25 |
Method for characterizing the performance of an electrostatic chuck
App 20030033116 - Brcka, Jozef ; et al. | 2003-02-13 |
Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma using an internal inductive element
Grant 6,494,998 - Brcka December 17, 2 | 2002-12-17 |
Inductively-coupled plasma processing system
App 20020185229 - Brcka, Jozef ; et al. | 2002-12-12 |
Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma
Grant 6,474,258 - Brcka November 5, 2 | 2002-11-05 |
Embedded plasma source for plasma density improvement
Grant 6,446,572 - Brcka September 10, 2 | 2002-09-10 |
Method and apparatus for ionized physical vapor deposition
App 20020104751 - Drewery, John Stephen ; et al. | 2002-08-08 |
Immersed inductively--coupled plasma source
Grant 6,417,626 - Brcka , et al. July 9, 2 | 2002-07-09 |
Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma
App 20010022158 - Brcka, Jozef | 2001-09-20 |
Method and apparatus for ionized physical vapor deposition
Grant 6,287,435 - Drewery , et al. September 11, 2 | 2001-09-11 |
Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma
Grant 6,237,526 - Brcka May 29, 2 | 2001-05-29 |
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