Blanquart; Timothee Julien Vincent

Patent Applications and Registrations

Patent applications and USPTO patent grants for Blanquart; Timothee Julien Vincent.The latest application filed is for "method for depositing a gap-fill layer by plasma-assisted deposition".

Company Profile

8.9.10

Blanquart; Timothee Julien Vincent - Oud-Heverlee BE
Blanquart; Timothee Julien Vincent - Tama JP
Blanquart; Timothee Julien Vincent - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for reforming amorphous carbon polymer film Grant 11,289,326 - Blanquart March 29, 2	2022-03-29
Method of forming topology-controlled amorphous carbon polymer film Grant 11,282,698 - Blanquart March 22, 2	2022-03-22
Method For Depositing A Gap-fill Layer By Plasma-assisted Deposition App 20210384030 - Blanquart; Timothee Julien Vincent	2021-12-09
Method For Reforming Amorphous Carbon Polymer Film App 20210043444 - Blanquart; Timothee Julien Vincent	2021-02-11
Method Of Forming Topology-controlled Amorphous Carbon Polymer Film App 20210020432 - Blanquart; Timothee Julien Vincent	2021-01-21
Method Of Forming Topology-controlled Amorphous Carbon Polymer Film App 20210020431 - Blanquart; Timothee Julien Vincent	2021-01-21
Method of forming a structure on a substrate Grant 10,867,788 - Blanquart , et al. December 15, 2	2020-12-15
Method For Depositing Silicon-free Carbon-containing Film As Gap-fill Layer By Pulse Plasma-assisted Deposition App 20200373152 - Blanquart; Timothee Julien Vincent	2020-11-26
Method For Depositing Silicon-free Carbon-containing Film As Gap-fill Layer By Pulse Plasma-assisted Deposition App 20200365391 - Blanquart; Timothee Julien Vincent ; et al.	2020-11-19
Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition Grant 10,755,923 - Blanquart A	2020-08-25
Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition Grant 10,755,922 - Blanquart , et al. A	2020-08-25
Method For Depositing Silicon-free Carbon-containing Film As Gap-fill Layer By Pulse Plasma-assisted Deposition App 20200013613 - Blanquart; Timothee Julien Vincent	2020-01-09
Method For Depositing Silicon-free Carbon-containing Film As Gap-fill Layer By Pulse Plasma-assisted Deposition App 20200013612 - Blanquart; Timothee Julien Vincent ; et al.	2020-01-09
Method for forming thermally stable organosilicon polymer film Grant 10,483,099 - Blanquart Nov	2019-11-19
Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition Grant 10,388,513 - Blanquart A	2019-08-20
Method of topologically restricted plasma-enhanced cyclic deposition of silicon or metal nitride Grant 10,340,135 - Blanquart	2019-07-02
Method Of Forming A Structure On A Substrate App 20180182613 - Blanquart; Timothee Julien Vincent ; et al.	2018-06-28
Method Of Topologically Restricted Plasma-enhanced Cyclic Deposition App 20180151346 - Blanquart; Timothee Julien Vincent	2018-05-31
Method of plasma-assisted cyclic deposition using ramp-down flow of reactant gas Grant 9,984,869 - Blanquart May 29, 2	2018-05-29

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