loadpatents
name:-0.056081056594849
name:-0.030910015106201
name:-0.0037758350372314
Bevan; Malcolm J. Patent Filings

Bevan; Malcolm J.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Bevan; Malcolm J..The latest application filed is for "film thickness uniformity improvement using edge ring and bias electrode geometry".

Company Profile
3.38.44
  • Bevan; Malcolm J. - Saratoga CA
  • BEVAN; Malcolm J. - Santa Clara CA
  • Bevan; Malcolm J. - Dallas TX
  • Bevan; Malcolm J. - San Jose CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Gate interface engineering with doped layer
Grant 11,456,178 - Hung , et al. September 27, 2
2022-09-27
Film Thickness Uniformity Improvement Using Edge Ring And Bias Electrode Geometry
App 20220301920 - LO; Kin Pong ;   et al.
2022-09-22
Gate all around I/O engineering
Grant 11,450,759 - Hung , et al. September 20, 2
2022-09-20
Film thickness uniformity improvement using edge ring and bias electrode geometry
Grant 11,380,575 - Lo , et al. July 5, 2
2022-07-05
Methods For Calibrating An Optical Emission Spectrometer
App 20220178747 - LO; Kin Pong ;   et al.
2022-06-09
Cap oxidation for FinFET formation
Grant 11,271,097 - Hung , et al. March 8, 2
2022-03-08
Film Thickness Uniformity Improvement Using Edge Ring And Bias Electrode Geometry
App 20220028656 - LO; Kin Pong ;   et al.
2022-01-27
Process Kit With Protective Ceramic Coatings For Hydrogen And Nh3 Plasma Application
App 20220013336 - WU; Jian ;   et al.
2022-01-13
Gate Interface Engineering With Doped Layer
App 20210398814 - Hung; Steven C. H. ;   et al.
2021-12-23
Method And Apparatus For Selective Nitridation Process
App 20210202702 - ROGERS; Matthew Scott ;   et al.
2021-07-01
Cap Oxidation For Finfet Formation
App 20210134986 - Hung; Steven C. ;   et al.
2021-05-06
Gate All Around I/O Engineering
App 20210104617 - Hung; Steven C.H. ;   et al.
2021-04-08
Method and Apparatus for Selective Deposition of Dielectric Films
App 20210043448 - Li; Ning ;   et al.
2021-02-11
Treatments to enhance material structures
Grant 10,872,763 - Chu , et al. December 22, 2
2020-12-22
Treatments To Enhance Material Structures
App 20200350157 - Chu; David ;   et al.
2020-11-05
System and method for mitigating oxide growth in a gate dielectric
Grant 10,068,771 - Bevan , et al. September 4, 2
2018-09-04
Method and apparatus for selective nitridation process
Grant 10,049,881 - Rogers , et al. August 14, 2
2018-08-14
Method And Apparatus For Selective Deposition Of Dielectric Films
App 20180211833 - Li; Ning ;   et al.
2018-07-26
System And Method For Mitigating Oxide Growth In A Gate Dielectric
App 20180130662 - Bevan; Malcolm J. ;   et al.
2018-05-10
System and method for mitigating oxide growth in a gate dielectric
Grant 9,892,927 - Bevan , et al. February 13, 2
2018-02-13
System and method for mitigating oxide growth in a gate dielectric
Grant 9,779,946 - Bevan , et al. October 3, 2
2017-10-03
System And Method For Mitigating Oxide Growth In A Gate Dielectric
App 20170170022 - Bevan; Malcolm J. ;   et al.
2017-06-15
System And Method For Mitigating Oxide Growth In A Gate Dielectric
App 20170133228 - Bevan; Malcolm J. ;   et al.
2017-05-11
System and method for mitigating oxide growth in a gate dielectric
Grant 9,576,804 - Bevan , et al. February 21, 2
2017-02-21
System And Method For Mitigating Oxide Growth In A Gate Dielectric
App 20160300722 - Bevan; Malcolm J. ;   et al.
2016-10-13
System and method for mitigating oxide growth in a gate dielectric
Grant 9,396,951 - Bevan , et al. July 19, 2
2016-07-19
System and method for mitigating oxide growth in a gate dielectric
Grant 9,368,355 - Bevan , et al. June 14, 2
2016-06-14
System and Method for Mitigating Oxide Growth in a Gate Dielectric
App 20160155641 - Bevan; Malcolm J. ;   et al.
2016-06-02
System and method for mitigating oxide growth in a gate dielectric
Grant 9,337,046 - Bevan , et al. May 10, 2
2016-05-10
System and method for mitigating oxide growth in a gate dielectric
Grant 9,337,044 - Bevan , et al. May 10, 2
2016-05-10
System and Method for Mitigating Oxide Growth in a Gate Dielectric
App 20160013082 - Bevan; Malcolm J. ;   et al.
2016-01-14
System and Method for Mitigating Oxide Growth in a Gate Dielectric
App 20160013083 - Bevan; Malcolm J. ;   et al.
2016-01-14
System and Method for Mitigating Oxide Growth in a Gate Dielectric
App 20160013061 - Bevan; Malcolm J. ;   et al.
2016-01-14
System and method for mitigating oxide growth in a gate dielectric
Grant 9,177,806 - Bevan , et al. November 3, 2
2015-11-03
NH3 containing plasma nitridation of a layer on a substrate
Grant 9,054,048 - Liu , et al. June 9, 2
2015-06-09
Method and apparatus for single step selective nitridation
Grant 9,023,700 - Ganguly , et al. May 5, 2
2015-05-05
Method And Apparatus For Single Step Selective Nitridation
App 20140342543 - GANGULY; Udayan ;   et al.
2014-11-20
Apparatus and Method for Conformal Treatment of Dielectric Films Using Inductively Coupled Plasma
App 20140302686 - Pan; Heng ;   et al.
2014-10-09
Post-Deposition Treatment Methods For Silicon Nitride
App 20140273530 - Nguyen; Victor ;   et al.
2014-09-18
In situ vapor phase surface activation of SiO.sub.2
Grant 8,778,816 - Sato , et al. July 15, 2
2014-07-15
Method and apparatus for single step selective nitridation
Grant 8,748,259 - Ganguly , et al. June 10, 2
2014-06-10
Methods and apparatus for forming nitrogen-containing layers
Grant 8,546,273 - Bevan , et al. October 1, 2
2013-10-01
Methods and apparatus for forming nitrogen-containing layers
Grant 8,481,433 - Bevan , et al. July 9, 2
2013-07-09
Nh3 Containing Plasma Nitridation Of A Layer On A Substrate
App 20130012032 - LIU; WEI ;   et al.
2013-01-10
In Situ Vapor Phase Surface Activation Of SiO2
App 20120202357 - Sato; Tatsuya E. ;   et al.
2012-08-09
Methods And Apparatus For Forming Nitrogen-containing Layers
App 20110281442 - Bevan; Malcolm J. ;   et al.
2011-11-17
Method And Apparatus For Single Step Selective Nitridation
App 20110217834 - Ganguly; Udayan ;   et al.
2011-09-08
System and Method for Mitigating Oxide Growth in a Gate Dielectric
App 20110120374 - Bevan; Malcolm J. ;   et al.
2011-05-26
System and method for mitigating oxide growth in a gate dielectric
Grant 7,906,441 - Bevan , et al. March 15, 2
2011-03-15
Methods And Apparatus For Forming Nitrogen-containing Layers
App 20100248497 - BEVAN; Malcolm J. ;   et al.
2010-09-30
Thermal treatment of nitrided oxide to improve negative bias thermal instability
Grant 7,682,988 - Alshareef , et al. March 23, 2
2010-03-23
Methodology for Reducing Post Burn-In Vmin Drift
App 20090045472 - Chakravarthi; Srinivasan ;   et al.
2009-02-19
Integrated circuits with composite gate dielectric
Grant 7,423,326 - Rotondaro , et al. September 9, 2
2008-09-09
Post high voltage gate oxide pattern high-vacuum outgas surface treatment
Grant 7,402,524 - Kirkpatrick , et al. July 22, 2
2008-07-22
Dual-gate integrated circuit semiconductor device
Grant 7,339,240 - Kirkpatrick , et al. March 4, 2
2008-03-04
System and Method for Mitigating Oxide Growth in a Gate Dielectric
App 20080050882 - Bevan; Malcolm J. ;   et al.
2008-02-28
Post high voltage gate dielectric pattern plasma surface treatment
App 20060183337 - Kirkpatrick; Brian K. ;   et al.
2006-08-17
Post high voltage gate dielectric pattern plasma surface treatment
Grant 7,049,242 - Kirkpatrick , et al. May 23, 2
2006-05-23
Post high voltage gate oxide pattern high-vacuum outgas surface treatment
App 20060084229 - Kirkpatrick; Brian K. ;   et al.
2006-04-20
Post high voltage gate oxide pattern high-vacuum outgas surface treatment
Grant 7,018,925 - Kirkpatrick , et al. March 28, 2
2006-03-28
Thermal treatment of nitrided oxide to improve negative bias thermal instability
App 20060046514 - Alshareef; Husam N. ;   et al.
2006-03-02
System and method for mitigating oxide growth in a gate dielectric
App 20050221564 - Bevan, Malcolm J. ;   et al.
2005-10-06
Gate dielectric and method
App 20050205948 - Rotondaro, Antonio L.P. ;   et al.
2005-09-22
System and method for mitigating oxide growth in a gate dielectric
Grant 6,921,703 - Bevan , et al. July 26, 2
2005-07-26
Gate dielectric and method
Grant 6,919,251 - Rotondaro , et al. July 19, 2
2005-07-19
Post high voltage gate oxide pattern high-vacuum outgas surface treatment
App 20040266113 - Kirkpatrick, Brian K. ;   et al.
2004-12-30
System and method for mitigating oxide growth in a gate dielectric
App 20040229475 - Bevan, Malcolm J. ;   et al.
2004-11-18
Sidewall processes using alkylsilane precursors for MOS transistor fabrication
Grant 6,806,149 - Bu , et al. October 19, 2
2004-10-19
Post high voltage gate dielectric pattern plasma surface treatment
App 20040142570 - Kirkpatrick, Brian K. ;   et al.
2004-07-22
Sidewall processes using alkylsilane precursors for MOS transistor fabrication
App 20040063260 - Bu, Haowen ;   et al.
2004-04-01
Gate dielectric and method
App 20040023462 - Rotondaro, Antonio L.P. ;   et al.
2004-02-05
CVD deposition of M-SION gate dielectrics
App 20030111678 - Colombo, Luigi ;   et al.
2003-06-19
Economic and low thermal budget spacer nitride process
App 20030020111 - Bevan, Malcolm J.
2003-01-30

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed