| Patent | Date |
|---|
Capacitive Sensor For Monitoring Gas Concentration
App 20220244205 - Li; Xiaopu ; et al. | 2022-08-04 |
Magnetic-material Shield Around Plasma Chambers Near Pedestal
App 20220139679 - KONNOTH JOSEPH; Job George ; et al. | 2022-05-05 |
Plasma source for rotating susceptor
Grant 11,315,769 - Bera , et al. April 26, 2 | 2022-04-26 |
Shaped electrodes for improved plasma exposure from vertical plasma source
Grant 11,315,763 - Bera , et al. April 26, 2 | 2022-04-26 |
Magnetic Holding Structures For Plasma Processing Applications
App 20220122866 - NGUYEN; Andrew ; et al. | 2022-04-21 |
Showerhead Design To Control Stray Deposition
App 20220064797 - DHANAKSHIRUR; Akshay ; et al. | 2022-03-03 |
Showerhead With Interlaced Gas Feed And Removal And Methods Of Use
App 20220051910 - Bera; Kallol ; et al. | 2022-02-17 |
Distribution Components For Semiconductor Processing Systems
App 20220028710 - Subramani; Anantha K. ; et al. | 2022-01-27 |
Recursive inject apparatus for improved distribution of gas
Grant 11,198,939 - Miller , et al. December 14, 2 | 2021-12-14 |
Showerhead with interlaced gas feed and removal and methods of use
Grant 11,189,502 - Bera , et al. November 30, 2 | 2021-11-30 |
Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer Deposition (PE-ALD) Processing Tool
App 20210327686 - Li; Xiaopu ; et al. | 2021-10-21 |
Modular High-frequency Source
App 20210327685 - Chua; Thai Cheng ; et al. | 2021-10-21 |
Capacitive Sensor For Chamber Condition Monitoring
App 20210280443 - Pan; Yaoling ; et al. | 2021-09-09 |
Plasma reactor with electrode array in ceiling
Grant 11,114,284 - Collins , et al. September 7, 2 | 2021-09-07 |
Shunt Door For Magnets In Plasma Process Chamber
App 20210269919 - BERA; Kallol ; et al. | 2021-09-02 |
Modular high-frequency source
Grant 11,081,317 - Chua , et al. August 3, 2 | 2021-08-03 |
Symmetric Plasma Source to Generate Pie-Shaped Treatment
App 20210210312 - Subramani; Anantha K. ; et al. | 2021-07-08 |
Plasma Source For Rotating Susceptor
App 20210166923 - Bera; Kallol ; et al. | 2021-06-03 |
Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer Deposition (PE-ALD) Processing Tool
App 20210050187 - Kudela; Jozef ; et al. | 2021-02-18 |
Plasma source for rotating susceptor
Grant 10,903,056 - Bera , et al. January 26, 2 | 2021-01-26 |
Symmetric plasma source to generate pie shaped treatment
Grant 10,879,042 - Subramani , et al. December 29, 2 | 2020-12-29 |
Shaped Electrodes For Improved Plasma Exposure From Vertical Plasma Source
App 20200395194 - Bera; Kallol ; et al. | 2020-12-17 |
Contour Pocket and Hybrid Susceptor for Wafer Uniformity
App 20200312702 - Gangakhedkar; Kaushal ; et al. | 2020-10-01 |
Shaped electrodes for improved plasma exposure from vertical plasma source
Grant 10,763,085 - Bera , et al. Sep | 2020-09-01 |
Contour pocket and hybrid susceptor for wafer uniformity
Grant 10,685,864 - Gangakhedkar , et al. | 2020-06-16 |
Device And Method For Tuning Plasma Distribution Using Phase Control
App 20200161093 - LI; Xiaopu ; et al. | 2020-05-21 |
Recursive inject apparatus for improved distribution of gas
Grant 10,633,741 - Miller , et al. | 2020-04-28 |
Processing tool with electrically switched electrode assembly
Grant 10,510,515 - Collins , et al. Dec | 2019-12-17 |
Modular High-frequency Source
App 20190326095 - CHUA; Thai Cheng ; et al. | 2019-10-24 |
Showerhead With Interlaced Gas Feed And Removal And Methods Of Use
App 20190311920 - Bera; Kallol ; et al. | 2019-10-10 |
Apparatus for controlling temperature uniformity of a substrate
Grant 10,386,126 - Bera , et al. A | 2019-08-20 |
Shaped Electrodes For Improved Plasma Exposure From Vertical Plasma Source
App 20190189404 - Bera; Kallol ; et al. | 2019-06-20 |
Top lamp module for carousel deposition chamber
Grant 10,273,578 - Yudovsky , et al. | 2019-04-30 |
Processing Tool With Electrically Switched Electrode Assembly
App 20180374684 - Collins; Kenneth S. ; et al. | 2018-12-27 |
Plasma Reactor With Electrode Array In Ceiling
App 20180374685 - Collins; Kenneth S. ; et al. | 2018-12-27 |
Plasma Source For Rotating Susceptor
App 20180330927 - Bera; Kallol ; et al. | 2018-11-15 |
Lateral plasma/radical source
Grant 10,121,655 - Subramani , et al. November 6, 2 | 2018-11-06 |
Plasma Reactor With Groups Of Electrodes
App 20180308667 - Collins; Kenneth S. ; et al. | 2018-10-25 |
Plasma Reactor With Filaments And Rf Power Applied At Multiple Frequencies
App 20180308664 - Collins; Kenneth S. ; et al. | 2018-10-25 |
Plasma Reactor With Phase Shift Applied Across Electrode Array
App 20180308663 - Collins; Kenneth S. ; et al. | 2018-10-25 |
Annular baffle
Grant 10,012,248 - Hoffman , et al. July 3, 2 | 2018-07-03 |
Contour Pocket And Hybrid Susceptor For Wafer Uniformity
App 20170352575 - Gangakhedkar; Kaushal ; et al. | 2017-12-07 |
Symmetric Plasma Source To Generate Pie Shaped Treatment
App 20170213701 - Subramani; Anantha K. ; et al. | 2017-07-27 |
RF multi-feed structure to improve plasma uniformity
Grant 9,711,330 - Bera July 18, 2 | 2017-07-18 |
Multi-substrate thermal management apparatus
Grant 9,696,097 - Bera , et al. July 4, 2 | 2017-07-04 |
Lateral Plasma/Radical Source
App 20170148626 - Subramani; Anantha K. ; et al. | 2017-05-25 |
Temperature controlled chamber liner
Grant 9,653,267 - Carducci , et al. May 16, 2 | 2017-05-16 |
Plasma Module With Slotted Ground Plate
App 20170076917 - Yudovsky; Joseph ; et al. | 2017-03-16 |
Heating Source For Spatial Atomic Layer Deposition
App 20170051407 - Kwong; Garry K. ; et al. | 2017-02-23 |
Heated showerhead assembly
Grant 9,570,275 - Carducci , et al. February 14, 2 | 2017-02-14 |
Recursive Inject Apparatus For Improved Distribution Of Gas
App 20160376706 - Miller; Aaron ; et al. | 2016-12-29 |
Annular Baffle
App 20160341227 - HOFFMAN; Daniel J. ; et al. | 2016-11-24 |
RF Multi-Feed Structure To Improve Plasma Uniformity
App 20160254124 - Bera; Kallol | 2016-09-01 |
Apparatus For Controlling Temperature Uniformity Of A Substrate
App 20160169593 - BERA; KALLOL ; et al. | 2016-06-16 |
RF multi-feed structure to improve plasma uniformity
Grant 9,336,997 - Bera May 10, 2 | 2016-05-10 |
Top Lamp Module For Carousel Deposition Chamber
App 20160097122 - Yudovsky; Joseph ; et al. | 2016-04-07 |
Lamp Heater For Atomic Layer Deposition
App 20160068958 - Kelkar; Umesh M. ; et al. | 2016-03-10 |
Apparatus for controlling the temperature uniformity of a substrate
Grant 9,267,742 - Bera , et al. February 23, 2 | 2016-02-23 |
Multi-substrate Thermal Management Apparatus
App 20160033205 - BERA; KALLOL ; et al. | 2016-02-04 |
Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity
Grant 9,248,509 - Tavassoli , et al. February 2, 2 | 2016-02-02 |
Hole Pattern For Uniform Illumination Of Workpiece Below A Capacitively Coupled Plasma Source
App 20150380221 - Liu; Ren ; et al. | 2015-12-31 |
RF Multi-Feed Structure To Improve Plasma Uniformity
App 20150262792 - Bera; Kallol | 2015-09-17 |
Gas distribution plate with discrete protective elements
Grant 9,068,265 - Lubomirsky , et al. June 30, 2 | 2015-06-30 |
Plasma reactor with a multiple zone thermal control feed forward control apparatus
Grant 8,980,044 - Brillhart , et al. March 17, 2 | 2015-03-17 |
Heated Showerhead Assembly
App 20150053794 - CARDUCCI; James D. ; et al. | 2015-02-26 |
Multi-zoned Plasma Processing Electrostatic Chuck With Improved Temperature Uniformity
App 20140346743 - Tavassoli; Hamid ; et al. | 2014-11-27 |
Electron beam plasma source with profiled magnet shield for uniform plasma generation
Grant 8,894,805 - Bera , et al. November 25, 2 | 2014-11-25 |
Heated showerhead assembly
Grant 8,876,024 - Carducci , et al. November 4, 2 | 2014-11-04 |
Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity
Grant 8,822,876 - Tavassoli , et al. September 2, 2 | 2014-09-02 |
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
Grant 8,801,893 - Brillhart , et al. August 12, 2 | 2014-08-12 |
Annular Baffle
App 20140130926 - HOFFMAN; Daniel J. ; et al. | 2014-05-15 |
Temperature Controlled Plasma Processing Chamber Component With Zone Dependent Thermal Efficiences
App 20140083978 - Mahadeswaraswamy; Chetan ; et al. | 2014-03-27 |
Annular baffle
Grant 8,647,438 - Hoffman , et al. February 11, 2 | 2014-02-11 |
Temperature controlled plasma processing chamber component with zone dependent thermal efficiencies
Grant 8,608,852 - Mahadeswaraswamy , et al. December 17, 2 | 2013-12-17 |
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
Grant 8,608,900 - Buchberger, Jr. , et al. December 17, 2 | 2013-12-17 |
Plasma Reactor Gas Distribution Plate With Radially Distributed Path Splitting Manifold
App 20130315795 - Bera; Kallol ; et al. | 2013-11-28 |
Two-phase Operation Of Plasma Chamber By Phase Locked Loop
App 20130284369 - Kobayashi; Satoru ; et al. | 2013-10-31 |
Esc Cooling Base For Large Diameter Subsrates
App 20130284372 - TAVASSOLI; Hamid ; et al. | 2013-10-31 |
Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control
Grant 8,546,267 - Brillhart , et al. October 1, 2 | 2013-10-01 |
Plasma reactor gas distribution plate with radially distributed path splitting manifold
Grant 8,512,509 - Bera , et al. August 20, 2 | 2013-08-20 |
Temperature Controlled Chamber Liner
App 20130118686 - Carducci; James D. ; et al. | 2013-05-16 |
Plasma Reactor With Chamber Wall Temperature Control
App 20130105085 - YOUSIF; IMAD ; et al. | 2013-05-02 |
Electron Beam Plasma Source With Profiled Magnet Shield For Uniform Plasma Generation
App 20130098883 - Bera; Kallol ; et al. | 2013-04-25 |
Overhead Electron Beam Source For Plasma Ion Generation In A Workpiece Processing Region
App 20130098873 - Ramaswamy; Kartik ; et al. | 2013-04-25 |
Electron Beam Plasma Source With Profiled Conductive Fins For Uniform Plasma Generation
App 20130098555 - Bera; Kallol ; et al. | 2013-04-25 |
Electron Beam Plasma Source With Profiled Chamber Wall For Uniform Plasma Generation
App 20130098553 - Bera; Kallol ; et al. | 2013-04-25 |
Method And Apparatus For Enhancing Flow Uniformity In A Process Chamber
App 20130008604 - BERA; KALLOL ; et al. | 2013-01-10 |
Capacitively coupled plasma reactor having very agile wafer temperature control
Grant 8,337,660 - Buchberger, Jr. , et al. December 25, 2 | 2012-12-25 |
Method of processing a workpiece in a plasma reactor using feed forward thermal control
Grant 8,329,586 - Buchberger, Jr. , et al. December 11, 2 | 2012-12-11 |
Etching chamber having flow equalizer and lower liner
Grant 8,313,578 - Carducci , et al. November 20, 2 | 2012-11-20 |
Apparatus for controlling gas flow in a semiconductor substrate processing chamber
Grant 8,236,105 - Bera , et al. August 7, 2 | 2012-08-07 |
Gas Distribution Plate With Discrete Protective Elements
App 20120193456 - Lubomirsky; Dmitry ; et al. | 2012-08-02 |
Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone
Grant 8,231,799 - Bera , et al. July 31, 2 | 2012-07-31 |
Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops
Grant 8,221,580 - Buchberger, Jr. , et al. July 17, 2 | 2012-07-17 |
Multi-zoned Plasma Processing Electrostatic Chuck With Improved Temperature Uniformity
App 20120091104 - Tavassoli; Hamid ; et al. | 2012-04-19 |
Capacitively coupled plasma reactor having very agile wafer temperature control
Grant 8,157,951 - Buchberger, Jr. , et al. April 17, 2 | 2012-04-17 |
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
Grant 8,092,639 - Buchberger, Jr. , et al. January 10, 2 | 2012-01-10 |
Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution
Grant 8,092,638 - Brillhart , et al. January 10, 2 | 2012-01-10 |
Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator
Grant 8,080,479 - Collins , et al. December 20, 2 | 2011-12-20 |
Temperature Controlled Plasma Processing Chamber Component With Zone Dependent Thermal Efficiencies
App 20110303641 - MAHADESWARASWAMY; Chetan ; et al. | 2011-12-15 |
Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes
Grant 8,076,247 - Collins , et al. December 13, 2 | 2011-12-13 |
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
Grant 8,034,180 - Brillhart , et al. October 11, 2 | 2011-10-11 |
Method for agile workpiece temperature control in a plasma reactor using a thermal model
Grant 8,021,521 - Buchberger, Jr. , et al. September 20, 2 | 2011-09-20 |
Plasma reactor with a multiple zone thermal control feed forward control apparatus
Grant 8,012,304 - Brillhart , et al. September 6, 2 | 2011-09-06 |
Method of operating a capacitively coupled plasma reactor with dual temperature control loops
Grant 7,988,872 - Brillhart , et al. August 2, 2 | 2011-08-02 |
Plasma reactor with reduced electrical skew using electrical bypass elements
Grant 7,988,815 - Rauf , et al. August 2, 2 | 2011-08-02 |
Apparatus For Controlling Temperature Uniformity Of A Substrate
App 20110180243 - BERA; KALLOL ; et al. | 2011-07-28 |
Apparatus For Controlling Temperature Uniformity Of A Showerhead
App 20110180233 - BERA; KALLOL ; et al. | 2011-07-28 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
Grant 7,972,467 - Bera , et al. July 5, 2 | 2011-07-05 |
Plasma processing apparatus
Grant 7,972,469 - Hanawa , et al. July 5, 2 | 2011-07-05 |
Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity
Grant 7,968,469 - Collins , et al. June 28, 2 | 2011-06-28 |
Method Of Processing A Workpiece In A Plasma Reactor Using Multiple Zone Feed Forward Thermal Control
App 20110068085 - Brillhart; Paul Lukas ; et al. | 2011-03-24 |
Method Of Processing A Workpiece In A Plasma Reactor Using Feed Forward Thermal Control
App 20110065279 - Buchberger, JR.; Douglas A. ; et al. | 2011-03-17 |
Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources
Grant 7,884,025 - Collins , et al. February 8, 2 | 2011-02-08 |
Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources
Grant 7,879,731 - Collins , et al. February 1, 2 | 2011-02-01 |
Capacitivley Coupled Plasma Reactor Having A Cooled/heated Wafer Support With Uniform Temperature Distribution
App 20100319852 - Brillhart; Paul Lukas ; et al. | 2010-12-23 |
Plasma Reactor With Feed Forward Thermal Control System Using A Thermal Model For Accommodating Rf Power Changes Or Wafer Temperature Changes
App 20100319851 - Buchberger, JR.; Douglas A. ; et al. | 2010-12-23 |
Plasma Reactor With A Multiple Zone Thermal Control Feed Forward Control Apparatus
App 20100314046 - Brillhart; Paul Lukas ; et al. | 2010-12-16 |
Method of preventing etch profile bending and bowing in high aspect ratio openings by treating a polymer formed on the opening sidewalls
Grant 7,846,846 - Bera , et al. December 7, 2 | 2010-12-07 |
Method Of Cooling A Wafer Support At A Uniform Temperature In A Capacitively Coupled Plasma Reactor
App 20100300621 - Brillhart; Paul Lukas ; et al. | 2010-12-02 |
Capacitively Coupled Plasma Reactor Having Very Agile Wafer Temperature Control
App 20100303680 - Buchberger, JR.; Douglas A. ; et al. | 2010-12-02 |
Methods and apparatus for controlling characteristics of a plasma
Grant 7,777,599 - Shannon , et al. August 17, 2 | 2010-08-17 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma
Grant 7,754,997 - Bera , et al. July 13, 2 | 2010-07-13 |
Etching Chamber Having Flow Equalizer And Lower Liner
App 20100065213 - Carducci; James D. ; et al. | 2010-03-18 |
Apparatus to confine plasma and to enhance flow conductance
Grant 7,674,353 - Bera , et al. March 9, 2 | 2010-03-09 |
Method and apparatus to confine plasma and to enhance flow conductance
Grant 7,618,516 - Bera , et al. November 17, 2 | 2009-11-17 |
Electrical Control Of Plasma Uniformity Using External Circuit
App 20090230089 - BERA; KALLOL ; et al. | 2009-09-17 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
Grant 7,585,384 - Bera , et al. September 8, 2 | 2009-09-08 |
Etching Chamber Having Flow Equalizer And Lower Liner
App 20090188625 - CARDUCCI; JAMES D. ; et al. | 2009-07-30 |
Method And Apparatus For Enhancing Flow Uniformity In A Process Chamber
App 20090188624 - BERA; KALLOL ; et al. | 2009-07-30 |
Heated Showerhead Assembly
App 20090179085 - CARDUCCI; JAMES D. ; et al. | 2009-07-16 |
Method And Apparatus For Controlling Temperature Of A Substrate
App 20090159566 - Brillhart; Paul L. ; et al. | 2009-06-25 |
Plasma reactor gas distribution plate having a path splitting manifold immersed within a showerhead
App 20090159213 - Bera; Kallol ; et al. | 2009-06-25 |
Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution
App 20090159002 - Bera; Kallol ; et al. | 2009-06-25 |
Plasma reactor gas distribution plate with radially distributed path splitting manifold
App 20090162260 - BERA; Kallol ; et al. | 2009-06-25 |
Plasma reactor gas distribution plate having path splitting manifold side-by-side with showerhead
App 20090162262 - Bera; Kallol ; et al. | 2009-06-25 |
Methods And Apparatus For Controlling Characteristics Of A Plasma
App 20090140828 - Shannon; Steven C. ; et al. | 2009-06-04 |
Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones
Grant 7,541,292 - Bera , et al. June 2, 2 | 2009-06-02 |
Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content
Grant 7,540,971 - Bera , et al. June 2, 2 | 2009-06-02 |
Method Of Preventing Etch Profile Bending And Bowing In High Aspect Ratio Openings By Treating A Polymer Formed On The Opening Sidewalls
App 20090081876 - BERA; Kallol ; et al. | 2009-03-26 |
Plasma Reactor With Reduced Electrical Skew Using Electrical Bypass Elements
App 20090025878 - Rauf; Shahid ; et al. | 2009-01-29 |
Plasma Reactor With Reduced Electrical Skew Using A Conductive Baffle
App 20090025879 - Rauf; Shahid ; et al. | 2009-01-29 |
Annular Baffle
App 20080314571 - Hoffman; Daniel J. ; et al. | 2008-12-25 |
Apparatus And Method To Confine Plasma And Reduce Flow Resistance In A Plasma Reactor
App 20080314522 - Bera; Kallol ; et al. | 2008-12-25 |
Plasma Processing Apparatus
App 20080257261 - Hanawa; Hiroji ; et al. | 2008-10-23 |
Plasma Processing Method
App 20080260966 - Hanawa; Hiroji ; et al. | 2008-10-23 |
Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation
Grant 7,431,859 - Bera , et al. October 7, 2 | 2008-10-07 |
Method Of Processing A Workpiece In A Plasma Reactor With Variable Height Ground Return Path To Control Plasma Ion Density Uniformity
App 20080179181 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Plasma Reactor With Ion Distribution Uniformity Controller Employing Plural Vhf Sources
App 20080178803 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Plasma Reactor With Wide Process Window Employing Plural Vhf Sources
App 20080179011 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Plasma Process Uniformity Across A Wafer By Apportioning Ground Return Path Impedances Among Plural Vhf Sources
App 20080182417 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Plasma Process Uniformity Across A Wafer By Controlling Rf Phase Between Opposing Electrodes
App 20080180028 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Plasma Process Uniformity Across A Wafer By Apportioning Power Among Plural Vhf Sources
App 20080182416 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Plasma Process Uniformity Across A Wafer By Controlling A Variable Frequency Coupled To A Harmonic Resonator
App 20080182418 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Apparatus And Method To Confine Plasma And Reduce Flow Resistance In A Plasma Reactor
App 20080105660 - Bera; Kallol ; et al. | 2008-05-08 |
Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation
App 20070251918 - Bera; Kallol ; et al. | 2007-11-01 |
Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content
App 20070251917 - Bera; Kallol ; et al. | 2007-11-01 |
Plasma etch process using polymerizing etch gases and an inert diluent gas in independent gas injection zones to improve etch profile or etch rate uniformity
App 20070254483 - Bera; Kallol ; et al. | 2007-11-01 |
Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones
App 20070254486 - Bera; Kallol ; et al. | 2007-11-01 |
Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone
App 20070251642 - Bera; Kallol ; et al. | 2007-11-01 |
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
App 20070097580 - Brillhart; Paul Lukas ; et al. | 2007-05-03 |
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
App 20070091539 - Buchberger; Douglas A. JR. ; et al. | 2007-04-26 |
Plasma reactor with a multiple zone thermal control feed forward control apparatus
App 20070089834 - Brillhart; Paul Lukas ; et al. | 2007-04-26 |
Method for agile workpiece temperature control in a plasma reactor using a thermal model
App 20070091537 - Buchberger; Douglas A. JR. ; et al. | 2007-04-26 |
Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control
App 20070091540 - Brillhart; Paul Lukas ; et al. | 2007-04-26 |
Method of processing a workpiece in a plasma reactor using feed forward thermal control
App 20070091541 - Buchberger; Douglas A. JR. ; et al. | 2007-04-26 |
Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops
App 20070091538 - Buchberger; Douglas A. JR. ; et al. | 2007-04-26 |
Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution
App 20070081295 - Brillhart; Paul Lukas ; et al. | 2007-04-12 |
Capacitively coupled plasma reactor having very agile wafer temperature control
App 20070081294 - Buchberger; Douglas A. JR. ; et al. | 2007-04-12 |
Method of operating a capacitively coupled plasma reactor with dual temperature control loops
App 20070081296 - Brillhart; Paul Lukas ; et al. | 2007-04-12 |
Apparatus To Confine Plasma And To Enhance Flow Conductance
App 20070023145 - Bera; Kallol ; et al. | 2007-02-01 |
Method Of Fabricating A Dual Damascene Interconnect Structure
App 20070026665 - Bera; Kallol ; et al. | 2007-02-01 |
Method And Apparatus To Confine Plasma And To Enhance Flow Conductance
App 20060193102 - Bera; Kallol ; et al. | 2006-08-31 |
Method and apparatus to confine plasma and to enhance flow conductance
App 20060172542 - Bera; Kallol ; et al. | 2006-08-03 |
Apparatus for controlling gas flow in a semiconductor substrate processing chamber
App 20050224180 - Bera, Kallol ; et al. | 2005-10-13 |
Method of fabricating a dual damascene interconnect structure
App 20050059234 - Bera, Kallol ; et al. | 2005-03-17 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
App 20040206309 - Bera, Kallol ; et al. | 2004-10-21 |
Method and apparatus for critical flow particle removal
App 20020096195 - Harvey, Stefanie ; et al. | 2002-07-25 |
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