loadpatents
name:-0.016884088516235
name:-0.025014877319336
name:-0.00050902366638184
Becker; David S. Patent Filings

Becker; David S.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Becker; David S..The latest application filed is for "poultry cart handler and method".

Company Profile
0.25.12
  • Becker; David S. - Elizabethtown PA US
  • Becker; David S. - Boise ID
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Poultry cart handler and method
Grant 8,726,848 - Melhorn , et al. May 20, 2
2014-05-20
Poultry Cart Handler and Method
App 20120272925 - Melhorn; J. Michael ;   et al.
2012-11-01
Method of forming high aspect ratio apertures
Grant 7,608,196 - Donohoe , et al. October 27, 2
2009-10-27
Method of forming high aspect ratio apertures
App 20070084826 - Donohoe; Kevin G. ;   et al.
2007-04-19
Plasma etching methods
Grant 7,183,220 - Blalock , et al. February 27, 2
2007-02-27
Method of forming high aspect ratio apertures
Grant 7,163,641 - Donohoe , et al. January 16, 2
2007-01-16
Etchant and method of use
App 20060186087 - Donohoe; Kevin G. ;   et al.
2006-08-24
Etchant and method of use
Grant 7,074,724 - Donohoe , et al. July 11, 2
2006-07-11
Method for enhancing silicon dioxide to silicon nitride selectivity
Grant 7,049,244 - Becker , et al. May 23, 2
2006-05-23
Plasma etching methods
Grant 6,958,297 - Becker , et al. October 25, 2
2005-10-25
Etchant and method of use
Grant 6,890,863 - Donohoe , et al. May 10, 2
2005-05-10
Etchant and method of use
App 20040248413 - Donohoe, Kevin G. ;   et al.
2004-12-09
Plasma etching methods
Grant 6,812,154 - Becker , et al. November 2, 2
2004-11-02
Gas pulsing for etch profile control
Grant 6,784,108 - Donohoe , et al. August 31, 2
2004-08-31
Method of reducing overetch during the formation of a semiconductor device
Grant 6,759,320 - Becker July 6, 2
2004-07-06
Plasma etching methods
App 20030207581 - Becker, David S. ;   et al.
2003-11-06
Method of forming high aspect ratio apertures
App 20030192858 - Donohoe, Kevin G. ;   et al.
2003-10-16
Method of forming high aspect ratio apertures
Grant 6,610,212 - Donohoe , et al. August 26, 2
2003-08-26
Method Of Preventing Aluminum Sputtering During Oxide Via Etching
App 20030153175 - BLALOCK, GUY ;   et al.
2003-08-14
Plasma etching methods
App 20030036283 - Becker, David S. ;   et al.
2003-02-20
Method of reducing overetch during the formation of a semiconductor device
App 20030003764 - Becker, David S.
2003-01-02
Plasma etching methods
Grant 6,492,279 - Becker , et al. December 10, 2
2002-12-10
Method of forming high aspect ratio apertures
App 20020084256 - Donohoe, Kevin G. ;   et al.
2002-07-04
Method for enhancing oxide to nitride selectivity through the use of independent heat control
App 20020000423 - Becker, David S. ;   et al.
2002-01-03
Semiconductor structure useful in a self-aligned contact etch and method for making same
App 20020001970 - Becker, David S.
2002-01-03
Semiconductor structure useful in a self-aligned contact etch and method for making same
Grant 6,331,495 - Becker December 18, 2
2001-12-18
Method of etching a substrate
Grant 6,287,978 - Becker , et al. September 11, 2
2001-09-11
Plasma etching methods
Grant 6,277,759 - Blalock , et al. August 21, 2
2001-08-21
Method of reducing overetch during the formation of a semiconductor device
Grant 6,051,501 - Becker , et al. April 18, 2
2000-04-18
Semiconductor structure useful in a self-aligned contact having multiple insulation layers of non-uniform thickness
Grant 6,018,184 - Becker January 25, 2
2000-01-25
Semiconductor processing methods of forming a contact opening to a semiconductor substrate
Grant 5,869,403 - Becker , et al. February 9, 1
1999-02-09
Highly selective nitride spacer etch
Grant 5,700,580 - Becker , et al. December 23, 1
1997-12-23
In situ etch process for insulating and conductive materials
Grant 5,691,246 - Becker , et al. November 25, 1
1997-11-25
Process for selectively etching a layer of silicon dioxide on an underlying stop layer of silicon nitride
Grant 5,286,344 - Blalock , et al. February 15, 1
1994-02-15
Method of conductor isolation from a conductive contact plug
Grant 5,252,517 - Blalock , et al. October 12, 1
1993-10-12
One chamber in-situ etch process for oxide and conductive material
Grant 5,094,712 - Becker , et al. March 10, 1
1992-03-10

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed