Barns; Chris E.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Barns; Chris E..The latest application filed is for "micro assembly using micro multi-tools".

Company Profile

1.35.49

Barns; Chris E. - Tigard OR
Barns; Chris E. - Portland OR
Barns; Chris E. - Mt. View CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Micro Assembly Using Micro Multi-tools App 20190351516 - Phillips; Brian P. ; et al.	2019-11-21
Complementary metal oxide semiconductor integrated circuit using raised source drain and replacement metal gate Grant 8,148,786 - Kavalieros , et al. April 3, 2	2012-04-03
CMOS device with metal and silicide gate electrodes and a method for making it Grant 7,883,951 - Brask , et al. February 8, 2	2011-02-08
Preventing silicide formation at the gate electrode in a replacement metal gate technology Grant 7,754,552 - Barns , et al. July 13, 2	2010-07-13
Method for making a semiconductor device having a high-k dielectric layer and a metal gate electrode Grant 7,671,471 - Brask , et al. March 2, 2	2010-03-02
Introducing nanotubes in trenches and structures formed thereby Grant 7,666,465 - Fischer , et al. February 23, 2	2010-02-23
Cmos Device With Metal And Silicide Gate Electrodes And A Method For Making It App 20090280608 - Brask; Justin K. ; et al.	2009-11-12
Complementary Metal Oxide Semiconductor Integrated Circuit Using Raised Source Drain and Replacement Metal Gate App 20090261391 - KAVALIEROS; Jack ; et al.	2009-10-22
Complementary metal oxide semiconductor integrated circuit using raised source drain and replacement metal gate Grant 7,569,443 - Kavalieros , et al. August 4, 2	2009-08-04
Facilitating removal of sacrificial layers via implantation to form replacement metal gates Grant 7,422,936 - Barns , et al. September 9, 2	2008-09-09
Reduction Of Line Edge Roughness By Chemical Mechanical Polishing App 20080160256 - Bristol; Robert L. ; et al.	2008-07-03
Method For Making A Semiconductor Device Having A High-k Dielectric Layer And A Metal Gate Electrode App 20080135952 - Brask; Justin K. ; et al.	2008-06-12
Thin III-V semiconductor films with high electron mobility App 20080132081 - Shaheen; Mohamad A. ; et al.	2008-06-05
Cmos Device With Metal And Silicide Gate Electrodes And A Method For Making It App 20080124857 - Brask; Justin K. ; et al.	2008-05-29
Method for making semiconductor device having a high-k gate dielectric layer and a metal gate electrode Grant 7,355,281 - Brask , et al. April 8, 2	2008-04-08
Integrating n-type and p-type metal gate transistors Grant 7,316,949 - Doczy , et al. January 8, 2	2008-01-08
Etch stop and hard mask film property matching to enable improved replacement metal gate process Grant 7,271,045 - Prince , et al. September 18, 2	2007-09-18
Selectively converted inter-layer dielectric Grant 7,239,019 - Leu , et al. July 3, 2	2007-07-03
Method for making a semiconductor device with a metal gate electrode that is formed on an annealed high-k gate dielectric layer Grant 7,220,635 - Brask , et al. May 22, 2	2007-05-22
Methods for integrating replacement metal gate structures Grant 7,217,611 - Kavalieros , et al. May 15, 2	2007-05-15
Replacement gate process for making a semiconductor device that includes a metal gate electrode Grant 7,208,361 - Shah , et al. April 24, 2	2007-04-24
Semiconductor substrate polishing methods and equipment Grant 7,205,236 - Fischer , et al. April 17, 2	2007-04-17
Etch stop and hard mask film property matching to enable improved replacement metal gate process App 20070077765 - Prince; Matthew J. ; et al.	2007-04-05
Method for making a semiconductor device that includes a metal gate electrode Grant 7,183,184 - Doczy , et al. February 27, 2	2007-02-27
Planarizing a semiconductor structure to form replacement metal gates App 20070037372 - Kavalieros; Jack ; et al.	2007-02-15
Poly open polish process Grant 7,166,506 - Prince , et al. January 23, 2	2007-01-23
Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode Grant 7,157,378 - Brask , et al. January 2, 2	2007-01-02
CMOS device with metal and silicide gate electrodes and a method for making it Grant 7,153,734 - Brask , et al. December 26, 2	2006-12-26
Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode Grant 7,153,784 - Brask , et al. December 26, 2	2006-12-26
Complementary metal oxide semiconductor integrated circuit using raised source drain and replacement metal gate App 20060286729 - Kavalieros; Jack ; et al.	2006-12-21
Semiconductor substrate polishing methods and equipment App 20060272773 - Fischer; Paul B. ; et al.	2006-12-07
Polysilicon opening polish Grant 7,144,816 - Barns , et al. December 5, 2	2006-12-05
Planarizing a semiconductor structure to form replacement metal gates Grant 7,138,323 - Kavalieros , et al. November 21, 2	2006-11-21
Replacement gate flow facilitating high yield and incorporation of etch stop layers and/or stressed films App 20060237804 - Chau; Robert S. ; et al.	2006-10-26
Sacrificial dielectric planarization layer Grant 7,109,557 - Barns , et al. September 19, 2	2006-09-19
Method for making a semiconductor device with a metal gate electrode that is formed on an annealed high-k gate dielectric layer App 20060183277 - Brask; Justin K. ; et al.	2006-08-17
Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode App 20060180878 - Brask; Justin K. ; et al.	2006-08-17
Replacement gate flow facilitating high yield and incorporation of etch stop layers and/or stressed films Grant 7,078,282 - Chau , et al. July 18, 2	2006-07-18
Introducing nanotubes in trenches and structures formed thereby App 20060141222 - Fischer; Paul B. ; et al.	2006-06-29
Poly open polish process App 20060134916 - Prince; Matthew J. ; et al.	2006-06-22
Method for making a semiconductor device with a high-k gate dielectric and a conductor that facilitates current flow across a P/N junction Grant 7,045,428 - Brask , et al. May 16, 2	2006-05-16
Novel slurry for chemical mechanical polishing of metals App 20060099817 - Feller; A. Daniel ; et al.	2006-05-11
Novel slurry for chemical mechanical polishing of metals App 20060097347 - Feller; A. Daniel ; et al.	2006-05-11
Semiconductor substrate polishing methods and equipment App 20060065633 - Fischer; Paul B. ; et al.	2006-03-30
Method of forming a selectively converted inter-layer dielectric using a porogen material Grant 7,018,918 - Kloster , et al. March 28, 2	2006-03-28
Facilitating removal of sacrificial layers via implantation to form replacement metal gates App 20060046448 - Barns; Chris E. ; et al.	2006-03-02
Facilitating removal of sacrificial layers to form replacement metal gates App 20060046523 - Kavalieros; Jack ; et al.	2006-03-02
Integrating n-type and p-type metal gate transistors App 20060030104 - Doczy; Mark ; et al.	2006-02-09
Planarizing a semiconductor structure to form replacement metal gates App 20060022277 - Kavalieros; Jack ; et al.	2006-02-02
Methods for integrating replacement metal gate structures App 20060008954 - Kavalieros; Jack ; et al.	2006-01-12
Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode App 20060008968 - Brask; Justin K. ; et al.	2006-01-12
Contact planarization for integrated circuit processing App 20060003600 - Barns; Chris E.	2006-01-05
Replacement gate process for making a semiconductor device that includes a metal gate electrode App 20050272191 - Shah, Uday ; et al.	2005-12-08
integrating n-type and P-type metal gate transistors Grant 6,972,225 - Doczy , et al. December 6, 2	2005-12-06
Method for making a semiconductor device with a high-k gate dielectric and a conductor that facilitates current flow across a P/N junction App 20050266619 - Brask, Justin K. ; et al.	2005-12-01
Selectively converted inter-layer dielectric App 20050236714 - Leu, Jihperng ; et al.	2005-10-27
Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode App 20050233527 - Brask, Justin K. ; et al.	2005-10-20
Integrating n-type and p-type metal gate transistors Grant 6,953,719 - Doczy , et al. October 11, 2	2005-10-11
Replacement gate process for making a semiconductor device that includes a metal gate electrode App 20050214987 - Shah, Uday ; et al.	2005-09-29
Selectively converted inter-layer dielectric Grant 6,943,121 - Leu , et al. September 13, 2	2005-09-13
Selectively Converted Inter-layer Dielectric App 20050181593 - Leu, Jihperng ; et al.	2005-08-18
Replacement gate flow facilitating high yield and incorporation of etch stop layers and/or stressed films App 20050145894 - Chau, Robert S. ; et al.	2005-07-07
Method for making a semiconductor device that includes a metal gate electrode App 20050148130 - Doczy, Mark L. ; et al.	2005-07-07
Cmos Device With Metal And Silicide Gate Electrodes And A Method For Making It App 20050148136 - Brask, Justin K. ; et al.	2005-07-07
Methods for integrating replacement metal gate structures App 20050139928 - Kavalieros, Jack ; et al.	2005-06-30
Sacrificial dielectric planarization layer Grant 6,908,863 - Barns , et al. June 21, 2	2005-06-21
Sacrificial dielectric planarization layer App 20050070061 - Barns, Chris E. ; et al.	2005-03-31
Sacrificial dielectric planarization layer App 20050070093 - Barns, Chris E. ; et al.	2005-03-31
Novel slurry for chemical mechanical polishing of metals App 20050070109 - Feller, A. Daniel ; et al.	2005-03-31
Integrating N-type and P-type metal gate transistors App 20050040469 - Doczy, Mark ; et al.	2005-02-24
Integrating n-type and p-type metal gate transistors Grant 6,858,483 - Doczy , et al. February 22, 2	2005-02-22
Preventing silicide formation at the gate electrode in a replacement metal gate technology App 20050026408 - Barns, Chris E. ; et al.	2005-02-03
Integrating n-type and p-type metal gate transistors App 20040214385 - Doczy, Mark ; et al.	2004-10-28
Polysilicon opening polish App 20040192018 - Barns, Chris E. ; et al.	2004-09-30
Integrating n-type and p-type metal gate transistors App 20040121541 - Doczy, Mark ; et al.	2004-06-24
Polysilicon opening polish Grant 6,743,683 - Barns , et al. June 1, 2	2004-06-01
Selectively converted inter-layer dielectric App 20040102032 - Kloster, Grant M. ; et al.	2004-05-27
Through-pad Slurry Delivery For Chemical-mechanical Polish App 20040063387 - Barns, Chris E.	2004-04-01
Through-pad slurry delivery for chemical-mechanical polish Grant 6,705,928 - Barns March 16, 2	2004-03-16
Polysilicon opening polish App 20040038535 - Barns, Chris E. ; et al.	2004-02-26
Work piece wand and method for processing work pieces using a work piece handling wand Grant 6,558,562 - Mallery , et al. May 6, 2	2003-05-06
Apparatus and method for planarizing a workpiece and a workpiece handling wand for use in the method App 20020173237 - Barns, Chris E. ; et al.	2002-11-21
Work piece wand and method for processing work pieces using a work piece handling wand App 20020067985 - Mallery, Daniel S. ; et al.	2002-06-06
Multiple axis reticle Grant 4,957,357 - Barns , et al. September 18, 1	1990-09-18

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