| Patent | Date |
|---|
Method for positioning wafers in multiple wafer transport
Grant 9,793,148 - Yamagishi , et al. October 17, 2 | 2017-10-17 |
High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules
Grant 9,312,155 - Mori , et al. April 12, 2 | 2016-04-12 |
Method of forming metal oxide hardmask
Grant 9,171,716 - Fukuda October 27, 2 | 2015-10-27 |
Method of Forming Metal Oxide Hardmask
App 20150056540 - Fukuda; Hideaki | 2015-02-26 |
Method of forming metal oxide hardmask
Grant 8,901,016 - Ha , et al. December 2, 2 | 2014-12-02 |
Shower plate having different aperture dimensions and/or distributions
Grant 8,845,806 - Aida , et al. September 30, 2 | 2014-09-30 |
Method for forming low-carbon CVD film for filling trenches
Grant 8,765,233 - Fukazawa , et al. July 1, 2 | 2014-07-01 |
Cluster type semiconductor processing apparatus
Grant 8,758,514 - Takizawa , et al. June 24, 2 | 2014-06-24 |
Method of tailoring conformality of Si-containing film
Grant 8,669,185 - Onizawa , et al. March 11, 2 | 2014-03-11 |
Semiconductor-processing apparatus equipped with robot diagnostic module
Grant 8,666,551 - Takizawa , et al. March 4, 2 | 2014-03-04 |
Method of forming insulation film using plasma treatment cycles
Grant 8,647,722 - Kobayashi , et al. February 11, 2 | 2014-02-11 |
Atomic layer deposition for controlling vertical film growth
Grant 8,592,005 - Ueda November 26, 2 | 2013-11-26 |
Method for forming single-phase multi-element film by PEALD
Grant 8,569,184 - Oka , et al. October 29, 2 | 2013-10-29 |
Method of depositing dielectric film by ALD using precursor containing silicon, hydrocarbon, and halogen
Grant 8,563,443 - Fukazawa October 22, 2 | 2013-10-22 |
Method for reducing dielectric constant of film using direct plasma of hydrogen
Grant 8,551,892 - Nakano October 8, 2 | 2013-10-08 |
Method of depositing film with tailored comformality
Grant 8,470,187 - Ha June 25, 2 | 2013-06-25 |
Calibration method of UV sensor for UV curing
Grant 8,466,411 - Arai June 18, 2 | 2013-06-18 |
Method of depositing film by atomic layer deposition with pulse-time-modulated plasma
Grant 8,465,811 - Ueda June 18, 2 | 2013-06-18 |
Method of depositing dielectric film by modified PEALD method
Grant 8,415,259 - Lee , et al. April 9, 2 | 2013-04-09 |
Method for Forming Single-Phase Multi-Element Film by PEALD
App 20130084714 - Oka; Takahiro ; et al. | 2013-04-04 |
UV Irradiation Apparatus Having UV Lamp-Shared Multiple Process Stations
App 20130068970 - Matsushita; Kiyohiro | 2013-03-21 |
Method of forming conformal film having si-N bonds on high-aspect ratio pattern
Grant 8,394,466 - Hong , et al. March 12, 2 | 2013-03-12 |
Method For Reducing Dielectric Constant Of Film Using Direct Plasma Of Hydrogen
App 20130029498 - Nakano; Akinori | 2013-01-31 |
Wafer-Supporting Device and Method for Producing Same
App 20130014896 - Shoji; Fumitaka ; et al. | 2013-01-17 |
Container Having Multiple Compartments Containing Liquid Material for Multiple Wafer-Processing Chambers
App 20130014697 - Kanayama; Hiroki | 2013-01-17 |
Dual Section Module Having Shared and Unshared Mass Flow Controllers
App 20120328780 - Yamagishi; Takayuki | 2012-12-27 |
Method for Positioning Wafers in Multiple Wafer Transport
App 20120325148 - Yamagishi; Takayuki ; et al. | 2012-12-27 |
Method of forming stress-tuned dielectric film having Si-N bonds by modified PEALD
Grant 8,334,219 - Lee , et al. December 18, 2 | 2012-12-18 |
Method of depositing dielectric film by ALD using precursor containing silicon, hydrocarbon, and halogen
Grant 8,329,599 - Fukazawa , et al. December 11, 2 | 2012-12-11 |
High-Throughput Semiconductor-Processing Apparatus Equipped with Multiple Dual-Chamber Modules
App 20120305196 - Mori; Yukihiro ; et al. | 2012-12-06 |
Method of Depositing Dielectric Film by ALD Using Precursor Containing Silicon, Hydrocarbon, and Halogen
App 20120295449 - Fukazawa; Atsuki | 2012-11-22 |
Atomic Layer Deposition For Controlling Vertical Film Growth
App 20120276306 - Ueda; Shintaro | 2012-11-01 |
Footing reduction using etch-selective layer
Grant 8,298,951 - Nakano October 30, 2 | 2012-10-30 |
Footing Reduction Using Etch-Selective Layer
App 20120264305 - Nakano; Ryu | 2012-10-18 |
Calibration Method of UV Sensor for UV Curing
App 20120223220 - Arai; Hirofumi | 2012-09-06 |
Method Of Depositing Dielectric Film By Modified Peald Method
App 20120220139 - Lee; Woo-Jin ; et al. | 2012-08-30 |
Method of Depositing Dielectric Film by ALD Using Precursor Containing Silicon, Hydrocarbon, and Halogen
App 20120214318 - Fukazawa; Atsuki ; et al. | 2012-08-23 |
Method for forming interconnect structure having airgap
Grant 8,241,991 - Hsieh , et al. August 14, 2 | 2012-08-14 |
Method Of Depositing Film By Atomic Layer Deposition With Pulse-time-modulated Plasma
App 20120196048 - Ueda; Shintaro | 2012-08-02 |
Method of Forming Metal Oxide Hardmask
App 20120164846 - Ha; Jeongseok ; et al. | 2012-06-28 |
Method of depositing silicon oxide film by plasma enhanced atomic layer deposition at low temperature
Grant 8,197,915 - Oka , et al. June 12, 2 | 2012-06-12 |
Method Of Depositing Film With Tailored Comformality
App 20120111831 - Ha; Jeongseok | 2012-05-10 |
Method of depositing dielectric film having Si-N bonds by modified peald method
Grant 8,173,554 - Lee , et al. May 8, 2 | 2012-05-08 |
Shower Plate Having Different Aperture Dimensions and/or Distributions
App 20120100307 - Aida; Koei ; et al. | 2012-04-26 |
Method for controlling flow and concentration of liquid precursor
Grant 8,151,814 - Shimizu , et al. April 10, 2 | 2012-04-10 |
Method of forming conformal dielectric film having Si-N bonds by PECVD
Grant 8,142,862 - Lee , et al. March 27, 2 | 2012-03-27 |
Method for forming metal film by ALD using beta-diketone metal complex
Grant 8,133,555 - Shinriki , et al. March 13, 2 | 2012-03-13 |
Method of Forming Conformal Film Having Si-N Bonds on High-Aspect Ratio Pattern
App 20120058282 - Hong; Kuo-wei ; et al. | 2012-03-08 |
Clamping mechanism for semiconductor device
Grant 8,118,940 - Shimizu , et al. February 21, 2 | 2012-02-21 |
METHOD OF TAILORING CONFORMALITY OF Si-CONTAINING FILM
App 20120028469 - Onizawa; Shigeyuki ; et al. | 2012-02-02 |
Method for forming porous insulation film
Grant 8,105,661 - Hyodo , et al. January 31, 2 | 2012-01-31 |
Atomic composition controlled ruthenium alloy film formed by plasma-enhanced atomic layer deposition
Grant 8,084,104 - Shinriki , et al. December 27, 2 | 2011-12-27 |
Method for forming silicon carbide film containing oxygen
Grant 8,080,282 - Fukazawa , et al. December 20, 2 | 2011-12-20 |
Method for designing shower plate for plasma CVD apparatus
Grant 8,053,036 - Takahashi November 8, 2 | 2011-11-08 |
Position sensor system for substrate transfer robot
Grant 8,041,450 - Takizawa , et al. October 18, 2 | 2011-10-18 |
Method of plasma treatment using amplitude-modulated RF power
Grant 8,021,723 - Fukasawa , et al. September 20, 2 | 2011-09-20 |
Method For Forming Interconnect Structure Having Airgap
App 20110217838 - Hsieh; Julian J. ; et al. | 2011-09-08 |
Method for forming dielectric film using siloxane-silazane mixture
Grant 8,003,174 - Fukazawa , et al. August 23, 2 | 2011-08-23 |
Heater block for use in a semiconductor processing tool
Grant D643,055 - Takahashi August 9, 2 | 2011-08-09 |
Substrate-supporting device having continuous concavity
Grant 7,993,462 - Takahashi August 9, 2 | 2011-08-09 |
Purge step-controlled sequence of processing semiconductor wafers
Grant 7,972,961 - Sugiyama , et al. July 5, 2 | 2011-07-05 |
Method of forming conformal dielectric film having Si-N bonds by PECVD
Grant 7,972,980 - Lee , et al. July 5, 2 | 2011-07-05 |
Method for Sealing Pores at Surface of Dielectric Layer by UV Light-Assisted CVD
App 20110159202 - Matsushita; Kiyohiro ; et al. | 2011-06-30 |
Wafer processing apparatus with wafer alignment device
Grant 7,963,736 - Takizawa , et al. June 21, 2 | 2011-06-21 |
Method for forming dielectric film using porogen gas
Grant 7,955,650 - Tsuji June 7, 2 | 2011-06-07 |
Semiconductor manufacturing apparatus
Grant 7,945,345 - Takizawa , et al. May 17, 2 | 2011-05-17 |
METHOD OF DEPOSITING DIELECTRIC FILM HAVING Si-N BONDS BY MODIFIED PEALD METHOD
App 20110086516 - Lee; Woo Jin ; et al. | 2011-04-14 |
Method of forming conformal dielectric film having Si-N bonds by PECVD
Grant 7,919,416 - Lee , et al. April 5, 2 | 2011-04-05 |
Input signal analyzing system and control apparatus using same
Grant 7,899,557 - Takizawa , et al. March 1, 2 | 2011-03-01 |
Method of Forming Stress-Tuned Dielectric Film Having Si-N Bonds by Modified PEALD
App 20110014795 - Lee; Woo Jin ; et al. | 2011-01-20 |
Method of forming highly conformal amorphous carbon layer
Grant 7,842,622 - Lee , et al. November 30, 2 | 2010-11-30 |
Method Of Forming Highly Conformal Amorphous Carbon Layer
App 20100291713 - Lee; Woo-Jin ; et al. | 2010-11-18 |
Liquid material vaporization apparatus for semiconductor processing apparatus
Grant 7,833,353 - Furukawahara , et al. November 16, 2 | 2010-11-16 |
Semiconductor manufacturing apparatus equipped with wafer inspection device and inspection techniques
Grant 7,832,353 - Takizawa , et al. November 16, 2 | 2010-11-16 |
Method of forming organosilicon oxide film and multilayer resist structure
Grant 7,829,159 - Nakano November 9, 2 | 2010-11-09 |
Method for controlling semiconductor-processing apparatus
Grant 7,831,315 - Takizawa , et al. November 9, 2 | 2010-11-09 |
Method for depositing flowable material using alkoxysilane or aminosilane precursor
Grant 7,825,040 - Fukazawa , et al. November 2, 2 | 2010-11-02 |
Method of Depositing Silicon Oxide Film by Plasma Enhanced Atomic Layer Deposition at Low Temperature
App 20100255218 - Oka; Takahiro ; et al. | 2010-10-07 |
Method for forming dielectric SiOCH film having chemical stability
Grant 7,807,566 - Tsuji , et al. October 5, 2 | 2010-10-05 |
Shower plate having projections and plasma CVD apparatus using same
Grant 7,799,134 - Tsuji , et al. September 21, 2 | 2010-09-21 |
Ruthenium alloy film for copper interconnects
Grant 7,799,674 - Shinriki , et al. September 21, 2 | 2010-09-21 |
Method of cleaning UV irradiation chamber
Grant 7,789,965 - Matsushita , et al. September 7, 2 | 2010-09-07 |
METHOD OF FORMING CONFORMAL DIELECTRIC FILM HAVING Si-N BONDS BY PECVD
App 20100221925 - Lee; Woo Jin ; et al. | 2010-09-02 |
Method for forming metal wiring structure
Grant 7,785,658 - Shinriki , et al. August 31, 2 | 2010-08-31 |
Method for forming inorganic silazane-based dielectric film
Grant 7,781,352 - Fukazawa , et al. August 24, 2 | 2010-08-24 |
Method Of Forming Hardmask By Plasma Cvd
App 20100189923 - Goundar; Kamal Kishore | 2010-07-29 |
UV light irradiating apparatus with liquid filter
Grant 7,763,869 - Matsushita , et al. July 27, 2 | 2010-07-27 |
Method of Forming Conformal Dielectric Film Having Si-N Bonds by PECVD
App 20100184302 - LEE; Woo Jin ; et al. | 2010-07-22 |
Method For Controlling Flow And Concentration Of Liquid Precursor
App 20100178423 - Shimizu; Akira ; et al. | 2010-07-15 |
Semiconductor-processing Apparatus Equipped With Robot Diagnostic Module
App 20100158644 - Takizawa; Masahiro ; et al. | 2010-06-24 |
Multiple-Substrate Transfer Apparatus and Multiple-Substrate Processing Apparatus
App 20100147396 - Yamagishi; Takayuki ; et al. | 2010-06-17 |
Method Of Forming Low-k Film Having Chemical Resistance
App 20100151151 - Matsushita; Kiyohiro ; et al. | 2010-06-17 |
METHOD OF FORMING CONFORMAL DIELECTRIC FILM HAVING Si-N BONDS BY PECVD
App 20100144162 - Lee; Woo Jin ; et al. | 2010-06-10 |
Method For Forming Low-carbon Cvd Film For Filling Trenches
App 20100143609 - Fukazawa; Atsuki ; et al. | 2010-06-10 |
Process For Forming High Resistivity Thin Metallic Film
App 20100136313 - Shimizu; Akira ; et al. | 2010-06-03 |
Method of Forming Insulation Film Using Plasma Treatment Cycles
App 20100124618 - Kobayashi; Akiko ; et al. | 2010-05-20 |
Method of Forming Insulation Film by Modified PEALD
App 20100124621 - Kobayashi; Akiko ; et al. | 2010-05-20 |
Method for forming insulation film having high density
Grant 7,718,553 - Fukazawa , et al. May 18, 2 | 2010-05-18 |
Method of forming silicon-containing insulation film having low dielectric constant and low diffusion coefficient
Grant 7,718,544 - Tsuji , et al. May 18, 2 | 2010-05-18 |
Gas-introducing system and plasma CVD apparatus
Grant 7,718,004 - Satoh , et al. May 18, 2 | 2010-05-18 |
Plasma processing apparatus with insulated gas inlet pore
Grant 7,712,435 - Yoshizaki , et al. May 11, 2 | 2010-05-11 |
Method of detecting occurrence of sticking of substrate
Grant 7,712,370 - Furukawahara , et al. May 11, 2 | 2010-05-11 |
Two-step Formation Of Hydrocarbon-based Polymer Film
App 20100104770 - Goundar; Kamal Kishore | 2010-04-29 |
Wafer Lift Pins Suspended And Supported At Underside Of Susceptor
App 20100101491 - Aida; Koei | 2010-04-29 |
Method For Forming Metal Film By Ald Using Beta-diketone Metal Complex
App 20100092696 - Shinriki; Hiroshi ; et al. | 2010-04-15 |
Purge Step-controlled Sequence Of Processing Semiconductor Wafers
App 20100093181 - Sugiyama; Toru ; et al. | 2010-04-15 |
Impedance Matching Apparatus For Plasma-enhanced Reaction Reactor
App 20100085129 - Shuto; Mitsutoshi ; et al. | 2010-04-08 |
Substrate-supporting device
Grant 7,691,205 - Ikedo April 6, 2 | 2010-04-06 |
Substrate-processing apparatus with buffer mechanism and substrate-transferring apparatus
Grant 7,690,881 - Yamagishi , et al. April 6, 2 | 2010-04-06 |
Atomic Composition Controlled Ruthenium Alloy Film Formed By Plasma-enhanced Atomic Layer Deposition
App 20100055433 - Shinriki; Hiroshi ; et al. | 2010-03-04 |
Semiconductor Manufacturing Apparatus Equipped With Wafer Inspection Device And Inspection Techniques
App 20100049353 - Takizawa; Masahiro ; et al. | 2010-02-25 |
Semiconductor Manufacturing Apparatus
App 20100036517 - TAKIZAWA; MASAHIRO ; et al. | 2010-02-11 |
Method for forming Ta-Ru liner layer for Cu wiring
Grant 7,655,564 - Shinriki , et al. February 2, 2 | 2010-02-02 |
Method of forming silicon-containing insulation film having low dielectric constant and low film stress
Grant 7,655,577 - Hyodo , et al. February 2, 2 | 2010-02-02 |
Method for forming silazane-based dielectric film
Grant 7,651,959 - Fukazawa , et al. January 26, 2 | 2010-01-26 |
Semiconductor Processing Apparatus Having All-round Type Wafer Handling Chamber
App 20100014945 - Takizawa; Masahiro ; et al. | 2010-01-21 |
Exhaust Gas Trap For Semiconductor Processes
App 20100006025 - Furukawahara; Kazunori | 2010-01-14 |
Method Of Forming Fluorine-containing Dielectric Film
App 20100003833 - Tsuji; Naoto ; et al. | 2010-01-07 |
Wafer-positioning Mechanism
App 20100000470 - Sakata; Masanori | 2010-01-07 |
Apparatus and method for forming thin film using surface-treated shower plate
Grant 7,641,761 - Tsuji , et al. January 5, 2 | 2010-01-05 |
Semiconductor processing apparatus with lift pin structure
Grant 7,638,003 - Satoh , et al. December 29, 2 | 2009-12-29 |
Method of forming a carbon polymer film using plasma CVD
Grant 7,638,441 - Morisada , et al. December 29, 2 | 2009-12-29 |
Method of forming ultra-thin SiN film by plasma CVD
Grant 7,638,443 - Tanaka , et al. December 29, 2 | 2009-12-29 |
Method of forming a high transparent carbon film
Grant 7,632,549 - Goundar December 15, 2 | 2009-12-15 |
Method For Designing Shower Plate For Plasma Cvd Apparatus
App 20090299701 - TAKAHASHI; Satoshi | 2009-12-03 |
Apparatus And Method For Improving Production Throughput In Cvd Chamber
App 20090297731 - Goundar; Kamal Kishore | 2009-12-03 |
Device Isolation Technology On Semiconductor Substrate
App 20090298257 - Lee; Woo Jin ; et al. | 2009-12-03 |
Device isolation technology on semiconductor substrate
Grant 7,622,369 - Lee , et al. November 24, 2 | 2009-11-24 |
Semiconductor substrate transfer apparatus and semiconductor substrate processing apparatus equipped with the same
Grant 7,618,226 - Takizawa , et al. November 17, 2 | 2009-11-17 |
Method Of Forming A High Transparent Carbon Film
App 20090274851 - Goundar; Kamal Kishore | 2009-11-05 |
Wafer Processing Apparatus With Wafer Alignment Device
App 20090252580 - Takizawa; Masahiro ; et al. | 2009-10-08 |
Method For Activating Reactive Oxygen Species For Cleaning Carbon-based Film Deposition
App 20090246399 - Goundar; Kamal Kishore ; et al. | 2009-10-01 |
Substrate-supporting Device Having Continuous Concavity
App 20090239385 - Takahashi; Satoshi | 2009-09-24 |
Method for forming porous insulation film
Grant 7,585,789 - Hyodo , et al. September 8, 2 | 2009-09-08 |
Method for forming insulation film
Grant 7,582,575 - Fukazawa , et al. September 1, 2 | 2009-09-01 |
Ruthenium Alloy Film For Copper Interconnects
App 20090209101 - SHINRIKI; Hiroshi ; et al. | 2009-08-20 |
Clamping Mechanism For Semiconductor Device
App 20090200251 - SHIMIZU; Akira ; et al. | 2009-08-13 |
Ignition control of remote plasma unit
Grant 7,571,732 - Takizawa , et al. August 11, 2 | 2009-08-11 |
Method of stabilizing film quality of low-dielectric constant film
Grant 7,560,144 - Fukazawa , et al. July 14, 2 | 2009-07-14 |
Tandem Type Semiconductor-processing Apparatus
App 20090162170 - Yamagishi; Takayuki ; et al. | 2009-06-25 |
METHOD FOR FORMING Ta-Ru LINER LAYER FOR Cu WIRING
App 20090155997 - SHINRIKI; Hiroshi ; et al. | 2009-06-18 |
Shower Plate Electrode For Plasma Cvd Reactor
App 20090155488 - Nakano; Ryu ; et al. | 2009-06-18 |
Method For Forming Dielectric Film Using Siloxane-silazane Mixture
App 20090156017 - FUKAZAWA; Atsuki ; et al. | 2009-06-18 |
METHOD FOR FORMING DIELECTRIC SiOCH FILM HAVING CHEMICAL STABILITY
App 20090148964 - Tsuji; Naoto ; et al. | 2009-06-11 |
Process for depositing low dielectric constant materials
Grant 7,544,827 - Todd June 9, 2 | 2009-06-09 |
Method For Forming Silazane-based Dielectric Film
App 20090142935 - FUKUZAWA; Atsuki ; et al. | 2009-06-04 |
Method Of Plasma Treatment Using Amplitude-modulated Rf Power
App 20090136683 - Fukasawa; Yasushi ; et al. | 2009-05-28 |
Semiconductor-processing apparatus provided with self-cleaning device
Grant 7,534,469 - Satoh , et al. May 19, 2 | 2009-05-19 |
Vacuum System And Method For Operating The Same
App 20090112370 - Tanaka; Hiroyuki ; et al. | 2009-04-30 |
Plasma treatment apparatus
Grant 7,520,244 - Yamagishi , et al. April 21, 2 | 2009-04-21 |
Method For Forming Ultra-thin Boron-containing Nitride Films And Related Apparatus
App 20090098741 - Tanaka; Rei ; et al. | 2009-04-16 |
Method Of Self-cleaning Of Carbon-based Film
App 20090090382 - Morisada; Yoshinori ; et al. | 2009-04-09 |
Position Sensor System For Substrate Transfer Robot
App 20090093906 - TAKIZAWA; MASAHIRO ; et al. | 2009-04-09 |
Semiconductor Manufacturing Apparatus And Method For Curing Material With Uv Light
App 20090093135 - Matsushita; Kiyohiro ; et al. | 2009-04-09 |
Semiconductor Manufacturing Apparatus And Method For Curing Materials With Uv Light
App 20090093134 - Matsushita; Kiyohiro ; et al. | 2009-04-09 |
DC bias voltage measurement circuit and plasma CVD apparatus comprising the same
Grant 7,514,934 - Shuto , et al. April 7, 2 | 2009-04-07 |
METHOD FOR FORMING RUTHENIUM COMPLEX FILM USING Beta-DIKETONE-COORDINATED RUTHENIUM PRECURSOR
App 20090087339 - Shinriki; Hiroshi | 2009-04-02 |
Method of forming a carbon polymer film using plasma CVD
Grant 7,504,344 - Matsuki , et al. March 17, 2 | 2009-03-17 |
Method Of Forming A Carbon Polymer Film Using Plasma Cvd
App 20090068852 - MORISADA; Yoshinori ; et al. | 2009-03-12 |
Method for managing UV irradiation for curing semiconductor substrate
Grant 7,501,292 - Matsushita , et al. March 10, 2 | 2009-03-10 |
Technology Of Detecting Abnormal Operation Of Plasma Process
App 20090061074 - Takizawa; Masahiro ; et al. | 2009-03-05 |
Method And Apparatus For Monitoring Plasma-induced Damage Using Dc Floating Potential Of Substrate
App 20090056627 - SHUTO; Mitsutoshi ; et al. | 2009-03-05 |
Method For Controlling Semiconductor-processing Apparatus
App 20090055013 - TAKIZAWA; Masahiro ; et al. | 2009-02-26 |
Method For Managing Uv Irradiation For Curing Semiconductor Substrate
App 20090023229 - MATSUSHITA; Kiyohiro ; et al. | 2009-01-22 |
Selective formation of metal layers in an integrated circuit
Grant 7,476,618 - Kilpela , et al. January 13, 2 | 2009-01-13 |
Method of forming a carbon polymer film using plasma CVD
Grant 7,470,633 - Matsuki , et al. December 30, 2 | 2008-12-30 |
Method Of Forming Ruthenium Film For Metal Wiring Structure
App 20080318417 - Shinriki; Hiroshi ; et al. | 2008-12-25 |
Semiconductor-manufacturing apparatus equipped with cooling stage and semiconductor-manufacturing method using same
Grant 7,467,916 - Yamagishi , et al. December 23, 2 | 2008-12-23 |
Method For Forming Inorganic Silazane-based Dielectric Film
App 20080305648 - FUKAZAWA; Atsuki ; et al. | 2008-12-11 |
Method For Forming Dielectric Film Using Porogen Gas
App 20080305258 - TSUJI; Naoto | 2008-12-11 |
Single-wafer-processing type CVD apparatus
Grant 7,462,245 - Shimizu , et al. December 9, 2 | 2008-12-09 |
Method For Forming Amorphouse Silicon Film By Plasma Cvd
App 20080299747 - ARAI; Hirofumi ; et al. | 2008-12-04 |
Plasma Cvd Apparatus Having Non-metal Susceptor
App 20080299326 - Fukazawa; Atsuki ; et al. | 2008-12-04 |
Ruthenium thin film-formed structure
Grant 7,435,484 - Shinriki , et al. October 14, 2 | 2008-10-14 |
Uv Light Irradiating Apparatus With Liquid Filter
App 20080230721 - MATSUSHITA; Kiyohiro ; et al. | 2008-09-25 |
Apparatus, precursors and deposition methods for silicon-containing materials
Grant 7,425,350 - Todd September 16, 2 | 2008-09-16 |
Method For Increasing Mechanical Strength Of Dielectric Film By Using Sequential Combination Of Two Types Of Uv Irradiation
App 20080220619 - MATSUSHITA; Kiyohiro ; et al. | 2008-09-11 |
Cluster Type Semiconductor Processing Apparatus
App 20080210165 - TAKIZAWA; Masahiro ; et al. | 2008-09-04 |
Plasma CVD apparatus for forming uniform film
Grant 7,418,921 - Tsuji , et al. September 2, 2 | 2008-09-02 |
Method of forming carbon polymer film using plasma CVD
Grant 7,410,915 - Morisada , et al. August 12, 2 | 2008-08-12 |
Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms
Grant 7,408,225 - Shinriki , et al. August 5, 2 | 2008-08-05 |
Liquid Material Vaporization Apparatus For Semiconductor Processing Apparatus
App 20080173240 - FURUKAWAHARA; Kazunori ; et al. | 2008-07-24 |
Method Of Detecting Occurrence Of Sticking Of Substrate
App 20080148857 - Furukawahara; Kazunori ; et al. | 2008-06-26 |
Dual-chamber plasma processing apparatus
Grant 7,381,291 - Tobe , et al. June 3, 2 | 2008-06-03 |
Method Of Forming Ru Film And Metal Wiring Structure
App 20080124484 - SHINRIKI; Hiroshi ; et al. | 2008-05-29 |
Coated aluminum material for semiconductor manufacturing apparatus
App 20080118412 - Okura; Seiji | 2008-05-22 |
METHOD OF FORMING ULTRA-THIN SiN FILM BY PLASMA CVD
App 20080113521 - Tanaka; Rei ; et al. | 2008-05-15 |
Method of forming interconnection in semiconductor device
Grant 7,354,852 - Matsushita , et al. April 8, 2 | 2008-04-08 |
Method for forming insulation film
Grant 7,354,873 - Fukazawa , et al. April 8, 2 | 2008-04-08 |
Method for forming insulation film having high density
App 20080076266 - Fukazawa; Atsuki ; et al. | 2008-03-27 |
Method Of Cleaning Uv Irradiation Chamber
App 20080066778 - Matsushita; Kiyohiro ; et al. | 2008-03-20 |
Method Of Forming Ruthenium Film For Metal Wiring Structure
App 20080054472 - SHINRIKI; Hiroshi ; et al. | 2008-03-06 |
Substrate-processing apparatus with buffer mechanism and substrate-transferring apparatus
App 20080056854 - Yamagishi; Takayuki ; et al. | 2008-03-06 |
Method of recipe control operation
Grant 7,340,320 - Takizawa , et al. March 4, 2 | 2008-03-04 |
Method For Forming Silicon Carbide Film Containing Oxygen
App 20080038485 - FUKAZAWA; Atsuki ; et al. | 2008-02-14 |
Plasma Cvd Apparatus Equipped With Plasma Blocking Insulation Plate
App 20070266945 - Shuto; Mitsutoshi ; et al. | 2007-11-22 |
Thin Film Formation By Atomic Layer Growth And Chemical Vapor Deposition
App 20070264427 - SHINRIKI; Hiroshi ; et al. | 2007-11-15 |
Method Of Self-cleaning Of Carbon-based Film
App 20070248767 - Okura; Seiji ; et al. | 2007-10-25 |
Ignition control of remote plasma unit
App 20070235060 - Takizawa; Masahiro ; et al. | 2007-10-11 |
Semiconductor Processing With A Remote Plasma Source For Self-cleaning
App 20070227554 - Satoh; Kiyoshi ; et al. | 2007-10-04 |
Semiconductor-processing apparatus provided with susceptor and placing block
Grant 7,276,123 - Shimizu , et al. October 2, 2 | 2007-10-02 |
Method of forming carbon polymer film using plasma CVD
App 20070224833 - Morisada; Yoshinori ; et al. | 2007-09-27 |
Thin-film deposition apparatus
Grant 7,273,526 - Shinriki , et al. September 25, 2 | 2007-09-25 |
Method of forming a carbon polymer film using plasma CVD
App 20070218705 - Matsuki; Nobuo ; et al. | 2007-09-20 |
Semiconductor-processing Apparatus With Rotating Susceptor
App 20070218702 - SHIMIZU; Akira ; et al. | 2007-09-20 |
Semiconductor-processing apparatus with rotating susceptor
App 20070218701 - Shimizu; Akira ; et al. | 2007-09-20 |
Low-carbon-doped silicon oxide film and damascene structure using same
Grant 7,271,093 - Loke , et al. September 18, 2 | 2007-09-18 |
Thin-film deposition apparatus
Grant 7,267,725 - Kawano September 11, 2 | 2007-09-11 |
Semiconductor processing apparatus with lift pin structure
App 20070160507 - Satoh; Kiyoshi ; et al. | 2007-07-12 |
Method For Forming Porous Insulation Film
App 20070161257 - Hyodo; Yasuyoshi ; et al. | 2007-07-12 |
Method of forming silicon carbide films
Grant 7,238,393 - Goundar , et al. July 3, 2 | 2007-07-03 |
Method of cleaning CVD equipment processing chamber
Grant 7,234,476 - Arai , et al. June 26, 2 | 2007-06-26 |
Method of forming organosilicon oxide film and multilayer resist structure
App 20070141273 - Nakano; Ryu | 2007-06-21 |
Semiconductor substrate transfer apparatus and semiconductor substrate processing apparatus equipped with the same
App 20070142962 - Takizawa; Masahiro ; et al. | 2007-06-21 |
Method of forming a thin film by plasma CVD of a silicon-containing source gas
Grant 7,229,935 - Fukazawa , et al. June 12, 2 | 2007-06-12 |
Polymer film and method for producing the same
Grant 7,220,810 - Kunimi , et al. May 22, 2 | 2007-05-22 |
Method Of Forming Silicon-containing Insulation Film Having Low Dielectric Constant And Low Film Stress
App 20070111540 - HYODO; Yasuyoshi ; et al. | 2007-05-17 |
Substrate-supporting device
App 20070089670 - Ikedo; Yozo | 2007-04-26 |
Method for foming metal wiring structure
App 20070082130 - Shinriki; Hiroshi ; et al. | 2007-04-12 |
Method for forming metal wiring structure
App 20070082132 - Shinriki; Hiroshi ; et al. | 2007-04-12 |
Method Of Forming Silicon-containing Insulation Film Having Low Dielectric Constant And Low Film Stress
App 20070066086 - HYODO; Yasuyoshi ; et al. | 2007-03-22 |
Plasma CVD film formation apparatus provided with mask
App 20070065597 - Kaido; Shintaro ; et al. | 2007-03-22 |
Recipe operation using group function and/or subroutine function
App 20070038324 - Takizawa; Masahiro ; et al. | 2007-02-15 |
Plasma CVD apparatus for forming uniform film
App 20070037390 - Tsuji; Naoto ; et al. | 2007-02-15 |
Method for depositing thin film by controlling effective distance between showerhead and susceptor
App 20070032048 - Tsuji; Naoto ; et al. | 2007-02-08 |
Insulation film and method for manufacturing same
App 20070009673 - Fukazawa; Atsuki ; et al. | 2007-01-11 |
Method For Forming Insulation Film
App 20070004204 - Fukazawa; Atsuki ; et al. | 2007-01-04 |
Method of producing advanced low dielectric constant film by UV light emission
App 20060286306 - Ohara; Naoki ; et al. | 2006-12-21 |
Method of forming silicon-containing insulation film having low dielectric constant and low film stress
Grant 7,148,154 - Hyodo , et al. December 12, 2 | 2006-12-12 |
Method for forming silicon-containing insulation film having low dielectric constant treated with electron beam radiation
Grant 7,147,900 - Tsuji , et al. December 12, 2 | 2006-12-12 |
Technology of detecting abnormal operation of plasma process
App 20060275931 - Takizawa; Masahiro ; et al. | 2006-12-07 |
Process for depositing low dielectric constant materials
Grant 7,144,620 - Todd December 5, 2 | 2006-12-05 |
Formation technology for nanoparticle films having low dielectric constant
App 20060269690 - Watanabe; Yukio ; et al. | 2006-11-30 |
Method of forming silicon carbide films
Grant 7,138,332 - Goundar November 21, 2 | 2006-11-21 |
Method for forming insulation film
App 20060258176 - Fukazawa; Atsuki ; et al. | 2006-11-16 |
Method of recipe control operation
App 20060234402 - Takizawa; Masahiro ; et al. | 2006-10-19 |
Semiconductor-processing apparatus provided with self-cleaning device
App 20060228473 - Satoh; Kiyoshi ; et al. | 2006-10-12 |
Input signal analyzing system and control apparatus using same
App 20060218312 - Takizawa; Masahiro ; et al. | 2006-09-28 |
Method of stabilizing film quality of low-dielectric constant film
App 20060216433 - Fukazawa; Atsuki ; et al. | 2006-09-28 |
Semiconductor-manufacturing apparatus equipped with cooling stage and semiconductor-manufacturing method using same
App 20060204356 - Yamagishi; Takayuki ; et al. | 2006-09-14 |
Interlayer insulation film used for multilayer interconnect of semiconductor integrated circuit and method of manufacturing the same
Grant 7,098,129 - Tsuji , et al. August 29, 2 | 2006-08-29 |
Method Of Forming Silicon-containing Insulation Film Having Low Dielectric Constant And Low Diffusion Coefficient
App 20060183341 - Tsuji; Naoto ; et al. | 2006-08-17 |
Two-step formation of etch stop layer
Grant 7,091,133 - Goundar , et al. August 15, 2 | 2006-08-15 |
Semiconductor-manufacturing apparatus provided with ultraviolet light-emitting mechanism and method of treating semiconductor substrate using ultraviolet light emission
App 20060165904 - Ohara; Naoki | 2006-07-27 |
Method of forming interconnection in semiconductor device
App 20060160352 - Matsushita; Kiyohiro ; et al. | 2006-07-20 |
Plasma processing apparatus with insulated gas inlet pore
App 20060137610 - Yoshizaki; Yu ; et al. | 2006-06-29 |
Method for forming low-k hard film
Grant 7,064,088 - Hyodo , et al. June 20, 2 | 2006-06-20 |
Wafer transfer mechanism
App 20060113806 - Tsuji; Naota ; et al. | 2006-06-01 |
Method for forming insulation film
App 20060110931 - Fukazawa; Atsuki ; et al. | 2006-05-25 |
Formation technology of nano-particle films having low dielectric constant
App 20060105583 - Ikeda; Shingo ; et al. | 2006-05-18 |
Gas-introducing system and plasma CVD apparatus
App 20060090700 - Satoh; Kiyoshi ; et al. | 2006-05-04 |
Method of forming fluorine-doped low-dielectric-constant insulating film
Grant 7,037,855 - Tsuji , et al. May 2, 2 | 2006-05-02 |
Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections
Grant 7,021,881 - Yamagishi , et al. April 4, 2 | 2006-04-04 |
DC bias voltage measurement circuit and plasma CVD apparatus comprising the same
App 20060063284 - Shuto; Mitsutoshi ; et al. | 2006-03-23 |
Gas-shield electron-beam gun for thin-film curing application
Grant 7,012,268 - Matsuki , et al. March 14, 2 | 2006-03-14 |
Method Of Forming Fluorine-doped Low-dielectric-constant Insulating Film
App 20060046519 - Tsuji; Naoto ; et al. | 2006-03-02 |
Dual-chamber plasma processing apparatus
App 20060021701 - Tobe; Yasuhiro ; et al. | 2006-02-02 |
Method of forming a fine pattern using a silicon-oxide-based film, semiconductor device with a silicon-oxide-based film and method of manufacture thereof
Grant 6,992,013 - Okabe , et al. January 31, 2 | 2006-01-31 |
Method of manufacturing silicon carbide film
Grant 6,991,959 - Goundar , et al. January 31, 2 | 2006-01-31 |
Low-carbon-doped silicon oxide film and damascene structure using same
App 20050260850 - Loke, Chou San Nelson ; et al. | 2005-11-24 |
Thin-film deposition apparatus
App 20050229848 - Shinriki, Hiroshi ; et al. | 2005-10-20 |
Semiconductor-processing reaction chamber
Grant 6,955,741 - Yamagishi October 18, 2 | 2005-10-18 |
Method for manufacturing semiconductor device having porous structure with air-gaps
Grant 6,949,456 - Kumar September 27, 2 | 2005-09-27 |
Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms
App 20050208217 - Shinriki, Hiroshi ; et al. | 2005-09-22 |
Semiconductor manufacturing equipment and maintenance method
Grant 6,945,746 - Yamagishi , et al. September 20, 2 | 2005-09-20 |
Shower plate having projections and plasma CVD apparatus using same
App 20050183666 - Tsuji, Naoto ; et al. | 2005-08-25 |
Semiconductor device having porous structure
App 20050179135 - Kumar, Devendra | 2005-08-18 |
System and method of CVD chamber cleaning
App 20050178333 - Loke, Chou San Nelson ; et al. | 2005-08-18 |
Method of film deposition using single-wafer-processing type CVD
Grant 6,921,556 - Shimizu , et al. July 26, 2 | 2005-07-26 |
Apparatus and method for forming thin film using surface-treated shower plate
App 20050156063 - Tsuji, Naoto ; et al. | 2005-07-21 |
Method of manufacturing silicon carbide film
Grant 6,919,270 - Satoh , et al. July 19, 2 | 2005-07-19 |
Method for semiconductor wafer etching
Grant 6,914,208 - Shimizu , et al. July 5, 2 | 2005-07-05 |
Thin-film forming apparatus having an automatic cleaning function for cleaning the inside
App 20050139578 - Fukuda, Hideaki ; et al. | 2005-06-30 |
Method of forming interlayer insulation film
Grant 6,905,978 - Tsuji , et al. June 14, 2 | 2005-06-14 |
Low-k dielectric materials and processes
Grant 6,905,981 - Todd , et al. June 14, 2 | 2005-06-14 |
Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections
Grant 6,899,507 - Yamagishi , et al. May 31, 2 | 2005-05-31 |
Apparatus for single-wafer-processing type CVD
App 20050098111 - Shimizu, Akira ; et al. | 2005-05-12 |
Source gas flow control and CVD using same
App 20050098906 - Satoh, Kiyoshi ; et al. | 2005-05-12 |
Insulation film on semiconductor substrate and method for forming same
Grant 6,881,683 - Matsuki , et al. April 19, 2 | 2005-04-19 |
Method of forming thin film
App 20050048797 - Fukazawa, Atsuki ; et al. | 2005-03-03 |
Semiconductor-manufacturing device having buffer mechanism and method for buffering semiconductor wafers
Grant 6,860,711 - Yamagishi March 1, 2 | 2005-03-01 |
Method of forming silicon-containing insulation film having low dielectric constant and low film stress
App 20050042884 - Hyodo, Yasuyoshi ; et al. | 2005-02-24 |
Semiconductor substrate supporting apparatus
App 20050037626 - Shuto, Mitsutoshi ; et al. | 2005-02-17 |
Method and apparatus for forming silicon-containing insulation film having low dielectric constant
App 20050034667 - Tsuji, Naoto ; et al. | 2005-02-17 |
Insulation film on semiconductor substrate and method for forming same
Grant 6,852,650 - Matsuki , et al. February 8, 2 | 2005-02-08 |
Semiconductor-processing apparatus provided with susceptor and placing block
App 20050022737 - Shimizu, Akira ; et al. | 2005-02-03 |
Method of forming low-k films
Grant 6,849,561 - Goundar February 1, 2 | 2005-02-01 |
Apparatus and method for forming low dielectric constant film
Grant 6,830,007 - Matsuki , et al. December 14, 2 | 2004-12-14 |
CVD of porous dielectric materials
Grant 6,825,130 - Todd November 30, 2 | 2004-11-30 |
Gas-shield electron-beam gun for thin-film curing application
App 20040232355 - Matsuki, Nobuo ; et al. | 2004-11-25 |
Method of forming silicon-containing insulation film having low dielectric constant and high mechanical strength
Grant 6,818,570 - Tsuji , et al. November 16, 2 | 2004-11-16 |
Thin-film deposition apparatus
App 20040221808 - Kawano, Baiei | 2004-11-11 |
Method for forming integrated dielectric layers
Grant 6,815,332 - San , et al. November 9, 2 | 2004-11-09 |
Plasma treatment apparatus
App 20040194709 - Yamagishi, Takayuki ; et al. | 2004-10-07 |
Insulation film on semiconductor substrate and method for forming same
Grant 6,784,123 - Matsuki , et al. August 31, 2 | 2004-08-31 |
Method of cleaning a CVD reaction chamber using an active oxygen species
Grant 6,767,836 - San , et al. July 27, 2 | 2004-07-27 |
Apparatus and method for semiconductor wafer etching
Grant 6,764,572 - Shimizu , et al. July 20, 2 | 2004-07-20 |
Semiconductor substrate-supporting apparatus
Grant 6,761,771 - Satoh , et al. July 13, 2 | 2004-07-13 |
Method for forming low dielectric constant interlayer insulation film
Grant 6,759,344 - Matsuki , et al. July 6, 2 | 2004-07-06 |
Method of manufacturing silicon carbide film
App 20040115876 - Goundar, Kamal Kishore ; et al. | 2004-06-17 |
Method for semiconductor wafer etching
App 20040105671 - Shimizu, Akira ; et al. | 2004-06-03 |
Sealing mechanism of multi-chamber load-locking device
Grant 6,743,329 - Kyogoku , et al. June 1, 2 | 2004-06-01 |
Method of forming low-dielectric constant film on semiconductor substrate by plasma reaction using high-RF power
Grant 6,740,602 - Hendriks , et al. May 25, 2 | 2004-05-25 |
Plasma CVD film-forming device
Grant 6,740,367 - Matsuki , et al. May 25, 2 | 2004-05-25 |
Method for manufacturing a semiconductor device
Grant 6,737,357 - Shimizu , et al. May 18, 2 | 2004-05-18 |
Method of forming low dielectric constant insulation film for semiconductor device
Grant 6,737,366 - Matsuki May 18, 2 | 2004-05-18 |
Semiconductor-processing device provided with a remote plasma source for self-cleaning
Grant 6,736,147 - Satoh , et al. May 18, 2 | 2004-05-18 |
Processes for depositing low dielectric constant materials
Grant 6,733,830 - Todd May 11, 2 | 2004-05-11 |
Method for forming integrated dielectric layers
App 20040087179 - San, Nelson Loke Chou ; et al. | 2004-05-06 |
Method for manufacturing semiconductor device having porous structure with air-gaps
App 20040087133 - Kumar, Devendra | 2004-05-06 |
Method of manufacturing silicon carbide film
App 20040076767 - Satoh, Kiyoshi ; et al. | 2004-04-22 |
Apparatus and method for single-wafer-processing type CVD
App 20040071874 - Shimizu, Akira ; et al. | 2004-04-15 |
Interlayer insulation film used for multilayer interconnect of semiconductor integrated circuit and method of manufacturing the same
App 20040048490 - Tsuji, Naoto ; et al. | 2004-03-11 |
Method for forming low-k hard film
App 20040038514 - Hyodo, Yasuyoshi ; et al. | 2004-02-26 |
Gas-line system for semiconductor-manufacturing apparatus
Grant 6,662,817 - Yamagishi , et al. December 16, 2 | 2003-12-16 |
Insulation film on semiconductor substrate and method for forming same
App 20030224622 - Matsuki, Nobuo ; et al. | 2003-12-04 |
Silicone polymer insulation film on semiconductor substrate
Grant 6,653,719 - Matsuki November 25, 2 | 2003-11-25 |
Method for manufacturing a semiconductor device
Grant 6,645,873 - Shimizu , et al. November 11, 2 | 2003-11-11 |
Plasma CVD apparatus comprising susceptor with ring
App 20030192478 - Tsuji, Naoto ; et al. | 2003-10-16 |
Plasma CVD film-forming device
Grant 6,631,692 - Matsuki , et al. October 14, 2 | 2003-10-14 |
CVD syntheses of silicon nitride materials
Grant 6,630,413 - Todd October 7, 2 | 2003-10-07 |
Semiconductor processing module and apparatus
Grant 6,630,053 - Yamagishi , et al. October 7, 2 | 2003-10-07 |
Method of forming interlayer insulation film
App 20030181069 - Tsuji, Naoto ; et al. | 2003-09-25 |
Insulation film on semiconductor substrate and method for forming same
App 20030162408 - Matsuki, Nobuo ; et al. | 2003-08-28 |
Apparatus for forming thin film on semiconductor substrate by plasma reaction
Grant 6,602,800 - Matsuki August 5, 2 | 2003-08-05 |
Method for forming low dielectric constant interlayer insulation film
App 20030143867 - Matsuki, Nobuo ; et al. | 2003-07-31 |
Method of forming fine pattern
Grant 6,586,163 - Okabe , et al. July 1, 2 | 2003-07-01 |
Plasma CVD apparatus conducting self-cleaning and method of self-cleaning
App 20030097987 - Fukuda, Hideaki | 2003-05-29 |
Siloxan polymer film on semiconductor substrate
Grant 6,559,520 - Matsuki , et al. May 6, 2 | 2003-05-06 |
Apparatus and method for forming low dielectric constant film
Grant 6,537,928 - Matsuki , et al. March 25, 2 | 2003-03-25 |
Silicone polymer insulation film on semiconductor substrate
App 20030054666 - Matsuki, Nobuo | 2003-03-20 |
Method of forming thin film onto semiconductor substrate
Grant 6,524,955 - Fukuda , et al. February 25, 2 | 2003-02-25 |
Siloxan polymer film on semiconductor substrate and method for forming same
Grant 6,514,880 - Matsuki , et al. February 4, 2 | 2003-02-04 |
Semiconductor-manufacturing device having buffer mechanism and method for buffering semiconductor wafers
App 20030021657 - Yamagishi, Takayuki | 2003-01-30 |
Semiconductor-manufacturing device
Grant 6,488,775 - Shimizu , et al. December 3, 2 | 2002-12-03 |
Siloxan polymer film on semiconductor substrate
App 20020160626 - Matsuki, Nobuo ; et al. | 2002-10-31 |
Fluorine-containing materials and processes
Grant 6,458,718 - Todd October 1, 2 | 2002-10-01 |
Silicone polymer insulation film on semiconductor substrate and method for forming the film
Grant 6,455,445 - Matsuki September 24, 2 | 2002-09-24 |
Semiconductor processing apparatus with substrate-supporting mechanism
Grant 6,435,798 - Satoh August 20, 2 | 2002-08-20 |
Silicone polymer insulation film on semiconductor substrate and method for forming the film
Grant 6,432,846 - Matsuki August 13, 2 | 2002-08-13 |
Method for producing silicon nitride series film
Grant 6,413,887 - Fukuda , et al. July 2, 2 | 2002-07-02 |
Method for forming film with low dielectric constant on semiconductor substrate
Grant 6,410,463 - Matsuki June 25, 2 | 2002-06-25 |
Silicone polymer insulation film on semiconductor substrate and method for forming the film
Grant 6,383,955 - Matsuki , et al. May 7, 2 | 2002-05-07 |
Method of forming on a semiconductor substrate a capacitor electrode having hemispherical grains
Grant 6,362,044 - Shimizu , et al. March 26, 2 | 2002-03-26 |
Silicone polymer insulation film on semiconductor substrate and method for forming the film
Grant 6,352,945 - Matsuki , et al. March 5, 2 | 2002-03-05 |
Wafer transfer mechanism
Grant 6,305,898 - Yamagishi , et al. October 23, 2 | 2001-10-23 |
Apparatus and method for forming thin film
Grant 6,235,112 - Satoh May 22, 2 | 2001-05-22 |
Substrate holding apparatus for processing semiconductors
Grant 6,193,803 - Sato , et al. February 27, 2 | 2001-02-27 |
Method of forming film on semiconductor substrate in film-forming apparatus
Grant 6,187,691 - Fukuda , et al. February 13, 2 | 2001-02-13 |
Substrate holding apparatus for processing semiconductor
Grant 6,159,301 - Sato , et al. December 12, 2 | 2000-12-12 |
Method of manufacturing fluorine-containing silicon oxide films for semiconductor device
Grant 6,149,976 - Matsuki , et al. November 21, 2 | 2000-11-21 |
Semiconductor processing system
Grant 6,120,605 - Sato September 19, 2 | 2000-09-19 |
Substrate-supporting device for semiconductor processing
Grant 6,113,704 - Satoh , et al. September 5, 2 | 2000-09-05 |
Susceptor for plasma CVD equipment and process for producing the same
Grant 6,063,203 - Satoh May 16, 2 | 2000-05-16 |
Device and method for load locking for semiconductor processing
Grant 6,053,686 - Kyogoku April 25, 2 | 2000-04-25 |
Vapor selective etching method and apparatus
Grant 6,024,888 - Watanabe , et al. February 15, 2 | 2000-02-15 |
Coaxial resonant multi-port microwave applicator for an ECR plasma source
Grant 5,975,014 - Dandl November 2, 1 | 1999-11-02 |
Semiconductor processing apparatus
Grant 5,976,312 - Shimizu , et al. November 2, 1 | 1999-11-02 |
Method for manufacturing SiOF films
Grant 5,935,649 - Koizumi , et al. August 10, 1 | 1999-08-10 |
HF vapor selective etching method and apparatus
Grant 5,658,417 - Watanabe , et al. August 19, 1 | 1997-08-19 |
Load lock chamber for vertical type heat treatment apparatus
Grant 5,571,330 - Kyogoku November 5, 1 | 1996-11-05 |
Substrate supporting apparatus for a CVD apparatus
Grant 5,192,371 - Shuto , et al. March 9, 1 | 1993-03-09 |
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