loadpatents
name:-0.021333932876587
name:-0.012072086334229
name:-0.00050997734069824
Annapragada; Rao Patent Filings

Annapragada; Rao

Patent Applications and Registrations

Patent applications and USPTO patent grants for Annapragada; Rao.The latest application filed is for "method to minimize mtj sidewall damage and bottom electrode redeposition using ibe trimming".

Company Profile
0.10.14
  • Annapragada; Rao - Union City CA
  • Annapragada; Rao - San Jose CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method to minimize MTJ sidewall damage and bottom electrode redeposition using IBE trimming
Grant 9,660,177 - Annapragada , et al. May 23, 2
2017-05-23
Method to Minimize MTJ Sidewall Damage and Bottom Electrode Redeposition Using IBE Trimming
App 20170069834 - Annapragada; Rao ;   et al.
2017-03-09
Methods and apparatus for monitoring a process in a plasma processing system by measuring self-bias voltage
Grant 7,323,116 - Guiney , et al. January 29, 2
2008-01-29
Nitrous oxide stripping process for organosilicate glass
Grant 7,202,177 - Zhu , et al. April 10, 2
2007-04-10
Selective oxygen-free etching process for barrier materials
Grant 7,129,171 - Zhu , et al. October 31, 2
2006-10-31
Method of preventing damage to porous low-K materials during resist stripping
App 20060240661 - Annapragada; Rao ;   et al.
2006-10-26
Method of preventing damage to porous low-k materials during resist stripping
Grant 7,081,407 - Annapragada , et al. July 25, 2
2006-07-25
Methods and apparatus for monitoring a process in a plasma processing system by measuring impedance
App 20060065631 - Cheng; Chia-Cheng ;   et al.
2006-03-30
Methods and apparatus for monitoring a process in a plasma processing system by measuring self-bias voltage
App 20060065623 - Guiney; Timothy J. ;   et al.
2006-03-30
Methods and apparatus for monitoring a process in a plasma processing system by measuring a plasma frequency
App 20060065632 - Cheng; Chia-Cheng ;   et al.
2006-03-30
Etch back process using nitrous oxide
Grant 6,916,697 - Zhu , et al. July 12, 2
2005-07-12
Method of preventing damage to porous low-k materials during resist stripping
App 20050130435 - Annapragada, Rao ;   et al.
2005-06-16
Minimizing the loss of barrier materials during photoresist stripping
App 20050101135 - Annapragada, Rao ;   et al.
2005-05-12
Etch Back Process Using Nitrous Oxide
App 20050079704 - Zhu, Helen ;   et al.
2005-04-14
Selective oxygen-free etching process for barrier materials
App 20050079725 - Zhu, Helen ;   et al.
2005-04-14
Nitrous oxide stripping process for organosilicate glass
App 20050079710 - Zhu, Helen ;   et al.
2005-04-14
Process for etching vias in organosilicate glass materials without causing RIE lag
Grant 6,828,250 - Annapragada , et al. December 7, 2
2004-12-07
Method of etching with NH3 and fluorine chemistries
App 20040211517 - Annapragada, Rao ;   et al.
2004-10-28
Plasma etching of organic antireflective coating
Grant 6,630,407 - Keil , et al. October 7, 2
2003-10-07
Plasma etching of organic antireflective coating
App 20020173160 - Keil, Douglas ;   et al.
2002-11-21
Method of etching with NH3 and fluorine chemistries
App 20020121500 - Annapragada, Rao ;   et al.
2002-09-05
Combined resist strip and barrier etch process for dual damascene structures
App 20020119664 - Annapragada, Rao ;   et al.
2002-08-29
Method of preventing damage to organo-silicate-glass materials during resist stripping
Grant 6,413,877 - Annapragada July 2, 2
2002-07-02
Method for reducing the capacitance between interconnects by forming voids in dielectric material
Grant 6,387,797 - Bothra , et al. May 14, 2
2002-05-14

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed