Anai; Noriyuki
Patent Applications and Registrations
Patent applications and USPTO patent grants for Anai; Noriyuki.The latest application filed is for "substrate treating method".
- Anai; Noriyuki - Kumamoto-ken JP
- Anai; Noriyuki - Kumamoto JP
- Anai; Noriyuki - Koshimachi JP
| Patent | Date |
|---|---|
| Coating method and apparatus for semiconductor process Grant 6,749,688 - Tateyama , et al. June 15, 2 | 2004-06-15 |
| Coating apparatus and coating method Grant 6,635,113 - Takamori , et al. October 21, 2 | 2003-10-21 |
| Substrate treating method App 20020187423 - Takamori, Hideyuki ; et al. | 2002-12-12 |
| Coating Apparatus And Coating Method App 20020152954 - TAKAMORI, HIDEYUKI ; et al. | 2002-10-24 |
| Film forming apparatus Grant 6,458,208 - Anai , et al. October 1, 2 | 2002-10-01 |
| Substrate process method and substrate process apparatus Grant 6,443,641 - Takamori , et al. September 3, 2 | 2002-09-03 |
| Coating Method And Apparatus For Semiconductor Process App 20020110640 - TATEYAMA, KIYOHISA ; et al. | 2002-08-15 |
| Substrate Treating Method App 20010049070 - TAKAMORI, HIDEYUKI ; et al. | 2001-12-06 |
| Coating and developing method and apparatus therefor App 20010041311 - Araki, Shinichiro ; et al. | 2001-11-15 |
| Substrate process method and substrate process apparatus App 20010031147 - Takamori, Hideyuki ; et al. | 2001-10-18 |
| Substrate process method and substrate process apparatus App 20010026691 - Takamori, Hideyuki ; et al. | 2001-10-04 |
| Coating and developing apparatus Grant 6,270,576 - Araki , et al. August 7, 2 | 2001-08-07 |
| Substrate process method and substrate process apparatus Grant 6,261,007 - Takamori , et al. July 17, 2 | 2001-07-17 |
| Film forming method Grant 6,165,552 - Anai , et al. December 26, 2 | 2000-12-26 |
| Apparatus for removing coated film from peripheral portion of substrate Grant 6,079,428 - Anai June 27, 2 | 2000-06-27 |
| Coating method and apparatus for semiconductor process Grant 5,919,520 - Tateyama , et al. July 6, 1 | 1999-07-06 |
| Washing apparatus, and washing method Grant 5,887,604 - Murakami , et al. March 30, 1 | 1999-03-30 |
| Apparatus for coating resist on substrate Grant 5,688,322 - Motoda , et al. November 18, 1 | 1997-11-18 |
| Hydrophobic treatment method involving delivery of a liquid process agent to a process space Grant 5,681,614 - Omori , et al. October 28, 1 | 1997-10-28 |
| Washing apparatus, and washing method Grant 5,671,764 - Murakami , et al. September 30, 1 | 1997-09-30 |
| Method for scrubbing and cleaning substrate Grant 5,518,552 - Tanoue , et al. May 21, 1 | 1996-05-21 |
| Hydrophobic processing apparatus including a liquid delivery system Grant 5,505,781 - Omori , et al. April 9, 1 | 1996-04-09 |
| Washing apparatus, and washing method Grant 5,488,964 - Murakami , et al. February 6, 1 | 1996-02-06 |
| Device and method for scrubbing and cleaning substrate Grant 5,345,639 - Tanoue , et al. September 13, 1 | 1994-09-13 |
| Coating apparatus and method for applying a liquid to a semiconductor wafer including selecting a nozzle on a stand by state Grant 5,089,305 - Ushijima , et al. February 18, 1 | 1992-02-18 |
| Resist process apparatus Grant 5,061,144 - Akimoto , et al. October 29, 1 | 1991-10-29 |
| Exposure apparatus Grant 5,028,955 - Hayashida , et al. July 2, 1 | 1991-07-02 |
| Coating apparatus and method for applying a liquid to a semiconductor wafer, including selecting a nozzle in a stand-by state Grant 5,002,008 - Ushijima , et al. March 26, 1 | 1991-03-26 |
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