loadpatents
Patent applications and USPTO patent grants for Ahn; Yong Soo.The latest application filed is for "method of forming double gate dielectric layers and semiconductor device having the same".
Patent | Date |
---|---|
Method Of Forming Double Gate Dielectric Layers And Semiconductor Device Having The Same App 20080197427 - Ahn; Yong Soo | 2008-08-21 |
Method of forming double gate dielectric layers and semiconductor device having the same Grant 7,378,319 - Ahn May 27, 2 | 2008-05-27 |
Rapid Preparation Process Of Aerogel App 20080081014 - AHN; Yong-Soo ;   et al. | 2008-04-03 |
Method for forming metallic interconnects in semiconductor devices Grant 7,202,157 - Ahn April 10, 2 | 2007-04-10 |
Capacitor Of A Semiconductor Device App 20070075395 - Ahn; Yong-Soo | 2007-04-05 |
Method of forming double gate dielectric layers and semiconductor device having the same App 20060138571 - Ahn; Yong Soo | 2006-06-29 |
Method for fabricating metal interconnect in semiconductor device App 20050142844 - Ahn, Yong Soo | 2005-06-30 |
Method for forming metallic interconnects in semiconductor devices App 20050142843 - Ahn, Yong Soo | 2005-06-30 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.