MADURA

ASM IP Holding B.V.

Application Filed: 2023-09-21
Trademark Application Details
Trademark Logo MADURA
630
Live/Pending
NEW APPLICATION - RECORD INITIALIZED NOT ASSIGNED TO EXAMINER
Research OneLook Acronym Finder
Serial Number98190488
Mark Drawing Code4000: Illustration: Drawing with word(s)/letter(s)/number(s) in Block form
Attorney NameHeather Smith-Carra
Attorney Docket Number079559.00011

Timeline

2023-09-21Application Filed
2023-09-25Location: NEW APPLICATION PROCESSING
2023-09-25Status: Live/Pending
2023-09-25Transaction Date

Trademark Applicants & Owners

Owner: ASM IP Holding B.V.
Entity Statementprivate limited liability company
AddressVersterkerstraat 8 Almere NL NL-1322AP
Legal Entity Type
Legal Entity State NL

Documents

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Attorney of Record

HEATHER SMITH-CARRA
BANNER WITCOFF, LTD.
1100 13TH STREET, NW
SUITE 1200
WASHINGTON, DC 20005

Good, Services, and Codes

International Codes:7
U.S. Codes:013,019,021,023,024,031,034,035
International Codes:9
U.S. Codes:021,023,026,036,038
Type CodeType
GS0091Electrical reactors for processing semiconductor wafers; reactors for processing semiconductor wafers, namely, chemical reactors for the thermal treatment of semiconductor wafers and reactors for chemical vapor deposition; electronic controllers for the semiconductor industry; electronic control systems for semiconductor manufacturing machines; laboratory chemical reactors; robots being electronic control devices, namely, laboratory robots; electronic control systems for machines; semiconductor wafer processing equipment, namely, plasma-enhanced deposition reactors; electronically operated apparatus for the manufacture of semiconductors and for the deposition of thin films on semiconductor wafers by plasma-enhanced deposition; semiconductor wafer processing reactors for the chemical treatment and the thermal treatment of semiconductor wafers and for the chemical cleaning of semiconductor wafers by means of a gas phase process; semiconductor wafer processing reactors for the chemical treatment and the thermal treatment of semiconductor wafers and for the chemical cleaning of semiconductor wafers by means of a gas phase process, also with the use of plasma, namely, gas discharge; and structural parts and fittings for the aforementioned goods

Trademark Filing History

DescriptionDateEvent Coding
NEW APPLICATION ENTERED2023-09-251 NWAP I:Incoming Correspondence
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED2023-10-082 NWOS I:Incoming Correspondence
ASSIGNED TO EXAMINER2024-05-143 DOCK D:Assigned to Examiner
EXAMINERS AMENDMENT -WRITTEN2024-05-164 CNEA R:Renewal
EXAMINERS AMENDMENT E-MAILED2024-05-165 GNEA F:First Action
NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED2024-05-166 GNEN O:Outgoing Correspondence
EXAMINER'S AMENDMENT ENTERED2024-05-167 XAEC I:Incoming Correspondence
NON-FINAL ACTION WRITTEN2024-05-168 CNRT R:Renewal
NON-FINAL ACTION E-MAILED2024-05-169 GNRT F:First Action
NOTIFICATION OF NON-FINAL ACTION E-MAILED2024-05-1610 GNRN O:Outgoing Correspondence
TEAS RESPONSE TO OFFICE ACTION RECEIVED2024-05-2311 TROA I:Incoming Correspondence
CORRESPONDENCE RECEIVED IN LAW OFFICE2024-05-2312 CRFA I:Incoming Correspondence
TEAS/EMAIL CORRESPONDENCE ENTERED2024-05-2313 TEME I:Incoming Correspondence
APPROVED FOR PUB - PRINCIPAL REGISTER2024-06-3014 CNSA P:
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED2024-07-1715 NONP E:E-Mail

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