CATALYST
Applied Materials, Inc.
Mark For: CATALYST® trademark registration is intended to cover the categories of
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| Serial Number | 97720478 |
| Registration Number | 1729717 |
| Mark Literal Elements | CATALYST |
| Mark Drawing Type | 4 - STANDARD CHARACTER MARK |
| Mark Type | TRADEMARK |
| Register | PRINCIPAL |
| Current Location | INTENT TO USE SECTION 2023-12-05 |
| Basis | 1(b) |
| Class Status | ACTIVE |
| Primary US Classes |
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| Primary International Class |
|
| Filed Use | No |
| Current Use | No |
| Intent To Use | Yes |
| Filed ITU | Yes |
| 44D Filed | No |
| 44E Current | No |
| 66A Current | No |
| Current Basis | No |
| No Basis | No |
| Attorney Name | Charles P. Guarino |
| Attorney Docket Number | 81774433US |
Timeline
| 2022-12-16 | Application Filed |
| 2022-12-20 | Location: NEW APPLICATION PROCESSING |
| 2022-12-20 | Status: Live/Pending |
| 2022-12-20 | Transaction Date |
| 2023-10-10 | Published |
| 2023-12-05 | Location: INTENT TO USE SECTION |
| 2023-12-05 | Status: Notice of Allowance (NOA) sent (issued) to the applicant. Applicant must file a Statement of Use or Extension Request within six |
Trademark Parties (Applicants & Owners)
| Party: |  Applied Materials, Inc. |
| Address | 3050 Bowers Avenue Santa Clara, CALIFORNIA UNITED STATES 95054 |
| Legal Entity Type | Corporation |
| Legal Entity State | DELAWARE |
Documents
 Application | 2022-12-16 | |
| Drawing | 2022-12-16 | |
| XSearch Search Summary | 2023-09-05 | |
| TRAM Snapshot of App at Pub for Oppostn | 2023-09-06 | |
| Notice of Publication | 2023-09-20 | |
| Notification Of Notice of Publication | 2023-09-20 | |
| OG Publication Confirmation | 2023-10-10 | |
| Notice of Allowance | 2023-12-05 |
Attorney of Record
Good, Services, and Codes
IC 007. US 013 019 021 023 024 031 034 035. G & S: Semiconductor wafer processing equipment, namely, hardware to control and modify polishing pad surface temperature while removing films and materials from wafers during semiconductor manufacture
IC 009. US 021 023 026 036 038. G & S: Recorded software to control and modify polishing pad surface temperature while removing films and materials from wafers during semiconductor manufacture
| International Codes: | 7 |
| U.S. Codes: | 013,019,021,023,024,031,034,035 |
| International Codes: | 9 |
| U.S. Codes: | 021,023,026,036,038 |
| Type Code | Type |
|---|---|
| GS0091 | Recorded software to control and modify polishing pad surface temperature while removing films and materials from wafers during semiconductor manufacture |
Trademark Filing History
| Description | Date | Proceeding Number |
|---|---|---|
| NOA E-MAILED - SOU REQUIRED FROM APPLICANT | 2023-12-05 | |
| PUBLISHED FOR OPPOSITION | 2023-10-10 | |
| OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | 2023-10-10 | |
| NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED | 2023-09-20 | |
| APPROVED FOR PUB - PRINCIPAL REGISTER | 2023-09-05 | |
| ASSIGNED TO EXAMINER | 2023-09-04 | |
| NEW APPLICATION OFFICE SUPPLIED DATA ENTERED | 2023-01-12 | |
| NEW APPLICATION ENTERED IN TRAM | 2022-12-20 | |
| NEW APPLICATION ENTERED | 2022-12-20 |
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