Mark For: DAS™ trademark registration is intended to cover the categories of
Research | OneLook Acronym Finder |
Serial Number | 97226807 |
Mark Literal Elements | DAS |
Mark Drawing Type | 4 - STANDARD CHARACTER MARK |
Mark Type | Trademark |
Current Location | NEW APPLICATION PROCESSING 2022-01-22 |
Basis | 1(b) 44(d) |
Class Status | ACTIVE |
Primary US Classes |
|
Primary International Class |
|
Filed Use | No |
Current Use | No |
Intent To Use | Yes |
Filed ITU | Yes |
44D Filed | Yes |
44E Current | No |
66A Current | No |
Current Basis | No |
No Basis | No |
Domestic Representative | Simor L. Moskowitz |
Attorney Name | Simor L. Moskowitz |
Attorney Docket Number | TM220003US00 |
2022-01-19 | Application Filed |
2022-01-22 | Location: NEW APPLICATION PROCESSING |
2022-01-22 | Status: Live/Pending |
2022-01-22 | Status: New application will be assigned to an examining attorney approximately 6 months after filing date. |
2022-01-22 | Transaction Date |
Party: | PSK, Inc. |
Address | 48, Samsung 1-ro 4-gil, Hwaseong-si, Gyeonggi-do KOREA, REPUBLIC OF 18449 |
Legal Entity Type | Corporation |
Legal Entity State | KOREA, REPUBLIC OF |
Application | APPLICATION/XML,IMAGE/JPEG | 2022-01-19 |
Drawing | IMAGE/JPEG | 2022-01-19 |
International Codes: | 7 |
U.S. Codes: | 013,019,021,023,024,031,034,035 |
Type Code | Type |
---|---|
GS0071 | Semiconductor processing machines; semiconductor wafer processing equipment; machines for manufacturing semiconductors; apparatus for manufacturing semiconductors; marking apparatus for manufacturing semiconductors; sputtering apparatus for semiconductor processing machines; laser marking machines for semiconductor lead frame; semiconductor washing equipment; semi-conductor substrates manufacturing machines; vacuum chambers for processing semiconductor substances; chamber for testing semiconductor elements; etching apparatus for substrates; manufacturing apparatus substrates; processing apparatus for substrates; etching apparatus for semiconductor wafer; strip apparatus for semiconductor wafer; ashing apparatus for semiconductor wafer; processing apparatus for semiconductor wafer; processing apparatus for semiconductors |
GS0071 | Semiconductor processing machines; semiconductor wafer processing equipment; machines for manufacturing semiconductors; apparatus for manufacturing semiconductors; marking apparatus for manufacturing semiconductors, namely, laser machines for marking semiconductors; Machines for manufacturing semiconductors, namely, sputtering apparatus for semiconductor processing machines; laser marking machines for semiconductor lead frame; semiconductor washing equipment, namely, semiconductor washing machines; semiconductor substrates manufacturing machines; vacuum chambers used in manufacturing semiconductor substrates, namely, for processing semiconductor substances; etching apparatus for use in manufacturing semiconductor substrates; manufacturing apparatus for substrates, namely, semiconductor substrates manufacturing machines; processing apparatus for substrates, namely, semiconductor substrates manufacturing machines; etching apparatus for use in manufacturing semiconductor wafers; ashing apparatus for use in the manufacture of semiconductor wafers; processing apparatus for semiconductor wafer, namely, semiconductor wafer processing equipment; processing machine apparatus for semiconductors |
Description | Date | Proceeding Number |
---|---|---|
NEW APPLICATION ENTERED IN TRAM | 2022-01-22 |
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