ZEPHYR

Mark For: ZEPHYR® trademark registration is intended to cover the categories of semiconductor wafer processing equipment and semiconductor wafer processing equipment components, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers, and monitoring equipment, all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers; process recipes used in connection with semiconductor wafer processing equipment, consisting of sets of parameters to form, create, remove, treat, measure, or modify a single layer or material, or a sequence of layers or materials. [all]

Status

2020-05-16 UTC
⟳ Refresh

LIVE APPLICATION Awaiting Examination

Research	OneLook Acronym Finder
Serial Number	88913877
Registration Number	7037476
Mark Literal Elements	ZEPHYR
Mark Drawing Type	4 - STANDARD CHARACTER MARK
Mark Type	TRADEMARK
Register	PRINCIPAL
Current Location	NEW APPLICATION PROCESSING 2020-05-16
Basis	1(b)
Class Status	ACTIVE
Primary US Classes	013: Hardware, Plumbing and Steamfitting Supplies 019: Vehicles 021: Electrical Apparatus, Machines and Supplies 023: Cutlery, Machinery, Tools and Parts Thereof 031: Filters and Refrigerators 034: Heating, Lighting and Ventilating Apparatus 035: Belting, Hose, Machinery Packing and Non-Metallic Tires
Primary International Class	007 - Primary Class (Machinery) Machines and machine tools; motors and engines (except for land vehicles); machine coupling and transmission components (except for land vehicles); agricultural implements other than hand-operated; incubators for eggs.
Filed Use	No
Current Use	No
Intent To Use	Yes
Filed ITU	Yes
44D Filed	No
44E Current	No
66A Current	No
Current Basis	No
No Basis	No
Attorney Name	Charles P. Guarino
Attorney Docket Number	81503633US02

Timeline

IC 007. US 013 019 021 023 024 031 034 035. G & S: Semiconductor wafer processing equipment and semiconductor wafer processing equipment components, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers, and monitoring equipment, all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers. FIRST USE: 20221000. FIRST USE IN COMMERCE: 20221000