Mark For: GLACIER™ trademark registration is intended to cover the categories of semiconductor wafer processing equipment and semiconductor wafer processing equipment components, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers, and monitoring equipment, all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers; process recipes used in connection with semiconductor wafer processing equipment, consisting of sets of parameters to form, create, remove, treat, measure, or modify a single layer or material, or a sequence of layers or materials.
Status
2020-05-16 UTC
LIVE APPLICATION Awaiting Examination
The trademark application has been accepted by the Office (has met the minimum filing requirements) and has not yet been assigned to an examiner.
035:
Belting, Hose, Machinery Packing and Non-Metallic Tires
Primary International Class
007 - Primary Class
(Machinery) Machines and machine tools; motors and engines (except for land vehicles); machine coupling and transmission components (except for land vehicles); agricultural implements other than hand-operated; incubators for eggs.
Filed Use
No
Current Use
No
Intent To Use
Yes
Filed ITU
Yes
44D Filed
No
44E Current
No
66A Current
No
Current Basis
No
No Basis
No
Attorney Name
Charles P. Guarino
Attorney Docket Number
81503311US02
Timeline
2020-05-13
Application Filed
2020-05-16
Location: NEW APPLICATION PROCESSING
2020-05-16
Status: Live/Pending
2020-05-16
Status: New application will be assigned to an examining attorney approximately 3 months after filing date.
CHARLES P. GUARINO MOSER TABOADA 1030 BROAD STREET SUITE 203 SHREWSBURY, NJ 07702
Good, Services, and Codes
International Codes:
7
U.S. Codes:
013,019,021,023,031,034,035
International Codes:
40
U.S. Codes:
100,103,106
Type Code
Type
GS0071
Semiconductor wafer processing equipment and semiconductor wafer processing equipment components, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers, and monitoring equipment, all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers; process recipes used in connection with semiconductor wafer processing equipment, consisting of sets of parameters to form, create, remove, treat, measure, or modify a single layer or material, or a sequence of layers or materials
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.