TEAS RF New Application

Under the Paperwork Reduction Act of 1995 no persons are required to respond to a collection of information unless it displays a valid OMB control number. PTO Form 1478 (Rev 09/2006)

OMB No. 0651-0009 (Exp 02/28/2021)

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Under the Paperwork Reduction Act of 1995 no persons are required to respond to a collection of information unless it displays a valid OMB control number. PTO Form 1478 (Rev 09/2006)

OMB No. 0651-0009 (Exp 02/28/2021)

Trademark/Service Mark Application, Principal Register

Serial Number: 88414925

Filing Date: 05/03/2019

To the Commissioner for Trademarks:

MARK: WAI (Standard Characters, see mark)
The literal element of the mark consists of WAI.
The mark consists of standard characters, without claim to any particular font style, size, or color.

The applicant, Partners in Leadership IP, LLC, a limited liability company legally organized under the laws of Nevada, having an address of
      27555 Ynez Road, Suite 300
      Temecula, California 92591
      United States

requests registration of the trademark/service mark identified above in the United States Patent and Trademark Office on the Principal Register established by the Act of July 5, 1946 (15 U.S.C. Section 1051 et seq.), as amended, for the following:

       International Class 035:  Business services, namely, business consultation services and business management services; compiling indexes of information
Intent to Use: The applicant has a bona fide intention, and is entitled, to use the mark in commerce on or in connection with the identified goods/services.

       International Class 041:  Educational and training services, namely, consulting seminars, workshops and one-on-one training in the fields of business management and business operations and distribution of course material in connection therewith
Intent to Use: The applicant has a bona fide intention, and is entitled, to use the mark in commerce on or in connection with the identified goods/services.


The applicant's current Attorney Information:
      Diane M. Reed and John B. Sganga, Jr., Edward A. Schlatter, Gerard von Hoffmann, Joseph R. Re, Catherine J. Holland, John M. Carson, Karen Vogel Weil, Jeffrey L. Van Hoosear, Daniel E. Altman, Lynda J. Zadra-Symes, William H. Shreve, Stephen C. Jensen, Steven J. Nataupsky, Paul A. Stewart, Joseph F. Jennings, Craig S. Summers, Ronald J. Schoenbaum, John R. King, Adeel S. Akhtar, David N. Weiss, Douglas G. Muehlhauser, Lori Lee Yamato, Michael K. Friedland, Stacey R. Halpern, Mark M. Abumeri, Jon W. Gurka, Joseph M. Reisman, Michael L. Fuller, Mark R. Benedict, Paul N. Conover, Robert J. Roby, Sabing H. Lee, Karoline A. Delaney, Joseph S. Cianfrani, William R. Zimmerman, Eric S. Furman, Susan M. Natland, Rose M. Thiessen, Michael A. Guiliana, Rabinder N. Narula, Bruce S. Itchkawitz, John M. Grover, Irfan A. Lateef, Amy Christensen Chun, Mark J. Gallagher, David G. Jankowski, Brian C. Horne, Payson LeMeilleur, Sheila N. Swaroop, Benjamin A. Katzenellenbogen, Andrew N. Merickel, Thomas P. Krzeminski, Linda H. Liu, James F. Herkenhoff, Andrew M. Douglas, Salima A. Merani, Jonathan A. Hyman, Curtiss C. Dosier, Joseph J. Mallon, Sean M. Murray, Christy G. Lea, Perry D. Oldham, Russell M. Jeide, Zi Y. Wong, Matthew S. Bellinger, Mincheol Kim, Gregory A. Hermanson, Lauren Keller Katzenellenbogen, Ted M. Cannon, Carol Pitzel Cruz, Josué A. Villalta, Andrew I. Kimmel, Brenden Gingrich, Maria Culic Anderson, Melanie J. Seelig, Mauricio A. Uribe, Curtis R. Huffmire, Christopher L. Ross, Eli A. Loots, Ryan E. Melnick, Yanna S. Bouris, Philip M. Nelson, Marko R. Zoretic, Kerry S. Taylor, Derek C. Dailey, Jarom D. Kesler, Steven P. Ruden, Colin B. Heideman, Theodore G. Papagiannis, Nicholas M. Zovko, Adam J. Gilbert, Kimberly J. Miller, Bryan W. Wahl, Thomas Y. Yee, Agnes Juang, Jason J. Jardine, Jared C. Bunker, Lance D. Smemoe, Joshua J. Stowell, Jonathan E. Bachand, Ali S. Razai, Terry K. Tullis, Derek R. Bayles, Cheryl T. Burgess, Gregory B. Phillips, Brian C. Claassen, Mark Lezama, Sean Ambrosius, Stephen W. Larson, John L. Paik, Bridget O'L. Smith, Michael R. Christensen, Benjamin J. Everton, Jason A. Gersting, Baraa Kahf, Alan G. Laquer, Vlad Teplitskiy, Jeffery L. Hallstrom, Maria V. Stout, William O. Adams, Ian W. Gillies, Andrew W. Lloyd, Mark D. Kachner, Lincoln S. Essig, David R. Trossen, Aaron M. Davis, Jason R. Swartz, Benjamin B. Anger, Jason A. Champion, Daniel V. Gibson, Jeremy J. Carney, Karen M. Cassidy, Adam B. Powell, Karen J. Lenker, Bryan G. McWhorter, Nathanael R. Luman, Andrea L. Cheek, Damien J. Howard, Jane Q. Dai, Shannon Lam, Peter Law, Mark Metzke, Scott G. Siera, Jacob Peterson, Christie R.W. Matthaei, Vladimir S. Lozan, Paul S. Stellman, Heungsoo Choi, Nicole Rossi Townes, Vikas Bhargava, Daniel J. Fischer, Jeremy A. Anapol, Scott A. Cromar, Kendall M. Loebbaka, David R. Schmidt, Harnik Shukla, Charlene A. Azema, Morgan R. Coates, Jessica L. Achtsam, Jonathan A. Menkes, Rosaleen H. Chou, Deborah S. Shepherd, Alejandro D. Muñoz, Mark D. Marsden, Joan Y. Chan, Loni L. Morrow, Kyu S. Min, Chang Sik Lim, Thomas S.H. Cowan, Devanie A. DuFour, Alexander J. Martinez, Hans L. Mayer, Jessica C. Sganga, Nicholas A. Belair, Ryan S. Furtado, Angela K. Dremann, Justin J. Gillett, M. Scott Forbes, Brian M. Graham, Brian J. Flynn, Mitchell B. Hadley, Qi Peter Tong, Elenore Niu, Michael P. Burns, David M. Cohen, Mark E. Davis, Jordan Gottdank, Kim A. Kennedy, Daniel C. Kiang, Keith M. Lim, Ashley C. Morales, Nathan D. Reeves, Brandon G. Smith, Xiaoyan Sabrina Wang, April K. White, Zach Jun Hyuk Hong, Jordan M. Cox, Albert J. Sueiras, Mark Rubinshtein, David J. Grant, Clayton R. Henson, Daniel A. Kamkar, Lesley Y. Kim, Nathan J. Lee, Josepher Li, Jacob R. Rosenbaum, James F. Smith, Douglas B. Wentzel, Aryeh N. Feinstein, Noorean I. Gill, Shuchen Gong, Peter A. Hecker, Aaron S. Johnson, Bryan J. Johnson, David C. Kellogg, Chanell Khosrowabadi, Lindsay A. Laddaran, Forrest M. McClellen, Janet M. Allendorph, Alexander Zeng, Sean S. Kim, Benjamin Ho, Adam R. Aquino, Samuel I. Cockriel, Serah R. Friedman, Bita Kianian, Yinan Lin, Eric R. Malmgren, Brian M.Z. Reece, Simone V. Ward, Derk A. Westermeyer, Suyoung Jang, Show Xiaoyu Wang, Justin E. Culbertson, Jeremiah S. Helm, Hironori Kubota, Paul C. Steinhardt, Kregg A. Koch, Andrew D. Lee, and Yusuke Hirai of Knobbe, Martens, Olson & Bear, LLP      2040 Main St., 14th Floor
      Irvine, California 92614
      United States
      949-760-0404(phone)
      949-760-9502(fax)
      efiling@knobbe.com (authorized)
The attorney docket/reference number is PILLLC.714T.

The applicant's current Correspondence Information:

Diane M. Reed

Knobbe, Martens, Olson & Bear, LLP

2040 Main St., 14th Floor

Irvine, California 92614

949-760-0404(phone)

949-760-9502(fax)

efiling@knobbe.com (authorized) E-mail Authorization: I authorize the USPTO to send e-mail correspondence concerning the application to the applicant, the applicant's attorney, or the applicant's domestic representative at the e-mail address provided in this application. I understand that a valid e-mail address must be maintained and that the applicant or the applicant's attorney must file the relevant subsequent application-related submissions via the Trademark Electronic Application System (TEAS). Failure to do so will result in the loss of TEAS Reduced Fee status and a requirement to submit an additional processing fee of $125 per international class of goods/services.

A fee payment in the amount of $550 has been submitted with the application, representing payment for 2 class(es).

Declaration

	Basis: If the applicant is filing the application based on use in commerce under 15 U.S.C. § 1051(a): The signatory believes that the applicant is the owner of the trademark/service mark sought to be registered; The mark is in use in commerce on or in connection with the goods/services in the application; The specimen(s) shows the mark as used on or in connection with the goods/services in the application; and To the best of the signatory's knowledge and belief, the facts recited in the application are accurate. And/Or If the applicant is filing the application based on an intent to use the mark in commerce under 15 U.S.C. § 1051(b), § 1126(d), and/or § 1126(e): The signatory believes that the applicant is entitled to use the mark in commerce; The applicant has a bona fide intention to use the mark in commerce on or in connection with the goods/services in the application; and To the best of the signatory's knowledge and belief, the facts recited in the application are accurate.
	To the best of the signatory's knowledge and belief, no other persons, except, if applicable, concurrent users, have the right to use the mark in commerce, either in the identical form or in such near resemblance as to be likely, when used on or in connection with the goods/services of such other persons, to cause confusion or mistake, or to deceive.
	To the best of the signatory's knowledge, information, and belief, formed after an inquiry reasonable under the circumstances, the allegations and other factual contentions made above have evidentiary support.
	The signatory being warned that willful false statements and the like are punishable by fine or imprisonment, or both, under 18 U.S.C. § 1001, and that such willful false statements and the like may jeopardize the validity of the application or submission or any registration resulting therefrom, declares that all statements made of his/her own knowledge are true and all statements made on information and belief are believed to be true.

Declaration Signature

Signature: /Jason Carr/   Date: 05/03/2019
Signatory's Name: Jason Carr
Signatory's Position: Director of Legal Services
Payment Sale Number: 88414925
Payment Accounting Date: 05/06/2019

Serial Number: 88414925
Internet Transmission Date: Fri May 03 16:58:13 EDT 2019
TEAS Stamp: USPTO/BAS-XXX.XXX.XX.XXX-201905031658136
32073-88414925-6209838b26ff396b6b769095b
c4cd24a9d472665e866dd27157eb1a7418c6c53c
-CC-3970-20190503145223923267