TEUV

Tokyo Ohka Kogyo Co., Ltd.

Application Filed: 2019-03-12
Trademark Application Details
Trademark Logo TEUV

Mark For: TEUV® trademark registration is intended to cover the categories of photoresists; chemical compositions for developing photographs; chemical compositions for photolithography. [all]

Status

2020-07-18 UTC
LIVE REGISTRATION Issued and Active
The trademark application has been registered with the Office.


Research OneLook Acronym Finder
Serial Number88336981
Registration Number5883071
Mark Literal ElementsTEUV
Mark Drawing Type4 - STANDARD CHARACTER MARK
Mark TypeTRADEMARK
RegisterPRINCIPAL
Current LocationPUBLICATION AND ISSUE SECTION 2019-10-15
Basis44(e)
Class StatusACTIVE
Primary US Classes
  • 001: Raw or Partly Prepared Materials
  • 005: Adhesives
  • 006: Chemicals and Chemical Compositions
  • 010: Fertilizers
  • 026: Measuring and Scientific Appliances
  • 046: Foods and Ingredients of Foods
Primary International Class
  • 001 - Primary Class
  • (Chemicals) Chemicals used in industry, science and photography, as well as in agriculture, horticulture and forestry; unprocessed artificial resins, unprocessed plastics; manures; fire extinguishing compositions; tempering and soldering preparations; chemical substances for preserving foodstuffs; tanning substances; adhesives used in industry.
Filed UseNo
Current UseNo
Intent To UseNo
Filed ITUNo
44D FiledNo
44E CurrentYes
66A CurrentNo
Current BasisNo
No BasisNo
Attorney NameKeith R. Obert
Attorney Docket Number610.094-184
Law Office AssignedL90
Employee NameMARCY, AMY ALFIERI

Timeline

2019-03-12Application Filed
2019-07-30Published
2019-07-30Published for Opposition
2019-10-15Location: PUBLICATION AND ISSUE SECTION
2019-10-15Status: Live/Registered
2019-10-15Status: Registered. The registration date is used to determine when post-registration maintenance documents are due.
2019-10-15Trademark Registered
2019-10-15Transaction Date

Trademark Parties (Applicants & Owners)

Party: Tokyo Ohka Kogyo Co., Ltd.
Address150 Nakamaruko, Nakahara-ku Kawasaki-shi Kanagawa JAPAN 211-0000
Legal Entity TypeCorporation
Legal Entity StateJAPAN

Documents

Attorney of Record

KEITH R. OBERT
WARE, FRESSOLA, MAGUIRE & BARBER LLP
755 MAIN STREET, BLDG. 5
MONROE, CT 06468

Good, Services, and Codes


IC 001. US 001 005 006 010 026 046. G & S: photoresists; chemical compositions for developing photographs; chemical compositions for photolithography

International Codes:1
U.S. Codes:001,005,006,010,026,046
Type CodeType
GS0011photoresists; chemical compositions for developing photographs; chemical compositions for photolithography
GS0011photoresists; chemical compositions for developing photographs; chemical compositions for photolithography

Trademark Filing History

DescriptionDateProceeding Number
REGISTERED-PRINCIPAL REGISTER2019-10-15
PUBLISHED FOR OPPOSITION2019-07-30
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED2019-07-30
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED2019-07-10
APPROVED FOR PUB - PRINCIPAL REGISTER2019-06-22
TEAS/EMAIL CORRESPONDENCE ENTERED2019-06-2173797
CORRESPONDENCE RECEIVED IN LAW OFFICE2019-06-2173797
ASSIGNED TO LIE2019-06-2173797
TEAS RESPONSE TO OFFICE ACTION RECEIVED2019-06-17
NOTIFICATION OF NON-FINAL ACTION E-MAILED2019-05-316325
NON-FINAL ACTION WRITTEN2019-05-3177765
NON-FINAL ACTION E-MAILED2019-05-316325
ASSIGNED TO EXAMINER2019-05-2177765
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED IN TRAM2019-03-30
NEW APPLICATION ENTERED IN TRAM2019-03-15

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