RTE

Reaction Technology Epi, LLC

Application Filed: 2018-12-14
Trademark Application Details
Trademark Logo RTE

Mark For: RTE® trademark registration is intended to cover the categories of silicon epitaxial deposition services; custom manufacture of silicon wafers for others. [all]

Status

2021-01-28 UTC
LIVE REGISTRATION Issued and Active
The trademark application has been registered with the Office.


Research OneLook Acronym Finder
Serial Number88230267
Registration Number5998105
Mark Literal ElementsRTE
Mark Drawing Type4 - STANDARD CHARACTER MARK
Mark TypeSERVICE MARK
RegisterPRINCIPAL
Current LocationPUBLICATION AND ISSUE SECTION 2020-01-21
Basis1(a)
Class StatusACTIVE
Primary US Classes
  • 100: Miscellaneous
  • 103: Construction and Repair
  • 106: Material Treatment
Primary International Class
  • 040 - Primary Class
  • (Treatment of materials) Treatment of materials.
Filed UseNo
Current UseYes
Intent To UseNo
Filed ITUYes
44D FiledNo
44E CurrentNo
66A CurrentNo
Current BasisNo
No BasisNo
Attorney NameMichael E. Hall
Attorney Docket Number1511.TSBU006

Timeline

2018-08-13Date of First Use
2018-08-13Date of Use In Commerce
2018-12-14Application Filed
2019-01-07Location: NEW APPLICATION PROCESSING
2019-01-07Status: Live/Pending
2019-01-08Transaction Date
2019-04-23Published
2019-04-23Published for Opposition
2019-12-18Trademark Registered
2020-01-21Location: PUBLICATION AND ISSUE SECTION
2020-02-25Status: Registered. The registration date is used to determine when post-registration maintenance documents are due.
2020-02-25Trademark Registered

Trademark Parties (Applicants & Owners)

Party: Reaction Technology Epi, LLC
Address301 Ridgemont Drive Allen, TEXAS UNITED STATES 75002
Legal Entity TypeLimited Liability Company
Legal Entity StateDELAWARE

Documents

DrawingJPEG2018-12-14
TEAS RF New ApplicationMULTI2018-12-14
XSearch Search SummaryXML2019-03-13
Notation to FileXML2019-03-14
TRAM Snapshot of App at Pub for OppostnMULTI2019-03-15
Notice of PublicationXML2019-04-03
Notification Of Notice of PublicationXML2019-04-03
Change of AddressXML2019-04-17
OG Publication ConfirmationAPPLICATION/XML2019-04-23
Notice of AllowanceAPPLICATION/XML2019-06-18
SpecimenJPEG2019-12-16
Statement of UseMULTI2019-12-16
ITU Unit ActionMULTI2019-12-28
Notice of Acceptance of Statement of UseAPPLICATION/XML2020-01-22
TRAM Snapshot of App at Pub for OppostnAPPLICATION/XML,IMAGE/JPEG2020-01-22
Registration CertificatePDF2020-02-25

Attorney of Record

MICHAEL E. HALL
KACVINSKY DAISAK BLUNI PLLC
101 CARNEGIE CENTER, SUITE 106
PRINCETON, NJ 08540

Good, Services, and Codes


IC 040. US 100 103 106. G & S: Silicon epitaxial deposition services; custom manufacture of silicon wafers for others. FIRST USE: 20180813. FIRST USE IN COMMERCE: 20180813

International Codes:40
U.S. Codes:100,103,106
Type CodeType
PM0001REACTION TECHNOLOGY EPI
GS0401Silicon epitaxial deposition services; custom manufacture of silicon wafers for others

Trademark Filing History

DescriptionDateProceeding Number
REGISTERED-PRINCIPAL REGISTER2020-02-25
NOTICE OF ACCEPTANCE OF STATEMENT OF USE E-MAILED2020-01-22
ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED2020-01-21
STATEMENT OF USE PROCESSING COMPLETE2019-12-2776538
CASE ASSIGNED TO INTENT TO USE PARALEGAL2019-12-2776538
USE AMENDMENT FILED2019-12-1676538
TEAS STATEMENT OF USE RECEIVED2019-12-16
NOA E-MAILED - SOU REQUIRED FROM APPLICANT2019-06-18
PUBLISHED FOR OPPOSITION2019-04-23
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED2019-04-23
TEAS CHANGE OF CORRESPONDENCE RECEIVED2019-04-17
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED2019-04-03
APPROVED FOR PUB - PRINCIPAL REGISTER2019-03-14
ASSIGNED TO EXAMINER2019-03-1293418
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED IN TRAM2019-01-07
NEW APPLICATION ENTERED IN TRAM2018-12-18

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