RAYTEC

Hitachi Chemical Company, Ltd.

Application Filed: 2013-02-20

Trademark Application Details

Status

602

Dead/Abandoned

ABANDONED-FAILURE TO RESPOND OR LATE RESPONSE

Research	OneLook Acronym Finder
Serial Number	85855636
Mark Drawing Code	4000: Illustration: Drawing with word(s)/letter(s)/number(s) in Block form
Domestic Representative	Scott S. Havlick
Attorney Name	Scott S. Havlick
Attorney Docket Number	77307.0006
Law Office Assigned	M70
Employee Name	MARTIN, JENNIFER MCGAR

Timeline

2013-02-20	Application Filed
2013-12-11	Abandon
2014-01-06	Location: TMO LAW OFFICE 116 - EXAMINING ATTORNEY ASSIGNED
2014-01-06	Status: Dead/Abandoned
2018-07-08	Transaction Date

Trademark Applicants & Owners

Owner:	Hitachi Chemical Company, Ltd.
Address	9-2, Marunouchi 1-chome Chiyoda-ku, Tokyo JP 100-6606
Legal Entity Type	Corporation
Legal Entity State	JP

Documents

Click the blue "Refresh" button to load certificates, specimines, application, and other documents.

Attorney of Record

SCOTT S. HAVLICK
HOLLAND & HART LLP
PO BOX 8749
DENVER, CO 80201-8749

Good, Services, and Codes

International Codes:	1
U.S. Codes:	001,005,006,010,026,046
International Codes:	17
U.S. Codes:	001,005,012,013,035,050

Type Code	Type
GS0011	Photosensitive Dry Films (Photoresist films or Photo sensitive films); Photopolymer films used in the manufacture of printed circuit boards; Photosensitive Dry Films used in the manufacture of PDPs (Plasma Display Panels); Photosensitive Dry Films used in the manufacture of touch panel; Photosensitive Dry Films used in the manufacture of LED (Light Emitting Diode) base plates; Photosensitive Dry Films used in the manufacture of metal masks; Photosensitive Dry Films used in the formation of bump in printed wiring boards; Photosensitive Dry Films used in the formation of wiring in printed wiring boards; Photosensitive Dry Films used in the formation of ribs for PDPs (Plasma Display Panels); Photosensitive Dry Films for use as coating resist; Photosensitive Dry Films for use as etching resist; Photosensitive Dry Films for use as resist in sandblasting processes; Photosensitive Dry Films for use as resist in chemical milling; Photosensitive Dry Films for use as photosensitive coverlay film of FPCs (flexible printed wiring boards); Photosensitive Dry Films photosensitive solder resist of printed wiring board; Photo resist liquids; Photo resist pastes; Solder resist; Coverlay

Type Code

Type

GS0011

Photosensitive Dry Films (Photoresist films or Photo sensitive films); Photopolymer films used in the manufacture of printed circuit boards; Photosensitive Dry Films used in the manufacture of PDPs (Plasma Display Panels); Photosensitive Dry Films used in the manufacture of touch panel; Photosensitive Dry Films used in the manufacture of LED (Light Emitting Diode) base plates; Photosensitive Dry Films used in the manufacture of metal masks; Photosensitive Dry Films used in the formation of bump in printed wiring boards; Photosensitive Dry Films used in the formation of wiring in printed wiring boards; Photosensitive Dry Films used in the formation of ribs for PDPs (Plasma Display Panels); Photosensitive Dry Films for use as coating resist; Photosensitive Dry Films for use as etching resist; Photosensitive Dry Films for use as resist in sandblasting processes; Photosensitive Dry Films for use as resist in chemical milling; Photosensitive Dry Films for use as photosensitive coverlay film of FPCs (flexible printed wiring boards); Photosensitive Dry Films photosensitive solder resist of printed wiring board; Photo resist liquids; Photo resist pastes; Solder resist; Coverlay

Trademark Filing History

Description	Date	Event Coding
NEW APPLICATION ENTERED IN TRAM	2013-02-24	1 NWAP I:Incoming Correspondence
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED IN TRAM	2013-02-27	2 NWOS I:Incoming Correspondence
NOTICE OF PSEUDO MARK E-MAILED	2013-02-28	3 MPMK E:E-Mail
ASSIGNED TO EXAMINER	2013-06-03	4 DOCK D:Assigned to Examiner
NON-FINAL ACTION WRITTEN	2013-06-10	5 CNRT R:Renewal
NON-FINAL ACTION E-MAILED	2013-06-10	6 GNRT F:First Action
NOTIFICATION OF NON-FINAL ACTION E-MAILED	2013-06-10	7 GNRN O:Outgoing Correspondence
ABANDONMENT - FAILURE TO RESPOND OR LATE RESPONSE	2014-01-06	8 ABN2 O:Outgoing Correspondence
ABANDONMENT NOTICE MAILED - FAILURE TO RESPOND	2014-01-06	9 MAB2 O:Outgoing Correspondence

Similar Marks

Mark Image Registration \| Serial	Company Trademark Application Date
RAYTEC 87498455 not registered Dead/Abandoned	Wuhan Raytex Protection CO., LTD. 2017-06-20
RAYTEC 87472382 5365067 Live/Registered	Wuhan Raytex Protection CO., LTD. 2017-06-01
RAYTEC 85855636 not registered Dead/Abandoned	Hitachi Chemical Company, Ltd. 2013-02-20
RAYTEC 77665017 not registered Dead/Abandoned	Raytec Limited 2009-02-06
RAYTEC 77662280 not registered Dead/Abandoned	Raytec Technologies, Inc. 2009-02-03
RAYTEC 75240162 not registered Dead/Abandoned	Gold Hawk/Ultra-Touch, Inc. 1997-02-11
RAYTEC 73546110 1417832 Dead/Cancelled	RAYNE AQUATECHNOLOGIES, INC. 1985-07-02

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.